View source for Category:Chi On Chui

== Chi On Chui ==

=== Executive Summary ===
Chi On Chui is an inventor who has filed 29 patents. Their primary areas of innovation include {using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate} (12 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (11 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (8 patents), and they have worked with companies such as Taiwan Semiconductor Manufacturing Co., Ltd. (29 patents). Their most frequent collaborators include [[Category:Hsin-Yi Lee|Hsin-Yi Lee]] (8 collaborations), [[Category:Sai-Hooi Yeong|Sai-Hooi Yeong]] (5 collaborations), [[Category:Yung-Cheng Lu|Yung-Cheng Lu]] (5 collaborations).

=== Patent Filing Activity ===
[[File:Chi_On_Chui_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:Chi_On_Chui_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_H01L29/66545|H01L29/66545]] ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 12 patents
* [[:Category:CPC_H01L29/42392|H01L29/42392]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 11 patents
* [[:Category:CPC_H01L29/78696|H01L29/78696]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 8 patents
* [[:Category:CPC_H01L29/0673|H01L29/0673]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 8 patents
* [[:Category:CPC_H01L29/66742|H01L29/66742]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 7 patents
* [[:Category:CPC_H01L29/401|H01L29/401]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 7 patents
* [[:Category:CPC_H01L29/66553|H01L29/66553]] ({using self aligned silicidation, i.e. salicide  (formation of conductive layers comprising silicides): 6 patents
* [[:Category:CPC_H01L29/66795|H01L29/66795]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents
* [[:Category:CPC_H01L21/823431|H01L21/823431]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 6 patents
* [[:Category:CPC_H01L29/6653|H01L29/6653]] ({using self aligned silicidation, i.e. salicide  (formation of conductive layers comprising silicides): 5 patents
* [[:Category:CPC_H01L29/0847|H01L29/0847]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
* [[:Category:CPC_H01L29/4966|H01L29/4966]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
* [[:Category:CPC_H01L29/785|H01L29/785]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
* [[:Category:CPC_H01L29/66439|H01L29/66439]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
* [[:Category:CPC_H01L27/0924|H01L27/0924]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L21/28088|H01L21/28088]] (Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups): 3 patents
* [[:Category:CPC_H01L27/092|H01L27/092]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L21/0228|H01L21/0228]] ({deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD}): 3 patents
* [[:Category:CPC_H01L21/76224|H01L21/76224]] ({using trench refilling with dielectric materials  (trench filling with polycristalline silicon): 3 patents
* [[:Category:CPC_H01L21/823481|H01L21/823481]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 3 patents
* [[:Category:CPC_H01L27/0886|H01L27/0886]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L21/823468|H01L21/823468]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 3 patents
* [[:Category:CPC_H01L29/7851|H01L29/7851]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L29/41775|H01L29/41775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L21/823821|H01L21/823821]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
* [[:Category:CPC_H01L29/6684|H01L29/6684]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L29/78391|H01L29/78391]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L29/517|H01L29/517]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L21/02211|H01L21/02211]] ({the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides  (adhesion layers or buffer layers): 2 patents
* [[:Category:CPC_H01L21/02603|H01L21/02603]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L29/4983|H01L29/4983]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L29/6656|H01L29/6656]] ({using self aligned silicidation, i.e. salicide  (formation of conductive layers comprising silicides): 2 patents
* [[:Category:CPC_H01L21/28518|H01L21/28518]] (from a gas or vapour, e.g. condensation): 2 patents
* [[:Category:CPC_H01L21/823456|H01L21/823456]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
* [[:Category:CPC_H01L29/45|H01L29/45]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L29/7856|H01L29/7856]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L29/4908|H01L29/4908]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L21/823475|H01L21/823475]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
* [[:Category:CPC_H01L29/513|H01L29/513]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L29/0665|H01L29/0665]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L21/28158|H01L21/28158]] ({Making the insulator}): 2 patents
* [[:Category:CPC_H01L29/775|H01L29/775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L21/823412|H01L21/823412]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
* [[:Category:CPC_H01L29/41791|H01L29/41791]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L29/6681|H01L29/6681]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L21/823878|H01L21/823878]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H10B51/20|H10B51/20]] (ELECTRONIC MEMORY DEVICES): 1 patents
* [[:Category:CPC_H01L29/516|H01L29/516]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L23/5283|H01L23/5283]] ({Geometry or} layout of the interconnection structure {(): 1 patents
* [[:Category:CPC_H10B51/30|H10B51/30]] (ELECTRONIC MEMORY DEVICES): 1 patents
* [[:Category:CPC_H01L29/7869|H01L29/7869]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/28176|H01L21/28176]] (Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups): 1 patents
* [[:Category:CPC_H01L21/823842|H01L21/823842]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L29/66787|H01L29/66787]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/823807|H01L21/823807]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L21/02167|H01L21/02167]] ({the material being a silicon carbide not containing oxygen, e.g. SiC, SiC:H or silicon carbonitrides  (): 1 patents
* [[:Category:CPC_H01L21/0214|H01L21/0214]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/02263|H01L21/02263]] ({deposition from the gas or vapour phase}): 1 patents
* [[:Category:CPC_H01L21/76232|H01L21/76232]] (Dielectric regions {, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers}): 1 patents
* [[:Category:CPC_H01L29/66818|H01L29/66818]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/76227|H01L21/76227]] (Dielectric regions {, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers}): 1 patents
* [[:Category:CPC_H01L21/28141|H01L21/28141]] (Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups): 1 patents
* [[:Category:CPC_H01L21/0234|H01L21/0234]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/31055|H01L21/31055]] ({the removal being a chemical etching step, e.g. dry etching  (etching per se): 1 patents
* [[:Category:CPC_H01L21/31116|H01L21/31116]] ({by dry-etching}): 1 patents
* [[:Category:CPC_H01L29/4236|H01L29/4236]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/42372|H01L29/42372]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/31051|H01L21/31051]] ({Planarisation of the insulating layers  (): 1 patents
* [[:Category:CPC_H01L21/31111|H01L21/31111]] ({by chemical means}): 1 patents
* [[:Category:CPC_H01L21/76229|H01L21/76229]] (Dielectric regions {, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers}): 1 patents
* [[:Category:CPC_H01L21/764|H01L21/764]] (Making of isolation regions between components): 1 patents
* [[:Category:CPC_H01L21/823418|H01L21/823418]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L29/0649|H01L29/0649]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L28/92|H01L28/92]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L23/5226|H01L23/5226]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L28/75|H01L28/75]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L28/91|H01L28/91]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/42368|H01L29/42368]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/28194|H01L21/28194]] (Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups): 1 patents
* [[:Category:CPC_H01L21/28556|H01L21/28556]] (from a gas or vapour, e.g. condensation): 1 patents
* [[:Category:CPC_H01L21/3115|H01L21/3115]] (Doping the insulating layers): 1 patents
* [[:Category:CPC_H01L21/82345|H01L21/82345]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L21/02631|H01L21/02631]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/0206|H01L21/0206]] ({during, before or after processing of insulating layers}): 1 patents
* [[:Category:CPC_H01L21/02321|H01L21/02321]] ({introduction of substances into an already existing insulating layer  (): 1 patents
* [[:Category:CPC_H01L21/02337|H01L21/02337]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/31122|H01L21/31122]] (to form insulating layers thereon, e.g. for masking or by using photolithographic techniques  (encapsulating layers): 1 patents
* [[:Category:CPC_G11C8/08|G11C8/08]] (Word line control circuits, e.g. drivers, boosters, pull-up circuits, pull-down circuits, precharging circuits, for word lines): 1 patents
* [[:Category:CPC_G11C29/025|G11C29/025]] (STATIC STORES  (semiconductor memory devices): 1 patents
* [[:Category:CPC_G11C29/12|G11C29/12]] (STATIC STORES  (semiconductor memory devices): 1 patents
* [[:Category:CPC_G11C29/50|G11C29/50]] (STATIC STORES  (semiconductor memory devices): 1 patents
* [[:Category:CPC_H01L21/8221|H01L21/8221]] ({Three dimensional integrated circuits stacked in different levels}): 1 patents
* [[:Category:CPC_G11C2029/1202|G11C2029/1202]] (STATIC STORES  (semiconductor memory devices): 1 patents
* [[:Category:CPC_H01L29/41733|H01L29/41733]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/823814|H01L21/823814]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L29/7834|H01L29/7834]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/30604|H01L21/30604]] (Chemical or electrical treatment, e.g. electrolytic etching  (to form insulating layers): 1 patents
* [[:Category:CPC_H01L21/3065|H01L21/3065]] (Plasma etching; Reactive-ion etching): 1 patents
* [[:Category:CPC_H01L21/76843|H01L21/76843]] ({formed in openings in a dielectric}): 1 patents
* [[:Category:CPC_H01L2029/7857|H01L2029/7857]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/823462|H01L21/823462]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L21/823857|H01L21/823857]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L21/823871|H01L21/823871]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L27/088|H01L27/088]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L27/0922|H01L27/0922]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/1079|H01L29/1079]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/66606|H01L29/66606]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/66621|H01L29/66621]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/7853|H01L29/7853]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents

=== Companies ===
[[File:Chi_On_Chui_Top_Companies.png|border|800px]]

==== List of Companies ====
* Taiwan Semiconductor Manufacturing Co., Ltd.: 29 patents

=== Collaborators ===
* [[:Category:Hsin-Yi Lee|Hsin-Yi Lee]][[Category:Hsin-Yi Lee]] (8 collaborations)
* [[:Category:Sai-Hooi Yeong|Sai-Hooi Yeong]][[Category:Sai-Hooi Yeong]] (5 collaborations)
* [[:Category:Yung-Cheng Lu|Yung-Cheng Lu]][[Category:Yung-Cheng Lu]] (5 collaborations)
* [[:Category:Weng Chang|Weng Chang]][[Category:Weng Chang]] (5 collaborations)
* [[:Category:Meng-Han Lin|Meng-Han Lin]][[Category:Meng-Han Lin]] (4 collaborations)
* [[:Category:Cheng-Lung Hung|Cheng-Lung Hung]][[Category:Cheng-Lung Hung]] (4 collaborations)
* [[:Category:Che-Hao Chang|Che-Hao Chang]][[Category:Che-Hao Chang]] (4 collaborations)
* [[:Category:Wen-Kai Lin|Wen-Kai Lin]][[Category:Wen-Kai Lin]] (3 collaborations)
* [[:Category:Xiong-Fei Yu|Xiong-Fei Yu]][[Category:Xiong-Fei Yu]] (3 collaborations)
* [[:Category:Wan-Yi Kao|Wan-Yi Kao]][[Category:Wan-Yi Kao]] (2 collaborations)
* [[:Category:Chung-Ting Ko|Chung-Ting Ko]][[Category:Chung-Ting Ko]] (2 collaborations)
* [[:Category:Shu-Han Chen|Shu-Han Chen]][[Category:Shu-Han Chen]] (2 collaborations)
* [[:Category:Cheng-Hao Hou|Cheng-Hao Hou]][[Category:Cheng-Hao Hou]] (2 collaborations)
* [[:Category:Ji-Cheng Chen|Ji-Cheng Chen]][[Category:Ji-Cheng Chen]] (2 collaborations)
* [[:Category:Pei Ying Lai|Pei Ying Lai]][[Category:Pei Ying Lai]] (2 collaborations)
* [[:Category:Chia-Wei Hsu|Chia-Wei Hsu]][[Category:Chia-Wei Hsu]] (2 collaborations)
* [[:Category:Bo-Cyuan Lu|Bo-Cyuan Lu]][[Category:Bo-Cyuan Lu]] (1 collaborations)
* [[:Category:Hsin-Che Chiang|Hsin-Che Chiang]][[Category:Hsin-Che Chiang]] (1 collaborations)
* [[:Category:Tai-Chun Huang|Tai-Chun Huang]][[Category:Tai-Chun Huang]] (1 collaborations)
* [[:Category:Chia-En Huang|Chia-En Huang]][[Category:Chia-En Huang]] (1 collaborations)
* [[:Category:Bo-Feng Young|Bo-Feng Young]][[Category:Bo-Feng Young]] (1 collaborations)
* [[:Category:Hung Cheng Lin|Hung Cheng Lin]][[Category:Hung Cheng Lin]] (1 collaborations)
* [[:Category:Yu-Cheng Shiau|Yu-Cheng Shiau]][[Category:Yu-Cheng Shiau]] (1 collaborations)
* [[:Category:Chunyao Wang|Chunyao Wang]][[Category:Chunyao Wang]] (1 collaborations)
* [[:Category:Chih-Tang Peng|Chih-Tang Peng]][[Category:Chih-Tang Peng]] (1 collaborations)
* [[:Category:Sung-En Lin|Sung-En Lin]][[Category:Sung-En Lin]] (1 collaborations)
* [[:Category:Tsung-Ju Chen|Tsung-Ju Chen]][[Category:Tsung-Ju Chen]] (1 collaborations)
* [[:Category:Ta-Hsiang Kung|Ta-Hsiang Kung]][[Category:Ta-Hsiang Kung]] (1 collaborations)
* [[:Category:Shin-Hung Tsai|Shin-Hung Tsai]][[Category:Shin-Hung Tsai]] (1 collaborations)
* [[:Category:Da-Yuan Lee|Da-Yuan Lee]][[Category:Da-Yuan Lee]] (1 collaborations)
* [[:Category:Kuei-Lun Lin|Kuei-Lun Lin]][[Category:Kuei-Lun Lin]] (1 collaborations)
* [[:Category:Yen-Fu Chen|Yen-Fu Chen]][[Category:Yen-Fu Chen]] (1 collaborations)
* [[:Category:Po-Ting Lin|Po-Ting Lin]][[Category:Po-Ting Lin]] (1 collaborations)
* [[:Category:Chia-Yuan Chang|Chia-Yuan Chang]][[Category:Chia-Yuan Chang]] (1 collaborations)
* [[:Category:Szu-Ying Chen|Szu-Ying Chen]][[Category:Szu-Ying Chen]] (1 collaborations)
* [[:Category:Mao-Lin Huang|Mao-Lin Huang]][[Category:Mao-Lin Huang]] (1 collaborations)
* [[:Category:Lung-Kun Chu|Lung-Kun Chu]][[Category:Lung-Kun Chu]] (1 collaborations)
* [[:Category:Huang-Lin Chao of Hillsboro OR (US)|Huang-Lin Chao of Hillsboro OR (US)]][[Category:Huang-Lin Chao of Hillsboro OR (US)]] (1 collaborations)
* [[:Category:Hsin-Han Tsai|Hsin-Han Tsai]][[Category:Hsin-Han Tsai]] (1 collaborations)
* [[:Category:Chung-Chiang Wu|Chung-Chiang Wu]][[Category:Chung-Chiang Wu]] (1 collaborations)
* [[:Category:Cheng-I Lin|Cheng-I Lin]][[Category:Cheng-I Lin]] (1 collaborations)
* [[:Category:Hsueh-Ju Chen|Hsueh-Ju Chen]][[Category:Hsueh-Ju Chen]] (1 collaborations)
* [[:Category:Tsung-Da Lin|Tsung-Da Lin]][[Category:Tsung-Da Lin]] (1 collaborations)
* [[:Category:Pei-Yu Wang|Pei-Yu Wang]][[Category:Pei-Yu Wang]] (1 collaborations)
* [[:Category:Yoh-Rong Liu|Yoh-Rong Liu]][[Category:Yoh-Rong Liu]] (1 collaborations)
* [[:Category:Li-Chi Yu|Li-Chi Yu]][[Category:Li-Chi Yu]] (1 collaborations)
* [[:Category:Sen-Hong Syue|Sen-Hong Syue]][[Category:Sen-Hong Syue]] (1 collaborations)
* [[:Category:Heng-Chia Su|Heng-Chia Su]][[Category:Heng-Chia Su]] (1 collaborations)
* [[:Category:Li-Fong Lin|Li-Fong Lin]][[Category:Li-Fong Lin]] (1 collaborations)
* [[:Category:Zhen-Cheng Wu|Zhen-Cheng Wu]][[Category:Zhen-Cheng Wu]] (1 collaborations)

[[Category:Chi On Chui]]
[[Category:Inventors]]
[[Category:Inventors filing patents with Taiwan Semiconductor Manufacturing Co., Ltd.]]