View source for Category:Huicheng Chang

== Huicheng Chang ==

=== Executive Summary ===
Huicheng Chang is an inventor who has filed 11 patents. Their primary areas of innovation include to produce devices, e.g. integrated circuits, each consisting of a plurality of components (4 patents), to produce devices, e.g. integrated circuits, each consisting of a plurality of components (4 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (3 patents), and they have worked with companies such as Taiwan Semiconductor Manufacturing Co., Ltd. (10 patents), Taiwan Semiconductor Manufacturing Co., Ltd (1 patents). Their most frequent collaborators include [[Category:Yee-Chia Yeo|Yee-Chia Yeo]] (11 collaborations), [[Category:Liang-Yin Chen|Liang-Yin Chen]] (5 collaborations), [[Category:Su-Hao Liu|Su-Hao Liu]] (3 collaborations).

=== Patent Filing Activity ===
[[File:Huicheng_Chang_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:Huicheng_Chang_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_H01L21/823821|H01L21/823821]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 4 patents
* [[:Category:CPC_H01L21/823431|H01L21/823431]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 4 patents
* [[:Category:CPC_H01L27/0924|H01L27/0924]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L29/66545|H01L29/66545]] ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 3 patents
* [[:Category:CPC_H01L29/785|H01L29/785]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L29/7851|H01L29/7851]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L29/66795|H01L29/66795]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L21/28518|H01L21/28518]] (from a gas or vapour, e.g. condensation): 3 patents
* [[:Category:CPC_H01L25/50|H01L25/50]] ({Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group): 2 patents
* [[:Category:CPC_H01L21/823807|H01L21/823807]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
* [[:Category:CPC_H01L21/266|H01L21/266]] (using masks {(): 2 patents
* [[:Category:CPC_H01L21/823481|H01L21/823481]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
* [[:Category:CPC_H01L29/0649|H01L29/0649]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L21/31155|H01L21/31155]] (Doping the insulating layers): 2 patents
* [[:Category:CPC_H01L21/823828|H01L21/823828]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
* [[:Category:CPC_H01L29/0847|H01L29/0847]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L24/83|H01L24/83]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/265|H01L21/265]] (producing ion implantation): 1 patents
* [[:Category:CPC_H01L21/6835|H01L21/6835]] ({using temporarily an auxiliary support}): 1 patents
* [[:Category:CPC_H01L21/7806|H01L21/7806]] ({involving the separation of the active layers from a substrate}): 1 patents
* [[:Category:CPC_H01L21/32|H01L21/32]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_G03F7/70283|G03F7/70283]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_H01L21/027|H01L21/027]] (Making masks on semiconductor bodies for further photolithographic processing not provided for in group): 1 patents
* [[:Category:CPC_H01L21/823892|H01L21/823892]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L27/0928|H01L27/0928]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/76229|H01L21/76229]] (Dielectric regions {, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers}): 1 patents
* [[:Category:CPC_H01L27/0886|H01L27/0886]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/823412|H01L21/823412]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L29/0669|H01L29/0669]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/42392|H01L29/42392]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/66553|H01L29/66553]] ({using self aligned silicidation, i.e. salicide  (formation of conductive layers comprising silicides): 1 patents
* [[:Category:CPC_H01L29/775|H01L29/775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/78696|H01L29/78696]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/764|H01L21/764]] (Making of isolation regions between components): 1 patents
* [[:Category:CPC_H01L21/7682|H01L21/7682]] (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
* [[:Category:CPC_H01L21/76825|H01L21/76825]] ({by exposing the layer to particle radiation, e.g. ion implantation, irradiation with UV light or electrons etc.  (plasma treatment): 1 patents
* [[:Category:CPC_H01L21/76831|H01L21/76831]] ({in via holes or trenches, e.g. non-conductive sidewall liners}): 1 patents
* [[:Category:CPC_H01L21/76897|H01L21/76897]] ({Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step  (self-aligned silicidation on field effect transistors): 1 patents
* [[:Category:CPC_H01L21/823864|H01L21/823864]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L21/823871|H01L21/823871]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L29/41725|H01L29/41725]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/41766|H01L29/41766]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/41791|H01L29/41791]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/4991|H01L29/4991]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/6653|H01L29/6653]] ({using self aligned silicidation, i.e. salicide  (formation of conductive layers comprising silicides): 1 patents
* [[:Category:CPC_H01L21/681|H01L21/681]] (for positioning, orientation or alignment): 1 patents
* [[:Category:CPC_G06T1/0014|G06T1/0014]] ({Image feed-back for automatic industrial control, e.g. robot with camera  (robots): 1 patents
* [[:Category:CPC_G06T7/0004|G06T7/0004]] ({Industrial image inspection}): 1 patents
* [[:Category:CPC_G06T7/73|G06T7/73]] (using feature-based methods): 1 patents
* [[:Category:CPC_H01L23/544|H01L23/544]] (Marks applied to semiconductor devices {or parts}, e.g. registration marks, {alignment structures, wafer maps  (test patterns for characterising or monitoring manufacturing processes): 1 patents
* [[:Category:CPC_G06T2207/30148|G06T2207/30148]] (Subject of image; Context of image processing): 1 patents
* [[:Category:CPC_H01L2223/54493|H01L2223/54493]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/401|H01L29/401]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/0337|H01L21/0337]] ({characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment}): 1 patents
* [[:Category:CPC_H01L29/456|H01L29/456]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/02532|H01L21/02532]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/26506|H01L21/26506]] (producing ion implantation): 1 patents
* [[:Category:CPC_H01L21/324|H01L21/324]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/76814|H01L21/76814]] ({post-treatment or after-treatment, e.g. cleaning or removal of oxides on underlying conductors}): 1 patents
* [[:Category:CPC_H01L21/823418|H01L21/823418]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L21/823814|H01L21/823814]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L29/161|H01L29/161]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/66507|H01L29/66507]] ({providing different silicide thicknesses on the gate and on source or drain}): 1 patents
* [[:Category:CPC_H01L29/7845|H01L29/7845]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/7848|H01L29/7848]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L2029/7858|H01L2029/7858]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/568|H01L21/568]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/561|H01L21/561]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L25/0652|H01L25/0652]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents

=== Companies ===
[[File:Huicheng_Chang_Top_Companies.png|border|800px]]

==== List of Companies ====
* Taiwan Semiconductor Manufacturing Co., Ltd.: 10 patents
* Taiwan Semiconductor Manufacturing Co., Ltd: 1 patents

=== Collaborators ===
* [[:Category:Yee-Chia Yeo|Yee-Chia Yeo]][[Category:Yee-Chia Yeo]] (11 collaborations)
* [[:Category:Liang-Yin Chen|Liang-Yin Chen]][[Category:Liang-Yin Chen]] (5 collaborations)
* [[:Category:Su-Hao Liu|Su-Hao Liu]][[Category:Su-Hao Liu]] (3 collaborations)
* [[:Category:Jyh-Cherng Sheu|Jyh-Cherng Sheu]][[Category:Jyh-Cherng Sheu]] (2 collaborations)
* [[:Category:Chen-Fong Tsai|Chen-Fong Tsai]][[Category:Chen-Fong Tsai]] (2 collaborations)
* [[:Category:Yun Chen Teng|Yun Chen Teng]][[Category:Yun Chen Teng]] (2 collaborations)
* [[:Category:Han-De Chen|Han-De Chen]][[Category:Han-De Chen]] (2 collaborations)
* [[:Category:Chia-Cheng Chen|Chia-Cheng Chen]][[Category:Chia-Cheng Chen]] (2 collaborations)
* [[:Category:Wen-Yen Chen|Wen-Yen Chen]][[Category:Wen-Yen Chen]] (2 collaborations)
* [[:Category:Tsai-Yu Huang|Tsai-Yu Huang]][[Category:Tsai-Yu Huang]] (2 collaborations)
* [[:Category:Wei-Ting Chien|Wei-Ting Chien]][[Category:Wei-Ting Chien]] (1 collaborations)
* [[:Category:Jhih-Yong Han|Jhih-Yong Han]][[Category:Jhih-Yong Han]] (1 collaborations)
* [[:Category:Yi-Ting Wu|Yi-Ting Wu]][[Category:Yi-Ting Wu]] (1 collaborations)
* [[:Category:Szu-Ying Chen|Szu-Ying Chen]][[Category:Szu-Ying Chen]] (1 collaborations)
* [[:Category:Sen-Hong Syue|Sen-Hong Syue]][[Category:Sen-Hong Syue]] (1 collaborations)
* [[:Category:Yu-Chang Lin|Yu-Chang Lin]][[Category:Yu-Chang Lin]] (1 collaborations)
* [[:Category:Chun-Feng Nieh|Chun-Feng Nieh]][[Category:Chun-Feng Nieh]] (1 collaborations)
* [[:Category:Kuo-Ju Chen|Kuo-Ju Chen]][[Category:Kuo-Ju Chen]] (1 collaborations)
* [[:Category:Kai-Hsuan Lee|Kai-Hsuan Lee]][[Category:Kai-Hsuan Lee]] (1 collaborations)
* [[:Category:I-Hsieh Wong|I-Hsieh Wong]][[Category:I-Hsieh Wong]] (1 collaborations)
* [[:Category:Cheng-Yu Yang|Cheng-Yu Yang]][[Category:Cheng-Yu Yang]] (1 collaborations)
* [[:Category:Syun-Ming Jang|Syun-Ming Jang]][[Category:Syun-Ming Jang]] (1 collaborations)
* [[:Category:Meng-Han Chou|Meng-Han Chou]][[Category:Meng-Han Chou]] (1 collaborations)
* [[:Category:Chih-Kai Yang|Chih-Kai Yang]][[Category:Chih-Kai Yang]] (1 collaborations)
* [[:Category:Po-Kang Ho|Po-Kang Ho]][[Category:Po-Kang Ho]] (1 collaborations)
* [[:Category:Tsan-Chun Wang|Tsan-Chun Wang]][[Category:Tsan-Chun Wang]] (1 collaborations)
* [[:Category:Li-Heng Chen|Li-Heng Chen]][[Category:Li-Heng Chen]] (1 collaborations)
* [[:Category:Li-Ting Wang|Li-Ting Wang]][[Category:Li-Ting Wang]] (1 collaborations)
* [[:Category:Ying-Lang Wang|Ying-Lang Wang]][[Category:Ying-Lang Wang]] (1 collaborations)

[[Category:Huicheng Chang]]
[[Category:Inventors]]
[[Category:Inventors filing patents with Taiwan Semiconductor Manufacturing Co., Ltd.]]
[[Category:Inventors filing patents with Taiwan Semiconductor Manufacturing Co., Ltd]]