View source for Category:I-Lun MA

== I-Lun MA ==

=== Executive Summary ===
I-Lun MA is an inventor who has filed 2 patents. Their primary areas of innovation include {the electrode extending at least partially onto a side surface of the semiconductor body} (2 patents), {comprising nitride compounds} (2 patents), Reflective coating, e.g. dielectric Bragg reflector (2 patents), and they have worked with companies such as EPISTAR CORPORATION (2 patents). Their most frequent collaborators include [[Category:Chao-Hsing CHEN|Chao-Hsing CHEN]] (2 collaborations), [[Category:Cheng-Lin LU|Cheng-Lin LU]] (1 collaborations), [[Category:Chih-Hao CHEN|Chih-Hao CHEN]] (1 collaborations).

=== Patent Filing Activity ===
[[File:I-Lun_MA_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:I-Lun_MA_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_H01L33/385|H01L33/385]] ({the electrode extending at least partially onto a side surface of the semiconductor body}): 2 patents
* [[:Category:CPC_H01L33/0075|H01L33/0075]] ({comprising nitride compounds}): 2 patents
* [[:Category:CPC_H01L33/46|H01L33/46]] (Reflective coating, e.g. dielectric Bragg reflector): 2 patents
* [[:Category:CPC_H01L33/24|H01L33/24]] (of the light emitting region, e.g. non-planar junction): 2 patents
* [[:Category:CPC_H01L33/10|H01L33/10]] (with a light reflecting structure, e.g. semiconductor Bragg reflector): 1 patents
* [[:Category:CPC_H01L33/32|H01L33/32]] (containing nitrogen): 1 patents
* [[:Category:CPC_H01L25/0753|H01L25/0753]] (the devices being of a type provided for in group): 1 patents
* [[:Category:CPC_H01L33/36|H01L33/36]] (characterised by the electrodes): 1 patents
* [[:Category:CPC_H01L27/156|H01L27/156]] (including semiconductor components having potential barriers, specially adapted for light emission): 1 patents
* [[:Category:CPC_H01L33/0093|H01L33/0093]] ({Wafer bonding; Removal of the growth substrate}): 1 patents
* [[:Category:CPC_H01L33/12|H01L33/12]] (with a stress relaxation structure, e.g. buffer layer): 1 patents
* [[:Category:CPC_H01L33/30|H01L33/30]] (containing only elements of Group III and Group V of the Periodic Table): 1 patents
* [[:Category:CPC_H01L33/42|H01L33/42]] (Transparent materials): 1 patents
* [[:Category:CPC_H01L33/62|H01L33/62]] (Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls): 1 patents
* [[:Category:CPC_H01L2933/0016|H01L2933/0016]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents

=== Companies ===
[[File:I-Lun_MA_Top_Companies.png|border|800px]]

==== List of Companies ====
* EPISTAR CORPORATION: 2 patents

=== Collaborators ===
* [[:Category:Chao-Hsing CHEN|Chao-Hsing CHEN]][[Category:Chao-Hsing CHEN]] (2 collaborations)
* [[:Category:Cheng-Lin LU|Cheng-Lin LU]][[Category:Cheng-Lin LU]] (1 collaborations)
* [[:Category:Chih-Hao CHEN|Chih-Hao CHEN]][[Category:Chih-Hao CHEN]] (1 collaborations)
* [[:Category:Chi-Shiang HSU|Chi-Shiang HSU]][[Category:Chi-Shiang HSU]] (1 collaborations)
* [[:Category:Meng-Hsiang HONG|Meng-Hsiang HONG]][[Category:Meng-Hsiang HONG]] (1 collaborations)
* [[:Category:Hsin-Ying WANG|Hsin-Ying WANG]][[Category:Hsin-Ying WANG]] (1 collaborations)
* [[:Category:Kuo-Ching HUNG|Kuo-Ching HUNG]][[Category:Kuo-Ching HUNG]] (1 collaborations)
* [[:Category:Yi-Hung LIN|Yi-Hung LIN]][[Category:Yi-Hung LIN]] (1 collaborations)
* [[:Category:Bo-Jiun HU|Bo-Jiun HU]][[Category:Bo-Jiun HU]] (1 collaborations)
* [[:Category:Yu-Ling LIN|Yu-Ling LIN]][[Category:Yu-Ling LIN]] (1 collaborations)
* [[:Category:Chien-Chih LIAO|Chien-Chih LIAO]][[Category:Chien-Chih LIAO]] (1 collaborations)

[[Category:I-Lun MA]]
[[Category:Inventors]]
[[Category:Inventors filing patents with EPISTAR CORPORATION]]