View source for Category:Jochem Sebastiaan WILDENBERG

== Jochem Sebastiaan WILDENBERG ==

=== Executive Summary ===
Jochem Sebastiaan WILDENBERG is an inventor who has filed 4 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (3 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), and they have worked with companies such as ASML NETHERLANDS B.V. (4 patents). Their most frequent collaborators include [[Category:Frans Reinier SPIERING|Frans Reinier SPIERING]] (2 collaborations), [[Category:Aliasghar KEYVANI JANBAHAN|Aliasghar KEYVANI JANBAHAN]] (1 collaborations), [[Category:Everhardus Cornelis MOS|Everhardus Cornelis MOS]] (1 collaborations).

=== Patent Filing Activity ===
[[File:Jochem_Sebastiaan_WILDENBERG_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:Jochem_Sebastiaan_WILDENBERG_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_G03F7/70633|G03F7/70633]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 3 patents
* [[:Category:CPC_G03F7/706839|G03F7/706839]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_G03F7/706837|G03F7/706837]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_G03F7/70625|G03F7/70625]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_G03F7/70641|G03F7/70641]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_G03F7/70525|G03F7/70525]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/705|G03F7/705]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents

=== Companies ===
[[File:Jochem_Sebastiaan_WILDENBERG_Top_Companies.png|border|800px]]

==== List of Companies ====
* ASML NETHERLANDS B.V.: 4 patents

=== Collaborators ===
* [[:Category:Frans Reinier SPIERING|Frans Reinier SPIERING]][[Category:Frans Reinier SPIERING]] (2 collaborations)
* [[:Category:Aliasghar KEYVANI JANBAHAN|Aliasghar KEYVANI JANBAHAN]][[Category:Aliasghar KEYVANI JANBAHAN]] (1 collaborations)
* [[:Category:Everhardus Cornelis MOS|Everhardus Cornelis MOS]][[Category:Everhardus Cornelis MOS]] (1 collaborations)
* [[:Category:Thomas THEEUWES|Thomas THEEUWES]][[Category:Thomas THEEUWES]] (1 collaborations)
* [[:Category:Lei ZHANG|Lei ZHANG]][[Category:Lei ZHANG]] (1 collaborations)
* [[:Category:Ronald VAN ITHERSUM|Ronald VAN ITHERSUM]][[Category:Ronald VAN ITHERSUM]] (1 collaborations)
* [[:Category:Roy WERKMAN|Roy WERKMAN]][[Category:Roy WERKMAN]] (1 collaborations)
* [[:Category:Manouk RIJPSTRA|Manouk RIJPSTRA]][[Category:Manouk RIJPSTRA]] (1 collaborations)
* [[:Category:Dogacan KARA|Dogacan KARA]][[Category:Dogacan KARA]] (1 collaborations)
* [[:Category:Erik JENSEN|Erik JENSEN]][[Category:Erik JENSEN]] (1 collaborations)
* [[:Category:David Frans Simon DECKERS|David Frans Simon DECKERS]][[Category:David Frans Simon DECKERS]] (1 collaborations)
* [[:Category:Sila GULER|Sila GULER]][[Category:Sila GULER]] (1 collaborations)
* [[:Category:Reinaldo Antonio ASTUDILLO RENGIFO|Reinaldo Antonio ASTUDILLO RENGIFO]][[Category:Reinaldo Antonio ASTUDILLO RENGIFO]] (1 collaborations)
* [[:Category:Yasri YUDHISTIRA|Yasri YUDHISTIRA]][[Category:Yasri YUDHISTIRA]] (1 collaborations)
* [[:Category:Gijs HILHORST|Gijs HILHORST]][[Category:Gijs HILHORST]] (1 collaborations)
* [[:Category:David Ricardo CAICEDO FERNANDEZ|David Ricardo CAICEDO FERNANDEZ]][[Category:David Ricardo CAICEDO FERNANDEZ]] (1 collaborations)
* [[:Category:Sinatra Canggih KHO|Sinatra Canggih KHO]][[Category:Sinatra Canggih KHO]] (1 collaborations)
* [[:Category:Herman Martin BLOM|Herman Martin BLOM]][[Category:Herman Martin BLOM]] (1 collaborations)
* [[:Category:Sang Uk KIM|Sang Uk KIM]][[Category:Sang Uk KIM]] (1 collaborations)
* [[:Category:Hyun-Su KIM|Hyun-Su KIM]][[Category:Hyun-Su KIM]] (1 collaborations)

[[Category:Jochem Sebastiaan WILDENBERG]]
[[Category:Inventors]]
[[Category:Inventors filing patents with ASML NETHERLANDS B.V.]]