View source for Category:Koen Martin Willem Jan BOS

== Koen Martin Willem Jan BOS ==

=== Executive Summary ===
Koen Martin Willem Jan BOS is an inventor who has filed 1 patents. Their primary areas of innovation include MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR  (radiation pyrometry (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), and they have worked with companies such as ASML Netherland B.V. (1 patents). Their most frequent collaborators include [[Category:Joost André KLUGKIST|Joost André KLUGKIST]] (1 collaborations), [[Category:Anirudh ANAND|Anirudh ANAND]] (1 collaborations).

=== Patent Filing Activity ===
[[File:Koen_Martin_Willem_Jan_BOS_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:Koen_Martin_Willem_Jan_BOS_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_G01K11/12|G01K11/12]] (MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR  (radiation pyrometry): 1 patents
* [[:Category:CPC_G03F7/7015|G03F7/7015]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/70316|G03F7/70316]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/70525|G03F7/70525]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/7085|G03F7/7085]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/70891|G03F7/70891]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/70958|G03F7/70958]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents

=== Companies ===
[[File:Koen_Martin_Willem_Jan_BOS_Top_Companies.png|border|800px]]

==== List of Companies ====
* ASML Netherland B.V.: 1 patents

=== Collaborators ===
* [[:Category:Joost André KLUGKIST|Joost André KLUGKIST]][[Category:Joost André KLUGKIST]] (1 collaborations)
* [[:Category:Anirudh ANAND|Anirudh ANAND]][[Category:Anirudh ANAND]] (1 collaborations)

[[Category:Koen Martin Willem Jan BOS]]
[[Category:Inventors]]
[[Category:Inventors filing patents with ASML Netherland B.V.]]