View source for Category:Leendert Jan KARSSEMEIJER

== Leendert Jan KARSSEMEIJER ==

=== Executive Summary ===
Leendert Jan KARSSEMEIJER is an inventor who has filed 4 patents. Their primary areas of innovation include {for microlithography  (measuring printed patterns for monitoring overlay (3 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), {for microlithography  (measuring printed patterns for monitoring overlay (2 patents), and they have worked with companies such as ASML NETHERLANDS B.V. (2 patents), ASML Netherlands B.V. (2 patents). Their most frequent collaborators include [[Category:Nick Franciscus Wilhelmus THISSEN|Nick Franciscus Wilhelmus THISSEN]] (2 collaborations), [[Category:Sebastianus Adrianus GOORDEN|Sebastianus Adrianus GOORDEN]] (1 collaborations), [[Category:Simon Gijsbert Josephus MATHIJSSEN|Simon Gijsbert Josephus MATHIJSSEN]] (1 collaborations).

=== Patent Filing Activity ===
[[File:Leendert_Jan_KARSSEMEIJER_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:Leendert_Jan_KARSSEMEIJER_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_G03F9/7046|G03F9/7046]] ({for microlithography  (measuring printed patterns for monitoring overlay): 3 patents
* [[:Category:CPC_G03F7/706837|G03F7/706837]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_G03F9/7092|G03F9/7092]] ({for microlithography  (measuring printed patterns for monitoring overlay): 2 patents
* [[:Category:CPC_G03F9/7088|G03F9/7088]] ({for microlithography  (measuring printed patterns for monitoring overlay): 2 patents
* [[:Category:CPC_G03F7/70633|G03F7/70633]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/706831|G03F7/706831]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/70625|G03F7/70625]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/70508|G03F7/70508]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F9/7049|G03F9/7049]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
* [[:Category:CPC_G01B9/02062|G01B9/02062]] (Interferometers): 1 patents
* [[:Category:CPC_G01B11/161|G01B11/161]] (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
* [[:Category:CPC_G01B11/272|G01B11/272]] (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
* [[:Category:CPC_G03F7/70616|G03F7/70616]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/706841|G03F7/706841]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F9/7065|G03F9/7065]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents

=== Companies ===
[[File:Leendert_Jan_KARSSEMEIJER_Top_Companies.png|border|800px]]

==== List of Companies ====
* ASML NETHERLANDS B.V.: 2 patents
* ASML Netherlands B.V.: 2 patents

=== Collaborators ===
* [[:Category:Nick Franciscus Wilhelmus THISSEN|Nick Franciscus Wilhelmus THISSEN]][[Category:Nick Franciscus Wilhelmus THISSEN]] (2 collaborations)
* [[:Category:Sebastianus Adrianus GOORDEN|Sebastianus Adrianus GOORDEN]][[Category:Sebastianus Adrianus GOORDEN]] (1 collaborations)
* [[:Category:Simon Gijsbert Josephus MATHIJSSEN|Simon Gijsbert Josephus MATHIJSSEN]][[Category:Simon Gijsbert Josephus MATHIJSSEN]] (1 collaborations)
* [[:Category:Manouk RIJPSTRA|Manouk RIJPSTRA]][[Category:Manouk RIJPSTRA]] (1 collaborations)
* [[:Category:Ralph BRINKHOF|Ralph BRINKHOF]][[Category:Ralph BRINKHOF]] (1 collaborations)
* [[:Category:Kaustuve BHATTACHARYYA|Kaustuve BHATTACHARYYA]][[Category:Kaustuve BHATTACHARYYA]] (1 collaborations)
* [[:Category:Patricius Aloysius Jacobus TINNEMANS|Patricius Aloysius Jacobus TINNEMANS]][[Category:Patricius Aloysius Jacobus TINNEMANS]] (1 collaborations)
* [[:Category:Joshua ADAMS of Wilton CT (US)|Joshua ADAMS of Wilton CT (US)]][[Category:Joshua ADAMS of Wilton CT (US)]] (1 collaborations)
* [[:Category:Leonardo Gabriel MONTILLA of Norwalk CT (US)|Leonardo Gabriel MONTILLA of Norwalk CT (US)]][[Category:Leonardo Gabriel MONTILLA of Norwalk CT (US)]] (1 collaborations)
* [[:Category:Igor Matheus Petronella AARTS of Port Chester NY (US)|Igor Matheus Petronella AARTS of Port Chester NY (US)]][[Category:Igor Matheus Petronella AARTS of Port Chester NY (US)]] (1 collaborations)
* [[:Category:Zahrasadat DASTOURI of Norwalk CT (US)|Zahrasadat DASTOURI of Norwalk CT (US)]][[Category:Zahrasadat DASTOURI of Norwalk CT (US)]] (1 collaborations)

[[Category:Leendert Jan KARSSEMEIJER]]
[[Category:Inventors]]
[[Category:Inventors filing patents with ASML NETHERLANDS B.V.]]
[[Category:Inventors filing patents with ASML Netherlands B.V.]]