View source for Category:Nadav Gutman

== Nadav Gutman ==

=== Executive Summary ===
Nadav Gutman is an inventor who has filed 3 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), and they have worked with companies such as KLA Corporation (3 patents). Their most frequent collaborators include [[Category:Amnon Manassen|Amnon Manassen]] (2 collaborations), [[Category:Frank Laske|Frank Laske]] (2 collaborations), [[Category:Nireekshan K. Reddy|Nireekshan K. Reddy]] (1 collaborations).

=== Patent Filing Activity ===
[[File:Nadav_Gutman_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:Nadav_Gutman_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_G03F7/70633|G03F7/70633]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_G03F7/706841|G03F7/706841]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/706847|G03F7/706847]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/706845|G03F7/706845]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G01B11/272|G01B11/272]] (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
* [[:Category:CPC_G01B15/00|G01B15/00]] (Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons  (characterised by the use of optical techniques): 1 patents
* [[:Category:CPC_G03F7/70655|G03F7/70655]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G01B2210/56|G01B2210/56]] (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
* [[:Category:CPC_G03F7/70625|G03F7/70625]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_H01L22/12|H01L22/12]] ({for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions  (electrical measurement of diffusions): 1 patents

=== Companies ===
[[File:Nadav_Gutman_Top_Companies.png|border|800px]]

==== List of Companies ====
* KLA Corporation: 3 patents

=== Collaborators ===
* [[:Category:Amnon Manassen|Amnon Manassen]][[Category:Amnon Manassen]] (2 collaborations)
* [[:Category:Frank Laske|Frank Laske]][[Category:Frank Laske]] (2 collaborations)
* [[:Category:Nireekshan K. Reddy|Nireekshan K. Reddy]][[Category:Nireekshan K. Reddy]] (1 collaborations)
* [[:Category:Arvind Jayaraman of New Hudson MI (US)|Arvind Jayaraman of New Hudson MI (US)]][[Category:Arvind Jayaraman of New Hudson MI (US)]] (1 collaborations)
* [[:Category:Stilian Ivanov Pandev of Santa Clara CA (US)|Stilian Ivanov Pandev of Santa Clara CA (US)]][[Category:Stilian Ivanov Pandev of Santa Clara CA (US)]] (1 collaborations)
* [[:Category:Boaz Ophir|Boaz Ophir]][[Category:Boaz Ophir]] (1 collaborations)
* [[:Category:Udi Shusterman|Udi Shusterman]][[Category:Udi Shusterman]] (1 collaborations)
* [[:Category:Andrei V. Shchegrov of Campbell CA (US)|Andrei V. Shchegrov of Campbell CA (US)]][[Category:Andrei V. Shchegrov of Campbell CA (US)]] (1 collaborations)
* [[:Category:Dana Klein|Dana Klein]][[Category:Dana Klein]] (1 collaborations)
* [[:Category:Slawomir Czerkas of Milpitas CA (US)|Slawomir Czerkas of Milpitas CA (US)]][[Category:Slawomir Czerkas of Milpitas CA (US)]] (1 collaborations)
* [[:Category:Yossi Simon of Milpitas CA (US)|Yossi Simon of Milpitas CA (US)]][[Category:Yossi Simon of Milpitas CA (US)]] (1 collaborations)
* [[:Category:Mirko Wittkoetter of Milpitas CA (US)|Mirko Wittkoetter of Milpitas CA (US)]][[Category:Mirko Wittkoetter of Milpitas CA (US)]] (1 collaborations)

[[Category:Nadav Gutman]]
[[Category:Inventors]]
[[Category:Inventors filing patents with KLA Corporation]]