View source for Category:Sebastianus Adrianus GOORDEN

== Sebastianus Adrianus GOORDEN ==

=== Executive Summary ===
Sebastianus Adrianus GOORDEN is an inventor who has filed 2 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), and they have worked with companies such as ASML Netherlands B.V. (2 patents). Their most frequent collaborators include [[Category:Simon Reinald HUISMAN|Simon Reinald HUISMAN]] (2 collaborations), [[Category:Aniruddha Ramakrishna SONDE of Stamford CT (US)|Aniruddha Ramakrishna SONDE of Stamford CT (US)]] (1 collaborations), [[Category:Mahesh Upendra AJGAONKAR of Guilford CT (US)|Mahesh Upendra AJGAONKAR of Guilford CT (US)]] (1 collaborations).

=== Patent Filing Activity ===
[[File:Sebastianus_Adrianus_GOORDEN_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:Sebastianus_Adrianus_GOORDEN_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_G03F7/706849|G03F7/706849]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G01B11/27|G01B11/27]] (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
* [[:Category:CPC_G03F7/70625|G03F7/70625]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/70633|G03F7/70633]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/706837|G03F7/706837]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/706851|G03F7/706851]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F9/7069|G03F9/7069]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
* [[:Category:CPC_G03F9/7088|G03F9/7088]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
* [[:Category:CPC_G03F9/7092|G03F9/7092]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents

=== Companies ===
[[File:Sebastianus_Adrianus_GOORDEN_Top_Companies.png|border|800px]]

==== List of Companies ====
* ASML Netherlands B.V.: 2 patents

=== Collaborators ===
* [[:Category:Simon Reinald HUISMAN|Simon Reinald HUISMAN]][[Category:Simon Reinald HUISMAN]] (2 collaborations)
* [[:Category:Aniruddha Ramakrishna SONDE of Stamford CT (US)|Aniruddha Ramakrishna SONDE of Stamford CT (US)]][[Category:Aniruddha Ramakrishna SONDE of Stamford CT (US)]] (1 collaborations)
* [[:Category:Mahesh Upendra AJGAONKAR of Guilford CT (US)|Mahesh Upendra AJGAONKAR of Guilford CT (US)]][[Category:Mahesh Upendra AJGAONKAR of Guilford CT (US)]] (1 collaborations)
* [[:Category:Krishanu SHOME of Cheshire CT (US)|Krishanu SHOME of Cheshire CT (US)]][[Category:Krishanu SHOME of Cheshire CT (US)]] (1 collaborations)
* [[:Category:Franciscus Godefridus Casper BIJNEN|Franciscus Godefridus Casper BIJNEN]][[Category:Franciscus Godefridus Casper BIJNEN]] (1 collaborations)
* [[:Category:Patrick WARNAAR|Patrick WARNAAR]][[Category:Patrick WARNAAR]] (1 collaborations)
* [[:Category:Sergei SOKOLOV|Sergei SOKOLOV]][[Category:Sergei SOKOLOV]] (1 collaborations)
* [[:Category:Stephen ROUX of New Fairfield CT (US)|Stephen ROUX of New Fairfield CT (US)]][[Category:Stephen ROUX of New Fairfield CT (US)]] (1 collaborations)

[[Category:Sebastianus Adrianus GOORDEN]]
[[Category:Inventors]]
[[Category:Inventors filing patents with ASML Netherlands B.V.]]