View source for Category:Stig Bieling

== Stig Bieling ==

=== Executive Summary ===
Stig Bieling is an inventor who has filed 2 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), and they have worked with companies such as Carl Zeiss SMT GmbH (2 patents). Their most frequent collaborators include [[Category:Markus Schwab|Markus Schwab]] (2 collaborations), [[Category:Susanne Beder|Susanne Beder]] (2 collaborations).

=== Patent Filing Activity ===
[[File:Stig_Bieling_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:Stig_Bieling_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_G03F7/70075|G03F7/70075]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_G03F7/70208|G03F7/70208]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_G03F7/70225|G03F7/70225]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_G03F7/702|G03F7/702]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/70275|G03F7/70275]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G02B17/08|G02B17/08]] (Catadioptric systems {(used in non-imaging applications): 1 patents
* [[:Category:CPC_G03F7/70091|G03F7/70091]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents

=== Companies ===
[[File:Stig_Bieling_Top_Companies.png|border|800px]]

==== List of Companies ====
* Carl Zeiss SMT GmbH: 2 patents

=== Collaborators ===
* [[:Category:Markus Schwab|Markus Schwab]][[Category:Markus Schwab]] (2 collaborations)
* [[:Category:Susanne Beder|Susanne Beder]][[Category:Susanne Beder]] (2 collaborations)

[[Category:Stig Bieling]]
[[Category:Inventors]]
[[Category:Inventors filing patents with Carl Zeiss SMT GmbH]]