View source for Category:Tatsuro NAGAHARA

== Tatsuro NAGAHARA ==

=== Executive Summary ===
Tatsuro NAGAHARA is an inventor who has filed 3 patents. Their primary areas of innovation include Polymers {(polymeric surface-active agents (1 patents), DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL (1 patents), DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL (1 patents), and they have worked with companies such as Merck Patent GmbH (2 patents), MERCK PATENT GMBH (1 patents). Their most frequent collaborators include [[Category:Takafumi KINUTA|Takafumi KINUTA]] (1 collaborations), [[Category:Takashi SEKITO|Takashi SEKITO]] (1 collaborations), [[Category:Kazuma YAMAMOTO|Kazuma YAMAMOTO]] (1 collaborations).

=== Patent Filing Activity ===
[[File:Tatsuro_NAGAHARA_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:Tatsuro_NAGAHARA_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_C11D3/3723|C11D3/3723]] (Polymers {(polymeric surface-active agents): 1 patents
* [[:Category:CPC_C11D3/43|C11D3/43]] (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
* [[:Category:CPC_C11D2111/42|C11D2111/42]] (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
* [[:Category:CPC_C09K13/00|C09K13/00]] (Etching, surface-brightening or pickling compositions  (for glass): 1 patents
* [[:Category:CPC_G03F7/11|G03F7/11]] (having cover layers or intermediate layers, e.g. subbing layers {(): 1 patents
* [[:Category:CPC_G03F7/38|G03F7/38]] (Treatment before imagewise removal, e.g. prebaking {(): 1 patents
* [[:Category:CPC_G03F7/30|G03F7/30]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/0397|G03F7/0397]] (Macromolecular compounds which are photodegradable, e.g. positive electron resists  (): 1 patents
* [[:Category:CPC_H01L21/0274|H01L21/0274]] (Making masks on semiconductor bodies for further photolithographic processing not provided for in group): 1 patents

=== Companies ===
[[File:Tatsuro_NAGAHARA_Top_Companies.png|border|800px]]

==== List of Companies ====
* Merck Patent GmbH: 2 patents
* MERCK PATENT GMBH: 1 patents

=== Collaborators ===
* [[:Category:Takafumi KINUTA|Takafumi KINUTA]][[Category:Takafumi KINUTA]] (1 collaborations)
* [[:Category:Takashi SEKITO|Takashi SEKITO]][[Category:Takashi SEKITO]] (1 collaborations)
* [[:Category:Kazuma YAMAMOTO|Kazuma YAMAMOTO]][[Category:Kazuma YAMAMOTO]] (1 collaborations)

[[Category:Tatsuro NAGAHARA]]
[[Category:Inventors]]
[[Category:Inventors filing patents with Merck Patent GmbH]]
[[Category:Inventors filing patents with MERCK PATENT GMBH]]