View source for Category:Toshiyuki UNO

== Toshiyuki UNO ==

=== Executive Summary ===
Toshiyuki UNO is an inventor who has filed 5 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (5 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), and they have worked with companies such as AGC Inc. (3 patents), AGC INC. (2 patents). Their most frequent collaborators include [[Category:Hiroshi HANEKAWA|Hiroshi HANEKAWA]] (3 collaborations), [[Category:Daijiro AKAGI|Daijiro AKAGI]] (3 collaborations), [[Category:Hiroaki IWAOKA|Hiroaki IWAOKA]] (2 collaborations).

=== Patent Filing Activity ===
[[File:Toshiyuki_UNO_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:Toshiyuki_UNO_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_G03F1/24|G03F1/24]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 5 patents
* [[:Category:CPC_G03F1/52|G03F1/52]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_G03F1/48|G03F1/48]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_H01L21/0274|H01L21/0274]] (Making masks on semiconductor bodies for further photolithographic processing not provided for in group): 1 patents
* [[:Category:CPC_H01L21/0332|H01L21/0332]] (comprising inorganic layers): 1 patents
* [[:Category:CPC_H01L21/0337|H01L21/0337]] ({characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment}): 1 patents
* [[:Category:CPC_G03F1/32|G03F1/32]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F1/54|G03F1/54]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents

=== Companies ===
[[File:Toshiyuki_UNO_Top_Companies.png|border|800px]]

==== List of Companies ====
* AGC Inc.: 3 patents
* AGC INC.: 2 patents

=== Collaborators ===
* [[:Category:Hiroshi HANEKAWA|Hiroshi HANEKAWA]][[Category:Hiroshi HANEKAWA]] (3 collaborations)
* [[:Category:Daijiro AKAGI|Daijiro AKAGI]][[Category:Daijiro AKAGI]] (3 collaborations)
* [[:Category:Hiroaki IWAOKA|Hiroaki IWAOKA]][[Category:Hiroaki IWAOKA]] (2 collaborations)
* [[:Category:Keishi TSUKIYAMA|Keishi TSUKIYAMA]][[Category:Keishi TSUKIYAMA]] (2 collaborations)
* [[:Category:Hirotomo KAWAHARA of Cuptertino CA (US)|Hirotomo KAWAHARA of Cuptertino CA (US)]][[Category:Hirotomo KAWAHARA of Cuptertino CA (US)]] (1 collaborations)
* [[:Category:Masafumi AKITA|Masafumi AKITA]][[Category:Masafumi AKITA]] (1 collaborations)
* [[:Category:Hirotomo KAWAHARA|Hirotomo KAWAHARA]][[Category:Hirotomo KAWAHARA]] (1 collaborations)
* [[:Category:Michinori SUEHARA|Michinori SUEHARA]][[Category:Michinori SUEHARA]] (1 collaborations)
* [[:Category:Hiroyoshi TANABE|Hiroyoshi TANABE]][[Category:Hiroyoshi TANABE]] (1 collaborations)
* [[:Category:Takuma KATO|Takuma KATO]][[Category:Takuma KATO]] (1 collaborations)
* [[:Category:Ryusuke OISHI|Ryusuke OISHI]][[Category:Ryusuke OISHI]] (1 collaborations)
* [[:Category:Sadatatsu IKEDA|Sadatatsu IKEDA]][[Category:Sadatatsu IKEDA]] (1 collaborations)
* [[:Category:Yukihiro IWATA|Yukihiro IWATA]][[Category:Yukihiro IWATA]] (1 collaborations)
* [[:Category:Chikako HANZAWA|Chikako HANZAWA]][[Category:Chikako HANZAWA]] (1 collaborations)
* [[:Category:Shunya TAKI|Shunya TAKI]][[Category:Shunya TAKI]] (1 collaborations)
* [[:Category:Kenichi SASAKI|Kenichi SASAKI]][[Category:Kenichi SASAKI]] (1 collaborations)
* [[:Category:Ichiro ISHIKAWA|Ichiro ISHIKAWA]][[Category:Ichiro ISHIKAWA]] (1 collaborations)

[[Category:Toshiyuki UNO]]
[[Category:Inventors]]
[[Category:Inventors filing patents with AGC Inc.]]
[[Category:Inventors filing patents with AGC INC.]]