Category:Ta-Chun LIN: Difference between revisions

Revision as of 03:43, 28 March 2025

Ta-Chun LIN

Executive Summary

Ta-Chun LIN is an inventor who has filed 9 patents. Their primary areas of innovation include SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (6 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (6 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (6 patents), and they have worked with companies such as Taiwan Semiconductor Manufacturing Company, Ltd. (8 patents), TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (1 patents). Their most frequent collaborators include (3 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

File:Ta-Chun LIN Monthly Patent Applications.png

Technology Areas

File:Ta-Chun LIN Top Technology Areas.png

List of Technology Areas

H01L29/42392 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents
H01L29/0673 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents
H01L29/775 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents
H01L29/66439 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
H01L29/66545 ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 4 patents
H01L29/66553 ({using self aligned silicidation, i.e. salicide (formation of conductive layers comprising silicides): 3 patents
H01L27/088 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
H01L29/41775 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
H10D84/038 (No explanation available): 3 patents
H01L29/0847 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
H01L21/823481 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
H01L27/092 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
H01L2029/42388 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
H01L29/6653 ({using self aligned silicidation, i.e. salicide (formation of conductive layers comprising silicides): 1 patents
H01L21/823475 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
H10D84/83 (No explanation available): 1 patents
H01L21/76804 ({by forming tapered via holes}): 1 patents
H01L23/5226 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
H10D84/0149 (No explanation available): 1 patents
H10D84/834 (No explanation available): 1 patents
H10D30/0243 (No explanation available): 1 patents
H10D30/6211 (No explanation available): 1 patents
H10D62/115 (No explanation available): 1 patents
H10D84/0151 (No explanation available): 1 patents
H10D84/0158 (No explanation available): 1 patents
H01L29/41733 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
H01L21/28518 (from a gas or vapour, e.g. condensation): 1 patents
H01L29/401 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
H10D30/6729 (No explanation available): 1 patents
H10D30/014 (No explanation available): 1 patents
H10D30/43 (No explanation available): 1 patents
H10D30/6735 (No explanation available): 1 patents
H10D30/6757 (No explanation available): 1 patents
H10D62/121 (No explanation available): 1 patents
H10D64/017 (No explanation available): 1 patents
H10D84/0167 (No explanation available): 1 patents
H10D84/017 (No explanation available): 1 patents
H10D84/85 (No explanation available): 1 patents
H01L29/41766 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents

Companies

File:Ta-Chun LIN Top Companies.png

List of Companies

Taiwan Semiconductor Manufacturing Company, Ltd.: 8 patents
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.: 1 patents

Collaborators

Jhon Jhy Liaw (3 collaborations)
Jhon-Jhy LIAW (2 collaborations)
Chun-Sheng Liang (2 collaborations)
Chun-Wing Yeung (1 collaborations)
Feng-Ming CHANG (1 collaborations)
Ming-Heng Tsai (1 collaborations)
Kuo-Hua PAN (1 collaborations)
Jhon Jhy LIAW (1 collaborations)
Ming-Heng TSAI (1 collaborations)
Huang-Chao Chang (1 collaborations)
Yen-Cheng Lai (1 collaborations)
Wen-Chiang Hong (1 collaborations)
Chih-Hao Chang (1 collaborations)

Subcategories

This category has the following 5 subcategories, out of 5 total.

C

► Chih-Hao CHANG‎ (4 C)
► Chun-Sheng LIANG‎ (4 C)

J

► Jhon Jhy LIAW‎ (4 C)
► Jhon-Jhy LIAW‎ (4 C)

T

► Ta-Chun LIN‎ (5 C)

@@ Line 2: / Line 2: @@
 === Executive Summary ===
-Ta-Chun LIN is an inventor who has filed 32 patents. Their primary areas of innovation include SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (23 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (22 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (18 patents), and they have worked with companies such as TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (19 patents), Taiwan Semiconductor Manufacturing Company, Ltd. (13 patents). Their most frequent collaborators include [[Category:Chun-Sheng LIANG|Chun-Sheng LIANG]] (13 collaborations), [[Category:Chih-Hao CHANG|Chih-Hao CHANG]] (12 collaborations), [[Category:Kuo-Hua PAN|Kuo-Hua PAN]] (11 collaborations).
+Ta-Chun LIN is an inventor who has filed 9 patents. Their primary areas of innovation include SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (6 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (6 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (6 patents), and they have worked with companies such as Taiwan Semiconductor Manufacturing Company, Ltd. (8 patents), TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (1 patents). Their most frequent collaborators include [[Category:Jhon Jhy Liaw|Jhon Jhy Liaw]] (3 collaborations), [[Category:Jhon-Jhy LIAW|Jhon-Jhy LIAW]] (2 collaborations), [[Category:Chun-Sheng Liang|Chun-Sheng Liang]] (2 collaborations).
 === Patent Filing Activity ===
@@ Line 11: / Line 11: @@
 ==== List of Technology Areas ====
-* [[:Category:CPC_H01L29/0673|H01L29/0673]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 23 patents
+* [[:Category:CPC_H01L29/42392|H01L29/42392]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents
-* [[:Category:CPC_H01L29/42392|H01L29/42392]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 22 patents
+* [[:Category:CPC_H01L29/0673|H01L29/0673]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents
-* [[:Category:CPC_H01L29/775|H01L29/775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 18 patents
+* [[:Category:CPC_H01L29/775|H01L29/775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents
-* [[:Category:CPC_H01L29/66439|H01L29/66439]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 16 patents
+* [[:Category:CPC_H01L29/66439|H01L29/66439]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
-* [[:Category:CPC_H01L29/66545|H01L29/66545]] ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 15 patents
+* [[:Category:CPC_H01L29/66545|H01L29/66545]] ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 4 patents
-* [[:Category:CPC_H01L29/78696|H01L29/78696]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 13 patents
+* [[:Category:CPC_H01L29/66553|H01L29/66553]] ({using self aligned silicidation, i.e. salicide  (formation of conductive layers comprising silicides): 3 patents
-* [[:Category:CPC_H01L29/0847|H01L29/0847]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 11 patents
+* [[:Category:CPC_H01L27/088|H01L27/088]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
-* [[:Category:CPC_H01L21/823412|H01L21/823412]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 9 patents
+* [[:Category:CPC_H01L29/41775|H01L29/41775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
-* [[:Category:CPC_H01L21/823418|H01L21/823418]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 7 patents
+* [[:Category:CPC_H10D84/038|H10D84/038]] (No explanation available): 3 patents
-* [[:Category:CPC_H01L21/823481|H01L21/823481]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 6 patents
+* [[:Category:CPC_H01L29/0847|H01L29/0847]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
-* [[:Category:CPC_H01L21/823431|H01L21/823431]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 6 patents
+* [[:Category:CPC_H01L21/823481|H01L21/823481]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
-* [[:Category:CPC_H01L29/41733|H01L29/41733]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents
+* [[:Category:CPC_H01L27/092|H01L27/092]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L27/092|H01L27/092]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 5 patents
+* [[:Category:CPC_H01L2029/42388|H01L2029/42388]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L29/7851|H01L29/7851]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 5 patents
+* [[:Category:CPC_H01L29/6653|H01L29/6653]] ({using self aligned silicidation, i.e. salicide  (formation of conductive layers comprising silicides): 1 patents
-* [[:Category:CPC_H01L29/66795|H01L29/66795]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
+* [[:Category:CPC_H01L21/823475|H01L21/823475]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
-* [[:Category:CPC_H01L21/823807|H01L21/823807]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 3 patents
+* [[:Category:CPC_H10D84/83|H10D84/83]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L21/823878|H01L21/823878]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 3 patents
+* [[:Category:CPC_H01L21/76804|H01L21/76804]] ({by forming tapered via holes}): 1 patents
-* [[:Category:CPC_H01L27/0924|H01L27/0924]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
+* [[:Category:CPC_H01L23/5226|H01L23/5226]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L21/823821|H01L21/823821]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 3 patents
+* [[:Category:CPC_H10D84/0149|H10D84/0149]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L21/823814|H01L21/823814]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 3 patents
+* [[:Category:CPC_H10D84/834|H10D84/834]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L29/0649|H01L29/0649]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
+* [[:Category:CPC_H10D30/0243|H10D30/0243]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L21/823871|H01L21/823871]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
+* [[:Category:CPC_H10D30/6211|H10D30/6211]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L29/41791|H01L29/41791]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
+* [[:Category:CPC_H10D62/115|H10D62/115]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L29/401|H01L29/401]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
+* [[:Category:CPC_H10D84/0151|H10D84/0151]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L27/0886|H01L27/0886]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
+* [[:Category:CPC_H10D84/0158|H10D84/0158]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L21/823864|H01L21/823864]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
+* [[:Category:CPC_H01L29/41733|H01L29/41733]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L27/088|H01L27/088]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
+* [[:Category:CPC_H01L21/28518|H01L21/28518]] (from a gas or vapour, e.g. condensation): 1 patents
-* [[:Category:CPC_H01L27/0922|H01L27/0922]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
+* [[:Category:CPC_H01L29/401|H01L29/401]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L23/481|H01L23/481]] (Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements {; Selection of materials therefor}): 1 patents
+* [[:Category:CPC_H10D30/6729|H10D30/6729]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L29/6656|H01L29/6656]] ({using self aligned silicidation, i.e. salicide  (formation of conductive layers comprising silicides): 1 patents
+* [[:Category:CPC_H10D30/014|H10D30/014]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L29/6681|H01L29/6681]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
+* [[:Category:CPC_H10D30/43|H10D30/43]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L29/66787|H01L29/66787]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
+* [[:Category:CPC_H10D30/6735|H10D30/6735]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L21/3065|H01L21/3065]] (Plasma etching; Reactive-ion etching): 1 patents
+* [[:Category:CPC_H10D30/6757|H10D30/6757]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L29/66742|H01L29/66742]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
+* [[:Category:CPC_H10D62/121|H10D62/121]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L21/308|H01L21/308]] (using masks  (): 1 patents
+* [[:Category:CPC_H10D64/017|H10D64/017]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L21/02603|H01L21/02603]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
+* [[:Category:CPC_H10D84/0167|H10D84/0167]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L29/785|H01L29/785]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
+* [[:Category:CPC_H10D84/017|H10D84/017]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L27/0928|H01L27/0928]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
+* [[:Category:CPC_H10D84/85|H10D84/85]] (No explanation available): 1 patents
-* [[:Category:CPC_H10B10/12|H10B10/12]] (ELECTRONIC MEMORY DEVICES): 1 patents
+* [[:Category:CPC_H01L29/41766|H01L29/41766]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_G11C11/412|G11C11/412]] (using field-effect transistors only): 1 patents
 === Companies ===
@@ Line 56: / Line 55: @@
 ==== List of Companies ====
-* TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.: 19 patents
+* Taiwan Semiconductor Manufacturing Company, Ltd.: 8 patents
-* Taiwan Semiconductor Manufacturing Company, Ltd.: 13 patents
+* TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.: 1 patents
 === Collaborators ===
-* [[:Category:Chun-Sheng LIANG|Chun-Sheng LIANG]][[Category:Chun-Sheng LIANG]] (13 collaborations)
+* [[:Category:Jhon Jhy Liaw|Jhon Jhy Liaw]][[Category:Jhon Jhy Liaw]] (3 collaborations)
-* [[:Category:Chih-Hao CHANG|Chih-Hao CHANG]][[Category:Chih-Hao CHANG]] (12 collaborations)
+* [[:Category:Jhon-Jhy LIAW|Jhon-Jhy LIAW]][[Category:Jhon-Jhy LIAW]] (2 collaborations)
-* [[:Category:Kuo-Hua PAN|Kuo-Hua PAN]][[Category:Kuo-Hua PAN]] (11 collaborations)
+* [[:Category:Chun-Sheng Liang|Chun-Sheng Liang]][[Category:Chun-Sheng Liang]] (2 collaborations)
-* [[:Category:Jhon Jhy LIAW|Jhon Jhy LIAW]][[Category:Jhon Jhy LIAW]] (11 collaborations)
+* [[:Category:Chun-Wing Yeung|Chun-Wing Yeung]][[Category:Chun-Wing Yeung]] (1 collaborations)
-* [[:Category:Jhon-Jhy LIAW|Jhon-Jhy LIAW]][[Category:Jhon-Jhy LIAW]] (8 collaborations)
+* [[:Category:Feng-Ming CHANG|Feng-Ming CHANG]][[Category:Feng-Ming CHANG]] (1 collaborations)
-* [[:Category:Chun-Jun LIN|Chun-Jun LIN]][[Category:Chun-Jun LIN]] (5 collaborations)
+* [[:Category:Ming-Heng Tsai|Ming-Heng Tsai]][[Category:Ming-Heng Tsai]] (1 collaborations)
-* [[:Category:Ming-Heng TSAI|Ming-Heng TSAI]][[Category:Ming-Heng TSAI]] (4 collaborations)
+* [[:Category:Kuo-Hua PAN|Kuo-Hua PAN]][[Category:Kuo-Hua PAN]] (1 collaborations)
-* [[:Category:Wen-Chiang HONG|Wen-Chiang HONG]][[Category:Wen-Chiang HONG]] (3 collaborations)
+* [[:Category:Jhon Jhy LIAW|Jhon Jhy LIAW]][[Category:Jhon Jhy LIAW]] (1 collaborations)
-* [[:Category:Chun-Wing YEUNG|Chun-Wing YEUNG]][[Category:Chun-Wing YEUNG]] (3 collaborations)
+* [[:Category:Ming-Heng TSAI|Ming-Heng TSAI]][[Category:Ming-Heng TSAI]] (1 collaborations)
-* [[:Category:Ming-Che CHEN|Ming-Che CHEN]][[Category:Ming-Che CHEN]] (3 collaborations)
+* [[:Category:Huang-Chao Chang|Huang-Chao Chang]][[Category:Huang-Chao Chang]] (1 collaborations)
-* [[:Category:Jyun-Yang SHEN|Jyun-Yang SHEN]][[Category:Jyun-Yang SHEN]] (3 collaborations)
+* [[:Category:Yen-Cheng Lai|Yen-Cheng Lai]][[Category:Yen-Cheng Lai]] (1 collaborations)
-* [[:Category:Huang-Chao CHANG|Huang-Chao CHANG]][[Category:Huang-Chao CHANG]] (3 collaborations)
+* [[:Category:Wen-Chiang Hong|Wen-Chiang Hong]][[Category:Wen-Chiang Hong]] (1 collaborations)
-* [[:Category:Shih-Hsun CHANG|Shih-Hsun CHANG]][[Category:Shih-Hsun CHANG]] (2 collaborations)
-* [[:Category:Chih-Hung HSIEH|Chih-Hung HSIEH]][[Category:Chih-Hung HSIEH]] (2 collaborations)
-* [[:Category:Yi-Hsien CHEN|Yi-Hsien CHEN]][[Category:Yi-Hsien CHEN]] (2 collaborations)
-* [[:Category:Hong-Chih CHEN|Hong-Chih CHEN]][[Category:Hong-Chih CHEN]] (1 collaborations)
-* [[:Category:Yu-Hsuan LU|Yu-Hsuan LU]][[Category:Yu-Hsuan LU]] (1 collaborations)
-* [[:Category:Yu-Chang LIANG|Yu-Chang LIANG]][[Category:Yu-Chang LIANG]] (1 collaborations)
-* [[:Category:Pin Chun SHEN|Pin Chun SHEN]][[Category:Pin Chun SHEN]] (1 collaborations)
-* [[:Category:Che Chia CHANG|Che Chia CHANG]][[Category:Che Chia CHANG]] (1 collaborations)
-* [[:Category:Li-Ying WU|Li-Ying WU]][[Category:Li-Ying WU]] (1 collaborations)
-* [[:Category:Jen-Hsiang LU|Jen-Hsiang LU]][[Category:Jen-Hsiang LU]] (1 collaborations)
-* [[:Category:JHON JHY LIAW|JHON JHY LIAW]][[Category:JHON JHY LIAW]] (1 collaborations)
-* [[:Category:Yu-San CHIEN|Yu-San CHIEN]][[Category:Yu-San CHIEN]] (1 collaborations)
-* [[:Category:Hsiang-Yu LAI|Hsiang-Yu LAI]][[Category:Hsiang-Yu LAI]] (1 collaborations)
-* [[:Category:Shih-Chang TSAI|Shih-Chang TSAI]][[Category:Shih-Chang TSAI]] (1 collaborations)
-* [[:Category:Tsung-Han TSAI|Tsung-Han TSAI]][[Category:Tsung-Han TSAI]] (1 collaborations)
-* [[:Category:Chao-Ching CHENG|Chao-Ching CHENG]][[Category:Chao-Ching CHENG]] (1 collaborations)
-* [[:Category:Hung-Li CHIANG|Hung-Li CHIANG]][[Category:Hung-Li CHIANG]] (1 collaborations)
-* [[:Category:Shih-Syuan HUANG|Shih-Syuan HUANG]][[Category:Shih-Syuan HUANG]] (1 collaborations)
-* [[:Category:Tzu-Chiang CHEN|Tzu-Chiang CHEN]][[Category:Tzu-Chiang CHEN]] (1 collaborations)
-* [[:Category:I-Sheng CHEN|I-Sheng CHEN]][[Category:I-Sheng CHEN]] (1 collaborations)
-* [[:Category:Sai-Hooi YEONG|Sai-Hooi YEONG]][[Category:Sai-Hooi YEONG]] (1 collaborations)
-* [[:Category:Chun-Sheng Liang|Chun-Sheng Liang]][[Category:Chun-Sheng Liang]] (1 collaborations)
 * [[:Category:Chih-Hao Chang|Chih-Hao Chang]][[Category:Chih-Hao Chang]] (1 collaborations)
-* [[:Category:Jhon Jhy Liaw|Jhon Jhy Liaw]][[Category:Jhon Jhy Liaw]] (1 collaborations)
-* [[:Category:Chi HUANG|Chi HUANG]][[Category:Chi HUANG]] (1 collaborations)
-* [[:Category:Chih-Pin TSAO|Chih-Pin TSAO]][[Category:Chih-Pin TSAO]] (1 collaborations)
 [[Category:Ta-Chun LIN]]