Category:Chih-Hao WANG: Difference between revisions

Revision as of 16:50, 25 March 2025

Chih-Hao WANG

Executive Summary

Chih-Hao WANG is an inventor who has filed 2 patents. Their primary areas of innovation include SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (1 patents), to produce devices, e.g. integrated circuits, each consisting of a plurality of components (1 patents), to produce devices, e.g. integrated circuits, each consisting of a plurality of components (1 patents), and they have worked with companies such as Taiwan Semiconductor Manufacturing Company Ltd. (2 patents). Their most frequent collaborators include (2 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

File:Chih-Hao WANG Monthly Patent Applications.png

Technology Areas

File:Chih-Hao WANG Top Technology Areas.png

List of Technology Areas

H01L29/42392 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
H01L21/823412 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
H01L21/823418 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
H01L21/823437 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
H01L27/088 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
H01L29/0665 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
H01L29/0847 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
H01L29/66545 ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 1 patents
H01L29/66553 ({using self aligned silicidation, i.e. salicide (formation of conductive layers comprising silicides): 1 patents
H01L29/78696 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
H10D30/6735 (No explanation available): 1 patents
H10D30/014 (No explanation available): 1 patents
H10D30/43 (No explanation available): 1 patents
H10D30/6757 (No explanation available): 1 patents
H10D62/116 (No explanation available): 1 patents
H10D62/121 (No explanation available): 1 patents
H10D62/151 (No explanation available): 1 patents
H10D64/017 (No explanation available): 1 patents
H10D64/018 (No explanation available): 1 patents
H10D84/013 (No explanation available): 1 patents
H10D84/0151 (No explanation available): 1 patents
H10D84/038 (No explanation available): 1 patents
H10D84/83 (No explanation available): 1 patents

Companies

File:Chih-Hao WANG Top Companies.png

List of Companies

Taiwan Semiconductor Manufacturing Company Ltd.: 2 patents

Collaborators

Kuo-Cheng CHIANG (2 collaborations)
Chun Yi CHOU (1 collaborations)
Guan-Lin CHEN (1 collaborations)
Shi Ning JU (1 collaborations)
Jung-Hung CHANG (1 collaborations)
Shih-Cheng CHEN (1 collaborations)
Tsung-Han CHUANG (1 collaborations)
Fu-Cheng CHANG (1 collaborations)
Wen-Ting LAN (1 collaborations)
Chia-Cheng TSAI (1 collaborations)
Wang-Chun Huang (1 collaborations)
Shi-Syuan Huang (1 collaborations)

Subcategories

This category has the following 4 subcategories, out of 4 total.

L

► Lin-Yu HUANG‎ (1 C)

@@ Line 2: / Line 2: @@
 === Executive Summary ===
-Chih-Hao WANG is an inventor who has filed 11 patents. Their primary areas of innovation include {using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate} (5 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (4 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (4 patents), and they have worked with companies such as Taiwan Semiconductor Manufacturing Co., Ltd. (7 patents), TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (4 patents). Their most frequent collaborators include [[Category:Kuo-Cheng CHIANG|Kuo-Cheng CHIANG]] (5 collaborations), [[Category:Lung-Kun CHU|Lung-Kun CHU]] (3 collaborations), [[Category:Jia-Ni YU|Jia-Ni YU]] (3 collaborations).
+Chih-Hao WANG is an inventor who has filed 2 patents. Their primary areas of innovation include SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (1 patents), to produce devices, e.g. integrated circuits, each consisting of a plurality of components (1 patents), to produce devices, e.g. integrated circuits, each consisting of a plurality of components (1 patents), and they have worked with companies such as Taiwan Semiconductor Manufacturing Company Ltd. (2 patents). Their most frequent collaborators include [[Category:Kuo-Cheng CHIANG|Kuo-Cheng CHIANG]] (2 collaborations), [[Category:Chun Yi CHOU|Chun Yi CHOU]] (1 collaborations), [[Category:Guan-Lin CHEN|Guan-Lin CHEN]] (1 collaborations).
 === Patent Filing Activity ===
@@ Line 11: / Line 11: @@
 ==== List of Technology Areas ====
-* [[:Category:CPC_H01L29/66545|H01L29/66545]] ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 5 patents
+* [[:Category:CPC_H01L29/42392|H01L29/42392]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L29/78696|H01L29/78696]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
-* [[:Category:CPC_H01L27/0886|H01L27/0886]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
-* [[:Category:CPC_H01L29/66795|H01L29/66795]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
-* [[:Category:CPC_H01L29/775|H01L29/775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
-* [[:Category:CPC_H01L29/66439|H01L29/66439]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
-* [[:Category:CPC_H01L29/42392|H01L29/42392]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
-* [[:Category:CPC_H01L21/823878|H01L21/823878]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 3 patents
-* [[:Category:CPC_H01L29/41791|H01L29/41791]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
-* [[:Category:CPC_H01L29/401|H01L29/401]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
-* [[:Category:CPC_H01L21/823431|H01L21/823431]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 3 patents
-* [[:Category:CPC_H01L29/0673|H01L29/0673]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
-* [[:Category:CPC_H01L21/823871|H01L21/823871]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
-* [[:Category:CPC_H01L23/5226|H01L23/5226]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
-* [[:Category:CPC_H01L29/0665|H01L29/0665]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
-* [[:Category:CPC_H01L29/785|H01L29/785]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
-* [[:Category:CPC_H01L21/0228|H01L21/0228]] ({deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD}): 2 patents
-* [[:Category:CPC_H01L21/31111|H01L21/31111]] ({by chemical means}): 2 patents
-* [[:Category:CPC_H01L27/0924|H01L27/0924]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
-* [[:Category:CPC_H01L29/0847|H01L29/0847]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
-* [[:Category:CPC_H01L29/7851|H01L29/7851]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
-* [[:Category:CPC_H01L29/66636|H01L29/66636]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
-* [[:Category:CPC_H01L21/76224|H01L21/76224]] ({using trench refilling with dielectric materials  (trench filling with polycristalline silicon): 2 patents
-* [[:Category:CPC_H01L21/823418|H01L21/823418]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
-* [[:Category:CPC_H01L27/092|H01L27/092]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L21/823807|H01L21/823807]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
-* [[:Category:CPC_H01L21/76232|H01L21/76232]] (Dielectric regions {, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers}): 1 patents
-* [[:Category:CPC_H01L21/764|H01L21/764]] (Making of isolation regions between components): 1 patents
-* [[:Category:CPC_H01L21/7682|H01L21/7682]] (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
-* [[:Category:CPC_H01L21/76843|H01L21/76843]] ({formed in openings in a dielectric}): 1 patents
-* [[:Category:CPC_H01L21/823821|H01L21/823821]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
-* [[:Category:CPC_H01L27/0883|H01L27/0883]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
 * [[:Category:CPC_H01L21/823412|H01L21/823412]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
-* [[:Category:CPC_H01L21/823462|H01L21/823462]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
+* [[:Category:CPC_H01L21/823418|H01L21/823418]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
-* [[:Category:CPC_H01L29/0649|H01L29/0649]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L2029/7858|H01L2029/7858]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L29/41725|H01L29/41725]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L21/76802|H01L21/76802]] (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
-* [[:Category:CPC_H01L21/76877|H01L21/76877]] ({Thin films associated with contacts of capacitors}): 1 patents
-* [[:Category:CPC_H01L21/28556|H01L21/28556]] (from a gas or vapour, e.g. condensation): 1 patents
-* [[:Category:CPC_H01L21/32137|H01L21/32137]] ({of silicon-containing layers}): 1 patents
-* [[:Category:CPC_H01L21/76898|H01L21/76898]] ({formed through a semiconductor substrate}): 1 patents
-* [[:Category:CPC_H01L23/481|H01L23/481]] (Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements {; Selection of materials therefor}): 1 patents
-* [[:Category:CPC_H01L29/41733|H01L29/41733]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L29/66742|H01L29/66742]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L21/76871|H01L21/76871]] ({Layers specifically deposited to enhance or enable the nucleation of further layers, i.e. seed layers}): 1 patents
-* [[:Category:CPC_H01L29/6656|H01L29/6656]] ({using self aligned silicidation, i.e. salicide  (formation of conductive layers comprising silicides): 1 patents
-* [[:Category:CPC_H01L29/517|H01L29/517]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L21/31116|H01L21/31116]] ({by dry-etching}): 1 patents
 * [[:Category:CPC_H01L21/823437|H01L21/823437]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
-* [[:Category:CPC_H01L21/823481|H01L21/823481]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
+* [[:Category:CPC_H01L27/088|H01L27/088]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L27/0207|H01L27/0207]] ({Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique}): 1 patents
+* [[:Category:CPC_H01L29/0665|H01L29/0665]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L29/7848|H01L29/7848]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
+* [[:Category:CPC_H01L29/0847|H01L29/0847]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L21/0217|H01L21/0217]] ({the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz  (): 1 patents
+* [[:Category:CPC_H01L29/66545|H01L29/66545]] ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 1 patents
-* [[:Category:CPC_H01L21/02271|H01L21/02271]] ({deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition  (): 1 patents
+* [[:Category:CPC_H01L29/66553|H01L29/66553]] ({using self aligned silicidation, i.e. salicide  (formation of conductive layers comprising silicides): 1 patents
-* [[:Category:CPC_H01L21/0274|H01L21/0274]] (Making masks on semiconductor bodies for further photolithographic processing not provided for in group): 1 patents
+* [[:Category:CPC_H01L29/78696|H01L29/78696]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
-* [[:Category:CPC_H01L21/0332|H01L21/0332]] (comprising inorganic layers): 1 patents
+* [[:Category:CPC_H10D30/6735|H10D30/6735]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L21/31053|H01L21/31053]] ({involving a dielectric removal step}): 1 patents
+* [[:Category:CPC_H10D30/014|H10D30/014]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L21/32139|H01L21/32139]] ({using masks}): 1 patents
+* [[:Category:CPC_H10D30/43|H10D30/43]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L29/165|H01L29/165]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
+* [[:Category:CPC_H10D30/6757|H10D30/6757]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L29/205|H01L29/205]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
+* [[:Category:CPC_H10D62/116|H10D62/116]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L21/76897|H01L21/76897]] ({Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step  (self-aligned silicidation on field effect transistors): 1 patents
+* [[:Category:CPC_H10D62/121|H10D62/121]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L21/823468|H01L21/823468]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
+* [[:Category:CPC_H10D62/151|H10D62/151]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L21/823475|H01L21/823475]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
+* [[:Category:CPC_H10D64/017|H10D64/017]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L23/5283|H01L23/5283]] ({Geometry or} layout of the interconnection structure {(): 1 patents
+* [[:Category:CPC_H10D64/018|H10D64/018]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L23/5286|H01L23/5286]] ({Geometry or} layout of the interconnection structure {(): 1 patents
+* [[:Category:CPC_H10D84/013|H10D84/013]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L29/4175|H01L29/4175]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
+* [[:Category:CPC_H10D84/0151|H10D84/0151]] (No explanation available): 1 patents
-* [[:Category:CPC_H01L29/6681|H01L29/6681]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
+* [[:Category:CPC_H10D84/038|H10D84/038]] (No explanation available): 1 patents
+* [[:Category:CPC_H10D84/83|H10D84/83]] (No explanation available): 1 patents
 === Companies ===
@@ Line 84: / Line 39: @@
 ==== List of Companies ====
-* Taiwan Semiconductor Manufacturing Co., Ltd.: 7 patents
+* Taiwan Semiconductor Manufacturing Company Ltd.: 2 patents
-* TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.: 4 patents
 === Collaborators ===
-* [[:Category:Kuo-Cheng CHIANG|Kuo-Cheng CHIANG]][[Category:Kuo-Cheng CHIANG]] (5 collaborations)
+* [[:Category:Kuo-Cheng CHIANG|Kuo-Cheng CHIANG]][[Category:Kuo-Cheng CHIANG]] (2 collaborations)
-* [[:Category:Lung-Kun CHU|Lung-Kun CHU]][[Category:Lung-Kun CHU]] (3 collaborations)
+* [[:Category:Chun Yi CHOU|Chun Yi CHOU]][[Category:Chun Yi CHOU]] (1 collaborations)
-* [[:Category:Jia-Ni YU|Jia-Ni YU]][[Category:Jia-Ni YU]] (3 collaborations)
+* [[:Category:Guan-Lin CHEN|Guan-Lin CHEN]][[Category:Guan-Lin CHEN]] (1 collaborations)
-* [[:Category:Mao-Lin HUANG|Mao-Lin HUANG]][[Category:Mao-Lin HUANG]] (3 collaborations)
+* [[:Category:Shi Ning JU|Shi Ning JU]][[Category:Shi Ning JU]] (1 collaborations)
-* [[:Category:Kuan-Lun CHENG|Kuan-Lun CHENG]][[Category:Kuan-Lun CHENG]] (3 collaborations)
+* [[:Category:Jung-Hung CHANG|Jung-Hung CHANG]][[Category:Jung-Hung CHANG]] (1 collaborations)
-* [[:Category:Chun-Fu LU|Chun-Fu LU]][[Category:Chun-Fu LU]] (2 collaborations)
-* [[:Category:Chung-Wei HSU|Chung-Wei HSU]][[Category:Chung-Wei HSU]] (2 collaborations)
-* [[:Category:Kuo-Cheng CHING|Kuo-Cheng CHING]][[Category:Kuo-Cheng CHING]] (2 collaborations)
-* [[:Category:Ching-Wei TSAI|Ching-Wei TSAI]][[Category:Ching-Wei TSAI]] (2 collaborations)
-* [[:Category:Chia-Hao CHANG|Chia-Hao CHANG]][[Category:Chia-Hao CHANG]] (2 collaborations)
-* [[:Category:Yu-Ming LIN|Yu-Ming LIN]][[Category:Yu-Ming LIN]] (2 collaborations)
-* [[:Category:Shi Ning JU|Shi Ning JU]][[Category:Shi Ning JU]] (2 collaborations)
 * [[:Category:Shih-Cheng CHEN|Shih-Cheng CHEN]][[Category:Shih-Cheng CHEN]] (1 collaborations)
-* [[:Category:Chun-Hsiung LIN|Chun-Hsiung LIN]][[Category:Chun-Hsiung LIN]] (1 collaborations)
+* [[:Category:Tsung-Han CHUANG|Tsung-Han CHUANG]][[Category:Tsung-Han CHUANG]] (1 collaborations)
-* [[:Category:Li-Zhen YU|Li-Zhen YU]][[Category:Li-Zhen YU]] (1 collaborations)
+* [[:Category:Fu-Cheng CHANG|Fu-Cheng CHANG]][[Category:Fu-Cheng CHANG]] (1 collaborations)
-* [[:Category:Cheng-Chi CHUANG|Cheng-Chi CHUANG]][[Category:Cheng-Chi CHUANG]] (1 collaborations)
+* [[:Category:Wen-Ting LAN|Wen-Ting LAN]][[Category:Wen-Ting LAN]] (1 collaborations)
-* [[:Category:Chun-Yuan CHEN|Chun-Yuan CHEN]][[Category:Chun-Yuan CHEN]] (1 collaborations)
+* [[:Category:Chia-Cheng TSAI|Chia-Cheng TSAI]][[Category:Chia-Cheng TSAI]] (1 collaborations)
-* [[:Category:Huan-Chieh SU|Huan-Chieh SU]][[Category:Huan-Chieh SU]] (1 collaborations)
+* [[:Category:Wang-Chun Huang|Wang-Chun Huang]][[Category:Wang-Chun Huang]] (1 collaborations)
-* [[:Category:Shang-Wen CHANG|Shang-Wen CHANG]][[Category:Shang-Wen CHANG]] (1 collaborations)
+* [[:Category:Shi-Syuan Huang|Shi-Syuan Huang]][[Category:Shi-Syuan Huang]] (1 collaborations)
-* [[:Category:Yi-Hsun CHIU|Yi-Hsun CHIU]][[Category:Yi-Hsun CHIU]] (1 collaborations)
-* [[:Category:Shih-Chuan CHIU|Shih-Chuan CHIU]][[Category:Shih-Chuan CHIU]] (1 collaborations)
-* [[:Category:Tien-Lu LIN|Tien-Lu LIN]][[Category:Tien-Lu LIN]] (1 collaborations)
-* [[:Category:Jia-Chuan YOU|Jia-Chuan YOU]][[Category:Jia-Chuan YOU]] (1 collaborations)
-* [[:Category:Kuan-Ting PAN|Kuan-Ting PAN]][[Category:Kuan-Ting PAN]] (1 collaborations)
-* [[:Category:Shi-Ning JU|Shi-Ning JU]][[Category:Shi-Ning JU]] (1 collaborations)
 [[Category:Chih-Hao WANG]]
 [[Category:Inventors]]
-[[Category:Inventors filing patents with Taiwan Semiconductor Manufacturing Co., Ltd.]]
+[[Category:Inventors filing patents with Taiwan Semiconductor Manufacturing Company Ltd.]]
-[[Category:Inventors filing patents with TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.]]