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Category:Chih-Hao WANG: Difference between revisions - WikiTrademarks Jump to content

Category:Chih-Hao WANG: Difference between revisions

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=== Executive Summary ===
=== Executive Summary ===
Chih-Hao WANG is an inventor who has filed 10 patents. Their primary areas of innovation include SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (7 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (4 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (4 patents), and they have worked with companies such as Taiwan Semiconductor Manufacturing Co., Ltd. (9 patents), TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (1 patents). Their most frequent collaborators include [[Category:Kuo-Cheng CHIANG|Kuo-Cheng CHIANG]] (7 collaborations), [[Category:Chia-Hao CHANG|Chia-Hao CHANG]] (4 collaborations), [[Category:Jia-Chuan YOU|Jia-Chuan YOU]] (4 collaborations).
Chih-Hao WANG is an inventor who has filed 8 patents. Their primary areas of innovation include SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (4 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (4 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (4 patents), and they have worked with companies such as Taiwan Semiconductor Manufacturing Company, Ltd. (5 patents), TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (3 patents). Their most frequent collaborators include [[Category:Kuo-Cheng CHIANG|Kuo-Cheng CHIANG]] (7 collaborations), [[Category:Huan-Chieh SU|Huan-Chieh SU]] (4 collaborations), [[Category:Kuan-Ting PAN|Kuan-Ting PAN]] (3 collaborations).


=== Patent Filing Activity ===
=== Patent Filing Activity ===
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==== List of Technology Areas ====
==== List of Technology Areas ====
* [[:Category:CPC_H01L29/42392|H01L29/42392]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 7 patents
* [[:Category:CPC_H01L29/42392|H01L29/42392]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
* [[:Category:CPC_H01L29/0673|H01L29/0673]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
* [[:Category:CPC_H01L29/0673|H01L29/0673]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
* [[:Category:CPC_H01L29/66439|H01L29/66439]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
* [[:Category:CPC_H01L29/66439|H01L29/66439]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
* [[:Category:CPC_H01L29/78696|H01L29/78696]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
* [[:Category:CPC_H01L29/66545|H01L29/66545]] ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 4 patents
* [[:Category:CPC_H01L29/775|H01L29/775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L29/775|H01L29/775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
* [[:Category:CPC_H01L29/66545|H01L29/66545]] ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 3 patents
* [[:Category:CPC_H01L29/78696|H01L29/78696]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L27/088|H01L27/088]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L29/0665|H01L29/0665]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L29/66742|H01L29/66742]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
* [[:Category:CPC_H01L29/41775|H01L29/41775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L21/76224|H01L21/76224]] ({using trench refilling with dielectric materials  (trench filling with polycristalline silicon): 2 patents
* [[:Category:CPC_H10D62/118|H10D62/118]] (No explanation available): 2 patents
* [[:Category:CPC_H01L21/0259|H01L21/0259]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L21/823412|H01L21/823412]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
* [[:Category:CPC_H01L21/823475|H01L21/823475]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
* [[:Category:CPC_H01L21/823481|H01L21/823481]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
* [[:Category:CPC_H01L21/823481|H01L21/823481]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
* [[:Category:CPC_H01L27/088|H01L27/088]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L29/41733|H01L29/41733]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L29/41733|H01L29/41733]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L29/6656|H01L29/6656]] ({using self aligned silicidation, i.e. salicide  (formation of conductive layers comprising silicides): 2 patents
* [[:Category:CPC_H01L2029/7858|H01L2029/7858]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
* [[:Category:CPC_H01L21/823807|H01L21/823807]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H10D84/038|H10D84/038]] (No explanation available): 2 patents
* [[:Category:CPC_H01L21/823828|H01L21/823828]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L21/823437|H01L21/823437]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L27/092|H01L27/092]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/28518|H01L21/28518]] (from a gas or vapour, e.g. condensation): 1 patents
* [[:Category:CPC_H01L29/0653|H01L29/0653]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/45|H01L29/45]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/764|H01L21/764]] (Making of isolation regions between components): 1 patents
* [[:Category:CPC_H01L29/78651|H01L29/78651]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/42384|H01L29/42384]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/785|H01L29/785]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L23/535|H01L23/535]] (including internal interconnections, e.g. cross-under constructions {(internal lead connections): 1 patents
* [[:Category:CPC_H01L21/76897|H01L21/76897]] ({Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step  (self-aligned silicidation on field effect transistors): 1 patents
* [[:Category:CPC_H01L29/401|H01L29/401]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/76802|H01L21/76802]] (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
* [[:Category:CPC_H10D84/0147|H10D84/0147]] (No explanation available): 1 patents
* [[:Category:CPC_H10D84/0149|H10D84/0149]] (No explanation available): 1 patents
* [[:Category:CPC_H10D84/834|H10D84/834]] (No explanation available): 1 patents
* [[:Category:CPC_H01L21/76843|H01L21/76843]] ({formed in openings in a dielectric}): 1 patents
* [[:Category:CPC_H01L21/76871|H01L21/76871]] ({Layers specifically deposited to enhance or enable the nucleation of further layers, i.e. seed layers}): 1 patents
* [[:Category:CPC_H01L21/823412|H01L21/823412]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L21/823418|H01L21/823418]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L21/823468|H01L21/823468]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L21/823475|H01L21/823475]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L29/0847|H01L29/0847]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/0847|H01L29/0847]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/76229|H01L21/76229]] (Dielectric regions {, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers}): 1 patents
* [[:Category:CPC_H01L29/6656|H01L29/6656]] ({using self aligned silicidation, i.e. salicide  (formation of conductive layers comprising silicides): 1 patents
* [[:Category:CPC_H01L29/4175|H01L29/4175]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/41791|H01L29/41791]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/401|H01L29/401]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/823814|H01L21/823814]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L29/66553|H01L29/66553]] ({using self aligned silicidation, i.e. salicide  (formation of conductive layers comprising silicides): 1 patents
* [[:Category:CPC_H01L21/823821|H01L21/823821]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L27/0924|H01L27/0924]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/66795|H01L29/66795]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/7851|H01L29/7851]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H10D30/6735|H10D30/6735]] (No explanation available): 1 patents
* [[:Category:CPC_H10D30/6735|H10D30/6735]] (No explanation available): 1 patents
* [[:Category:CPC_H01L21/22|H01L21/22]] (Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; {Interactions between two or more impurities; Redistribution of impurities}): 1 patents
* [[:Category:CPC_H10D30/014|H10D30/014]] (No explanation available): 1 patents
* [[:Category:CPC_H10D30/43|H10D30/43]] (No explanation available): 1 patents
* [[:Category:CPC_H10D30/6757|H10D30/6757]] (No explanation available): 1 patents
* [[:Category:CPC_H10D62/121|H10D62/121]] (No explanation available): 1 patents
* [[:Category:CPC_H10D64/017|H10D64/017]] (No explanation available): 1 patents
* [[:Category:CPC_H10D64/017|H10D64/017]] (No explanation available): 1 patents
* [[:Category:CPC_H01L23/535|H01L23/535]] (including internal interconnections, e.g. cross-under constructions {(internal lead connections): 1 patents
* [[:Category:CPC_H10D84/0167|H10D84/0167]] (No explanation available): 1 patents
* [[:Category:CPC_H01L21/823418|H01L21/823418]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H10D84/85|H10D84/85]] (No explanation available): 1 patents
* [[:Category:CPC_H01L21/28123|H01L21/28123]] ({Lithography-related aspects, e.g. sub-lithography lengths; Isolation-related aspects, e.g. to solve problems arising at the crossing with the side of the device isolation; Planarisation aspects}): 1 patents
* [[:Category:CPC_H01L21/7682|H01L21/7682]] (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
* [[:Category:CPC_H01L21/823431|H01L21/823431]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L21/823437|H01L21/823437]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L29/41791|H01L29/41791]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/6681|H01L29/6681]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/785|H01L29/785]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L21/823468|H01L21/823468]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
* [[:Category:CPC_H01L29/42364|H01L29/42364]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/4238|H01L29/4238]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H01L29/78618|H01L29/78618]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
* [[:Category:CPC_H10D84/834|H10D84/834]] (No explanation available): 1 patents
* [[:Category:CPC_H10D30/0243|H10D30/0243]] (No explanation available): 1 patents
* [[:Category:CPC_H10D30/6211|H10D30/6211]] (No explanation available): 1 patents
* [[:Category:CPC_H10D30/6215|H10D30/6215]] (No explanation available): 1 patents
* [[:Category:CPC_H10D84/0128|H10D84/0128]] (No explanation available): 1 patents
* [[:Category:CPC_H10D84/0158|H10D84/0158]] (No explanation available): 1 patents
* [[:Category:CPC_H10D84/038|H10D84/038]] (No explanation available): 1 patents


=== Companies ===
=== Companies ===
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==== List of Companies ====
==== List of Companies ====
* Taiwan Semiconductor Manufacturing Co., Ltd.: 9 patents
* Taiwan Semiconductor Manufacturing Company, Ltd.: 5 patents
* TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.: 1 patents
* TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.: 3 patents


=== Collaborators ===
=== Collaborators ===
* [[:Category:Kuo-Cheng CHIANG|Kuo-Cheng CHIANG]][[Category:Kuo-Cheng CHIANG]] (7 collaborations)
* [[:Category:Kuo-Cheng CHIANG|Kuo-Cheng CHIANG]][[Category:Kuo-Cheng CHIANG]] (7 collaborations)
* [[:Category:Chia-Hao CHANG|Chia-Hao CHANG]][[Category:Chia-Hao CHANG]] (4 collaborations)
* [[:Category:Huan-Chieh SU|Huan-Chieh SU]][[Category:Huan-Chieh SU]] (4 collaborations)
* [[:Category:Jia-Chuan YOU|Jia-Chuan YOU]][[Category:Jia-Chuan YOU]] (4 collaborations)
* [[:Category:Kuan-Ting PAN|Kuan-Ting PAN]][[Category:Kuan-Ting PAN]] (3 collaborations)
* [[:Category:Huan-Chieh SU|Huan-Chieh SU]][[Category:Huan-Chieh SU]] (2 collaborations)
* [[:Category:Chia-Hao CHANG|Chia-Hao CHANG]][[Category:Chia-Hao CHANG]] (2 collaborations)
* [[:Category:Jia-Chuan YOU|Jia-Chuan YOU]][[Category:Jia-Chuan YOU]] (2 collaborations)
* [[:Category:Chun-Yuan CHEN|Chun-Yuan CHEN]][[Category:Chun-Yuan CHEN]] (2 collaborations)
* [[:Category:Chun-Yuan CHEN|Chun-Yuan CHEN]][[Category:Chun-Yuan CHEN]] (2 collaborations)
* [[:Category:Chu-Yuan HSU|Chu-Yuan HSU]][[Category:Chu-Yuan HSU]] (2 collaborations)
* [[:Category:Szu-Chien WU|Szu-Chien WU]][[Category:Szu-Chien WU]] (1 collaborations)
* [[:Category:Shi-Ning JU|Shi-Ning JU]][[Category:Shi-Ning JU]] (1 collaborations)
* [[:Category:Shang-Wen CHANG|Shang-Wen CHANG]][[Category:Shang-Wen CHANG]] (1 collaborations)
* [[:Category:Ching-Wei TSAI|Ching-Wei TSAI]][[Category:Ching-Wei TSAI]] (1 collaborations)
* [[:Category:Kuan-Lun CHENG|Kuan-Lun CHENG]][[Category:Kuan-Lun CHENG]] (1 collaborations)
* [[:Category:Chu-Yuan HSU|Chu-Yuan HSU]][[Category:Chu-Yuan HSU]] (1 collaborations)
* [[:Category:Min-Hsuan LU|Min-Hsuan LU]][[Category:Min-Hsuan LU]] (1 collaborations)
* [[:Category:Sheng-Tsung WANG|Sheng-Tsung WANG]][[Category:Sheng-Tsung WANG]] (1 collaborations)
* [[:Category:Tzu Pei CHEN|Tzu Pei CHEN]][[Category:Tzu Pei CHEN]] (1 collaborations)
* [[:Category:Hao-Heng LIU|Hao-Heng LIU]][[Category:Hao-Heng LIU]] (1 collaborations)
* [[:Category:Chien-Hung LIN|Chien-Hung LIN]][[Category:Chien-Hung LIN]] (1 collaborations)
* [[:Category:Chung-Wei HSU|Chung-Wei HSU]][[Category:Chung-Wei HSU]] (1 collaborations)
* [[:Category:Chung-Wei HSU|Chung-Wei HSU]][[Category:Chung-Wei HSU]] (1 collaborations)
* [[:Category:Lung-Kun CHU|Lung-Kun CHU]][[Category:Lung-Kun CHU]] (1 collaborations)
* [[:Category:Lung-Kun CHU|Lung-Kun CHU]][[Category:Lung-Kun CHU]] (1 collaborations)
Line 82: Line 88:
* [[:Category:Chun-Fu LU|Chun-Fu LU]][[Category:Chun-Fu LU]] (1 collaborations)
* [[:Category:Chun-Fu LU|Chun-Fu LU]][[Category:Chun-Fu LU]] (1 collaborations)
* [[:Category:Shih-Hao LAI|Shih-Hao LAI]][[Category:Shih-Hao LAI]] (1 collaborations)
* [[:Category:Shih-Hao LAI|Shih-Hao LAI]][[Category:Shih-Hao LAI]] (1 collaborations)
* [[:Category:Jung-Hung CHANG|Jung-Hung CHANG]][[Category:Jung-Hung CHANG]] (1 collaborations)
* [[:Category:Shih-Cheng CHEN|Shih-Cheng CHEN]][[Category:Shih-Cheng CHEN]] (1 collaborations)
* [[:Category:Chia-Hao YU|Chia-Hao YU]][[Category:Chia-Hao YU]] (1 collaborations)
* [[:Category:Chia-Cheng TSAI|Chia-Cheng TSAI]][[Category:Chia-Cheng TSAI]] (1 collaborations)
* [[:Category:Hsien-Chih HUANG|Hsien-Chih HUANG]][[Category:Hsien-Chih HUANG]] (1 collaborations)
* [[:Category:Guan-Lin CHEN|Guan-Lin CHEN]][[Category:Guan-Lin CHEN]] (1 collaborations)
* [[:Category:Shi Ning JU|Shi Ning JU]][[Category:Shi Ning JU]] (1 collaborations)
* [[:Category:Lo-Heng CHANG|Lo-Heng CHANG]][[Category:Lo-Heng CHANG]] (1 collaborations)
* [[:Category:Yu-Xuan HUANG|Yu-Xuan HUANG]][[Category:Yu-Xuan HUANG]] (1 collaborations)
* [[:Category:Hou-Yu CHEN|Hou-Yu CHEN]][[Category:Hou-Yu CHEN]] (1 collaborations)
* [[:Category:Jin CAI|Jin CAI]][[Category:Jin CAI]] (1 collaborations)
* [[:Category:Zhi-Chang LIN|Zhi-Chang LIN]][[Category:Zhi-Chang LIN]] (1 collaborations)
* [[:Category:Cheng-Chi CHUANG|Cheng-Chi CHUANG]][[Category:Cheng-Chi CHUANG]] (1 collaborations)
* [[:Category:Tien-Lu LIN|Tien-Lu LIN]][[Category:Tien-Lu LIN]] (1 collaborations)
* [[:Category:Yu-Ming LIN|Yu-Ming LIN]][[Category:Yu-Ming LIN]] (1 collaborations)
* [[:Category:Li-Yang CHUANG|Li-Yang CHUANG]][[Category:Li-Yang CHUANG]] (1 collaborations)


[[Category:Chih-Hao WANG]]
[[Category:Chih-Hao WANG]]
[[Category:Inventors]]
[[Category:Inventors]]
[[Category:Inventors filing patents with Taiwan Semiconductor Manufacturing Co., Ltd.]]
[[Category:Inventors filing patents with TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]
[[Category:Inventors filing patents with TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.]]
[[Category:Inventors filing patents with Taiwan Semiconductor Manufacturing Company, Ltd.]]

Revision as of 04:23, 31 March 2025

Chih-Hao WANG

Executive Summary

Chih-Hao WANG is an inventor who has filed 8 patents. Their primary areas of innovation include SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (4 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (4 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (4 patents), and they have worked with companies such as Taiwan Semiconductor Manufacturing Company, Ltd. (5 patents), TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (3 patents). Their most frequent collaborators include (7 collaborations), (4 collaborations), (3 collaborations).

Patent Filing Activity

File:Chih-Hao WANG Monthly Patent Applications.png

Technology Areas

File:Chih-Hao WANG Top Technology Areas.png

List of Technology Areas

  • H01L29/42392 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
  • H01L29/0673 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
  • H01L29/66439 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
  • H01L29/66545 ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 4 patents
  • H01L29/775 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
  • H01L29/78696 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
  • H01L21/823481 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
  • H01L27/088 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
  • H01L29/41733 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
  • H01L2029/7858 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
  • H10D84/038 (No explanation available): 2 patents
  • H01L21/823437 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
  • H01L21/28518 (from a gas or vapour, e.g. condensation): 1 patents
  • H01L29/45 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • H01L29/78651 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • H01L29/42384 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • H01L29/785 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • H01L23/535 (including internal interconnections, e.g. cross-under constructions {(internal lead connections): 1 patents
  • H01L21/76897 ({Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step (self-aligned silicidation on field effect transistors): 1 patents
  • H01L29/401 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • H01L21/76802 (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
  • H10D84/0147 (No explanation available): 1 patents
  • H10D84/0149 (No explanation available): 1 patents
  • H10D84/834 (No explanation available): 1 patents
  • H01L21/76843 ({formed in openings in a dielectric}): 1 patents
  • H01L21/76871 ({Layers specifically deposited to enhance or enable the nucleation of further layers, i.e. seed layers}): 1 patents
  • H01L21/823412 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
  • H01L21/823418 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
  • H01L21/823468 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
  • H01L21/823475 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
  • H01L29/0847 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • H01L29/6656 ({using self aligned silicidation, i.e. salicide (formation of conductive layers comprising silicides): 1 patents
  • H01L29/41791 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • H01L21/823814 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
  • H01L21/823821 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
  • H01L27/0924 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • H01L29/66795 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • H01L29/7851 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • H10D30/6735 (No explanation available): 1 patents
  • H10D30/014 (No explanation available): 1 patents
  • H10D30/43 (No explanation available): 1 patents
  • H10D30/6757 (No explanation available): 1 patents
  • H10D62/121 (No explanation available): 1 patents
  • H10D64/017 (No explanation available): 1 patents
  • H10D84/0167 (No explanation available): 1 patents
  • H10D84/85 (No explanation available): 1 patents

Companies

File:Chih-Hao WANG Top Companies.png

List of Companies

  • Taiwan Semiconductor Manufacturing Company, Ltd.: 5 patents
  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.: 3 patents

Collaborators

Subcategories

This category has the following 4 subcategories, out of 4 total.

C

F

K

L

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