Category:Jian Wang: Difference between revisions
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=== Executive Summary === | === Executive Summary === | ||
Jian Wang is an inventor who has filed | Jian Wang is an inventor who has filed 6 patents. Their primary areas of innovation include {Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells} (3 patents), Process control or regulation (controlling or regulating in general (3 patents), {Cell separation, e.g. membranes, diaphragms} (2 patents), and they have worked with companies such as ACM RESEARCH (SHANGHAI), INC. (6 patents). Their most frequent collaborators include [[Category:Hui Wang|Hui Wang]] (6 collaborations), [[Category:Hongchao Yang|Hongchao Yang]] (4 collaborations), [[Category:Zhaowei Jia|Zhaowei Jia]] (4 collaborations). | ||
=== Patent Filing Activity === | === Patent Filing Activity === | ||
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==== List of Technology Areas ==== | ==== List of Technology Areas ==== | ||
* [[:Category: | * [[:Category:CPC_C25D17/001|C25D17/001]] ({Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells}): 3 patents | ||
* [[:Category: | * [[:Category:CPC_C25D21/12|C25D21/12]] (Process control or regulation (controlling or regulating in general): 3 patents | ||
* [[:Category: | * [[:Category:CPC_C25D17/002|C25D17/002]] ({Cell separation, e.g. membranes, diaphragms}): 2 patents | ||
* [[:Category: | * [[:Category:CPC_C25D21/10|C25D21/10]] (Agitating of electrolytes; Moving of racks): 2 patents | ||
* [[:Category: | * [[:Category:CPC_C25D7/12|C25D7/12]] (Semiconductors): 2 patents | ||
* [[:Category: | * [[:Category:CPC_B01D19/0036|B01D19/0036]] ({Flash degasification (the other groups take precedence)}): 1 patents | ||
* [[:Category: | * [[:Category:CPC_B01D19/00|B01D19/00]] (Degasification of liquids): 1 patents | ||
* [[:Category: | * [[:Category:CPC_B01D19/0031|B01D19/0031]] (Degasification of liquids): 1 patents | ||
* [[:Category: | * [[:Category:CPC_B08B3/041|B08B3/041]] ({Cleaning travelling work}): 1 patents | ||
* [[:Category: | * [[:Category:CPC_B08B3/08|B08B3/08]] (the liquid having chemical or dissolving effect (substances used, see the relevant classes)): 1 patents | ||
* [[:Category: | * [[:Category:CPC_B08B3/10|B08B3/10]] (with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration): 1 patents | ||
* [[:Category:CPC_B08B3/12|B08B3/12]] (by sonic or ultrasonic vibrations (washing or rinsing machines for crockery or tableware using sonic or ultrasonic waves): 1 patents | |||
* [[:Category:CPC_B08B7/04|B08B7/04]] (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes): 1 patents | |||
* [[:Category:CPC_F04B15/04|F04B15/04]] (POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS (machines for liquids, or pumps, of rotary-piston or oscillating-piston type): 1 patents | |||
* [[:Category:CPC_F04B23/00|F04B23/00]] (Pumping installations or systems (pumps characterised by combination with, or adaptation to, specific driving engines or motors): 1 patents | |||
* [[:Category:CPC_H01L21/02052|H01L21/02052]] ({Wet cleaning only (): 1 patents | |||
* [[:Category:CPC_H01L21/02057|H01L21/02057]] ({Cleaning during device manufacture}): 1 patents | |||
* [[:Category:CPC_H01L21/67017|H01L21/67017]] ({Apparatus for fluid treatment (): 1 patents | |||
* [[:Category:CPC_H01L21/67051|H01L21/67051]] (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents | |||
* [[:Category:CPC_H01L21/67092|H01L21/67092]] ({Apparatus for mechanical treatment (or grinding or cutting, see the relevant groups in subclasses): 1 patents | |||
* [[:Category:CPC_H01L21/67253|H01L21/67253]] (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents | |||
* [[:Category:CPC_B08B2203/007|B08B2203/007]] (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes): 1 patents | |||
* [[:Category:CPC_F04B23/04|F04B23/04]] (POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS (machines for liquids, or pumps, of rotary-piston or oscillating-piston type): 1 patents | |||
* [[:Category:CPC_C25D5/18|C25D5/18]] (PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR): 1 patents | |||
* [[:Category:CPC_C25D7/123|C25D7/123]] ({Semiconductors first coated with a seed layer or a conductive layer}): 1 patents | |||
* [[:Category:CPC_C25D17/06|C25D17/06]] (PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR): 1 patents | |||
* [[:Category:CPC_C25D17/005|C25D17/005]] ({Contacting devices}): 1 patents | |||
* [[:Category:CPC_C25D17/10|C25D17/10]] (Electrodes {, e.g. composition, counter electrode}): 1 patents | |||
* [[:Category:CPC_H01L21/2885|H01L21/2885]] (from a liquid, e.g. electrolytic deposition): 1 patents | |||
=== Companies === | === Companies === | ||
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==== List of Companies ==== | ==== List of Companies ==== | ||
* | * ACM RESEARCH (SHANGHAI), INC.: 6 patents | ||
=== Collaborators === | === Collaborators === | ||
* [[:Category: | * [[:Category:Hui Wang|Hui Wang]][[Category:Hui Wang]] (6 collaborations) | ||
* [[:Category: | * [[:Category:Hongchao Yang|Hongchao Yang]][[Category:Hongchao Yang]] (4 collaborations) | ||
* [[:Category: | * [[:Category:Zhaowei Jia|Zhaowei Jia]][[Category:Zhaowei Jia]] (4 collaborations) | ||
* [[:Category: | * [[:Category:Yinuo Jin|Yinuo Jin]][[Category:Yinuo Jin]] (2 collaborations) | ||
* [[:Category: | * [[:Category:Fuping Chen|Fuping Chen]][[Category:Fuping Chen]] (1 collaborations) | ||
* [[:Category:Xi Wang|Xi Wang]][[Category:Xi Wang]] (1 collaborations) | |||
* [[:Category:Shena Jia|Shena Jia]][[Category:Shena Jia]] (1 collaborations) | |||
* [[:Category:Danying Wang|Danying Wang]][[Category:Danying Wang]] (1 collaborations) | |||
* [[:Category:Chaowei Jiang|Chaowei Jiang]][[Category:Chaowei Jiang]] (1 collaborations) | |||
* [[:Category:Yingwei Dai|Yingwei Dai]][[Category:Yingwei Dai]] (1 collaborations) | |||
* [[:Category:Jun Wang|Jun Wang]][[Category:Jun Wang]] (1 collaborations) | |||
* [[:Category:Yulu Hu|Yulu Hu]][[Category:Yulu Hu]] (1 collaborations) | |||
* [[:Category:Jun Cai|Jun Cai]][[Category:Jun Cai]] (1 collaborations) | |||
* [[:Category:Chenhua Lu|Chenhua Lu]][[Category:Chenhua Lu]] (1 collaborations) | |||
* [[:Category:Jiaqi Li|Jiaqi Li]][[Category:Jiaqi Li]] (1 collaborations) | |||
* [[:Category:Meng Wu|Meng Wu]][[Category:Meng Wu]] (1 collaborations) | |||
[[Category:Jian Wang]] | [[Category:Jian Wang]] | ||
[[Category:Inventors]] | [[Category:Inventors]] | ||
[[Category:Inventors filing patents with | [[Category:Inventors filing patents with ACM RESEARCH (SHANGHAI), INC.]] | ||
Revision as of 16:00, 21 July 2024
Jian Wang
Executive Summary
Jian Wang is an inventor who has filed 6 patents. Their primary areas of innovation include {Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells} (3 patents), Process control or regulation (controlling or regulating in general (3 patents), {Cell separation, e.g. membranes, diaphragms} (2 patents), and they have worked with companies such as ACM RESEARCH (SHANGHAI), INC. (6 patents). Their most frequent collaborators include (6 collaborations), (4 collaborations), (4 collaborations).
Patent Filing Activity
File:Jian Wang Monthly Patent Applications.png
Technology Areas
File:Jian Wang Top Technology Areas.png
List of Technology Areas
- C25D17/001 ({Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells}): 3 patents
- C25D21/12 (Process control or regulation (controlling or regulating in general): 3 patents
- C25D17/002 ({Cell separation, e.g. membranes, diaphragms}): 2 patents
- C25D21/10 (Agitating of electrolytes; Moving of racks): 2 patents
- C25D7/12 (Semiconductors): 2 patents
- B01D19/0036 ({Flash degasification (the other groups take precedence)}): 1 patents
- B01D19/00 (Degasification of liquids): 1 patents
- B01D19/0031 (Degasification of liquids): 1 patents
- B08B3/041 ({Cleaning travelling work}): 1 patents
- B08B3/08 (the liquid having chemical or dissolving effect (substances used, see the relevant classes)): 1 patents
- B08B3/10 (with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration): 1 patents
- B08B3/12 (by sonic or ultrasonic vibrations (washing or rinsing machines for crockery or tableware using sonic or ultrasonic waves): 1 patents
- B08B7/04 (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes): 1 patents
- F04B15/04 (POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS (machines for liquids, or pumps, of rotary-piston or oscillating-piston type): 1 patents
- F04B23/00 (Pumping installations or systems (pumps characterised by combination with, or adaptation to, specific driving engines or motors): 1 patents
- H01L21/02052 ({Wet cleaning only (): 1 patents
- H01L21/02057 ({Cleaning during device manufacture}): 1 patents
- H01L21/67017 ({Apparatus for fluid treatment (): 1 patents
- H01L21/67051 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
- H01L21/67092 ({Apparatus for mechanical treatment (or grinding or cutting, see the relevant groups in subclasses): 1 patents
- H01L21/67253 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
- B08B2203/007 (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes): 1 patents
- F04B23/04 (POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS (machines for liquids, or pumps, of rotary-piston or oscillating-piston type): 1 patents
- C25D5/18 (PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR): 1 patents
- C25D7/123 ({Semiconductors first coated with a seed layer or a conductive layer}): 1 patents
- C25D17/06 (PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR): 1 patents
- C25D17/005 ({Contacting devices}): 1 patents
- C25D17/10 (Electrodes {, e.g. composition, counter electrode}): 1 patents
- H01L21/2885 (from a liquid, e.g. electrolytic deposition): 1 patents
Companies
File:Jian Wang Top Companies.png
List of Companies
- ACM RESEARCH (SHANGHAI), INC.: 6 patents
Collaborators
- Hui Wang (6 collaborations)
- Hongchao Yang (4 collaborations)
- Zhaowei Jia (4 collaborations)
- Yinuo Jin (2 collaborations)
- Fuping Chen (1 collaborations)
- Xi Wang (1 collaborations)
- Shena Jia (1 collaborations)
- Danying Wang (1 collaborations)
- Chaowei Jiang (1 collaborations)
- Yingwei Dai (1 collaborations)
- Jun Wang (1 collaborations)
- Yulu Hu (1 collaborations)
- Jun Cai (1 collaborations)
- Chenhua Lu (1 collaborations)
- Jiaqi Li (1 collaborations)
- Meng Wu (1 collaborations)
Subcategories
This category has the following 13 subcategories, out of 13 total.