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Category:Jun Wu: Difference between revisions - WikiTrademarks Jump to content

Category:Jun Wu: Difference between revisions

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=== Executive Summary ===
=== Executive Summary ===
Jun Wu is an inventor who has filed 1 patents. Their primary areas of innovation include No explanation available (1 patents), No explanation available (1 patents), No explanation available (1 patents), and they have worked with companies such as NANJING HUASHI NEW MATERIAL CO., LTD (1 patents). Their most frequent collaborators include [[Category:Xianting Lin|Xianting Lin]] (1 collaborations), [[Category:Jianzhong Yang|Jianzhong Yang]] (1 collaborations), [[Category:Guizhen SU|Guizhen SU]] (1 collaborations).
Jun Wu is an inventor who has filed 1 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), {Finishing the coated layer, e.g. drying, baking, soaking} (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), and they have worked with companies such as ACM RESEARCH (SHANGHAI), INC. (1 patents). Their most frequent collaborators include [[Category:Hui Wang|Hui Wang]] (1 collaborations), [[Category:Mark Lee|Mark Lee]] (1 collaborations), [[Category:Cheng Cheng|Cheng Cheng]] (1 collaborations).


=== Patent Filing Activity ===
=== Patent Filing Activity ===
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==== List of Technology Areas ====
==== List of Technology Areas ====
* [[:Category:CPC_A61K8/442|A61K8/442]] (No explanation available): 1 patents
* [[:Category:CPC_G03F7/7075|G03F7/7075]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_A61K8/342|A61K8/342]] (No explanation available): 1 patents
* [[:Category:CPC_G03F7/168|G03F7/168]] ({Finishing the coated layer, e.g. drying, baking, soaking}): 1 patents
* [[:Category:CPC_A61Q5/00|A61Q5/00]] (No explanation available): 1 patents
* [[:Category:CPC_G03F7/70533|G03F7/70533]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/70825|G03F7/70825]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/70933|G03F7/70933]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents


=== Companies ===
=== Companies ===
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==== List of Companies ====
==== List of Companies ====
* NANJING HUASHI NEW MATERIAL CO., LTD: 1 patents
* ACM RESEARCH (SHANGHAI), INC.: 1 patents


=== Collaborators ===
=== Collaborators ===
* [[:Category:Xianting Lin|Xianting Lin]][[Category:Xianting Lin]] (1 collaborations)
* [[:Category:Hui Wang|Hui Wang]][[Category:Hui Wang]] (1 collaborations)
* [[:Category:Jianzhong Yang|Jianzhong Yang]][[Category:Jianzhong Yang]] (1 collaborations)
* [[:Category:Mark Lee|Mark Lee]][[Category:Mark Lee]] (1 collaborations)
* [[:Category:Guizhen SU|Guizhen SU]][[Category:Guizhen SU]] (1 collaborations)
* [[:Category:Cheng Cheng|Cheng Cheng]][[Category:Cheng Cheng]] (1 collaborations)
* [[:Category:Andrew Jung|Andrew Jung]][[Category:Andrew Jung]] (1 collaborations)
* [[:Category:Bruce Sohn|Bruce Sohn]][[Category:Bruce Sohn]] (1 collaborations)
* [[:Category:Jun Wang|Jun Wang]][[Category:Jun Wang]] (1 collaborations)
* [[:Category:Yy Kim|Yy Kim]][[Category:Yy Kim]] (1 collaborations)


[[Category:Jun Wu]]
[[Category:Jun Wu]]
[[Category:Inventors]]
[[Category:Inventors]]
[[Category:Inventors filing patents with NANJING HUASHI NEW MATERIAL CO., LTD]]
[[Category:Inventors filing patents with ACM RESEARCH (SHANGHAI), INC.]]

Revision as of 16:00, 21 July 2024

Jun Wu

Executive Summary

Jun Wu is an inventor who has filed 1 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), {Finishing the coated layer, e.g. drying, baking, soaking} (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as ACM RESEARCH (SHANGHAI), INC. (1 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

File:Jun Wu Monthly Patent Applications.png

Technology Areas

File:Jun Wu Top Technology Areas.png

List of Technology Areas

  • G03F7/7075 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
  • G03F7/168 ({Finishing the coated layer, e.g. drying, baking, soaking}): 1 patents
  • G03F7/70533 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
  • G03F7/70825 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
  • G03F7/70933 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents

Companies

File:Jun Wu Top Companies.png

List of Companies

  • ACM RESEARCH (SHANGHAI), INC.: 1 patents

Collaborators

Subcategories

This category has the following 13 subcategories, out of 13 total.

A

B

C

F

G

H

J

M

S

W

X

Y

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