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Category:Durairaj BASKARAN of Bridgewater NJ (US) - WikiTrademarks Jump to content

Category:Durairaj BASKARAN of Bridgewater NJ (US)

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Durairaj BASKARAN of Bridgewater NJ (US)

Executive Summary

Durairaj BASKARAN of Bridgewater NJ (US) is an inventor who has filed 5 patents. Their primary areas of innovation include Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers (3 patents), {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping} (3 patents), MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS (2 patents), and they have worked with companies such as Merck Patent GmbH (5 patents). Their most frequent collaborators include (3 collaborations), (3 collaborations), (2 collaborations).

Patent Filing Activity

File:Durairaj BASKARAN of Bridgewater NJ (US) Monthly Patent Applications.png

Technology Areas

File:Durairaj BASKARAN of Bridgewater NJ (US) Top Technology Areas.png

List of Technology Areas

  • C09D153/00 (Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers): 3 patents
  • G03F7/0002 ({Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}): 3 patents
  • C08F297/026 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 2 patents
  • C08F212/08 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 2 patents
  • C08F212/32 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents
  • G03F7/004 (Photosensitive materials (): 1 patents
  • B82Y40/00 (Manufacture or treatment of nanostructures): 1 patents
  • C09D133/12 (COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics): 1 patents
  • C07F9/4021 (ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM (metal-containing porphyrins): 1 patents
  • C07F9/3229 (ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM (metal-containing porphyrins): 1 patents
  • C08F120/14 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents
  • C08F112/08 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents
  • C09D125/06 (COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics): 1 patents
  • C08F2810/40 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents
  • C09D5/002 (Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced {(electrically insulating plastics, resins or waxes): 1 patents
  • C09D7/41 (COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics): 1 patents
  • H01L21/0271 ({comprising organic layers}): 1 patents
  • G03F7/0035 (Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g.): 1 patents
  • C09D125/14 (with unsaturated esters): 1 patents
  • G03F7/161 (Coating processes; Apparatus therefor (applying coatings to base materials in general): 1 patents
  • G03F7/168 ({Finishing the coated layer, e.g. drying, baking, soaking}): 1 patents

Companies

File:Durairaj BASKARAN of Bridgewater NJ (US) Top Companies.png

List of Companies

  • Merck Patent GmbH: 5 patents

Collaborators

Subcategories

This category has the following 4 subcategories, out of 4 total.

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