Category:Willem Richard PONGERS

Willem Richard PONGERS

Executive Summary

Willem Richard PONGERS is an inventor who has filed 4 patents. Their primary areas of innovation include Non-linear optics (4 patents), OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS (3 patents), {for microlithography (measuring printed patterns for monitoring overlay (1 patents), and they have worked with companies such as ASML NETHERLANDS B.V. (4 patents). Their most frequent collaborators include (3 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

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Technology Areas

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List of Technology Areas

• G02F1/3528 (Non-linear optics): 4 patents
• G02F1/365 (OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS): 3 patents
• G03F9/7065 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G02F1/3532 ({Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams}): 1 patents
• G02F1/3536 ({Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams}): 1 patents
• G02F1/392 (for parametric generation or amplification of light, infrared or ultraviolet waves): 1 patents
• G02F1/395 (for parametric generation or amplification of light, infrared or ultraviolet waves): 1 patents
• G02F2202/32 (OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS): 1 patents
• G03F7/70166 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents

Companies

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List of Companies

• ASML NETHERLANDS B.V.: 4 patents

Collaborators

• Patrick Sebastian UEBEL (3 collaborations)
• Sebastian Thomas BAUERSCHMIDT (1 collaborations)
• Peter Maximilian GOTZ (1 collaborations)
• Ludovicus VAN DEN OETELAAR (1 collaborations)
• Ralph Jozef Johannes Gerardus Anna Maria SMEETS (1 collaborations)
• Amir ABDOLVAND (1 collaborations)
• Krishnaparvathy PUTHANKOVILAKAM (1 collaborations)
• Yongfeng NI (1 collaborations)
• Johannes Richard Karl KOHLER (1 collaborations)