Category:Hui Wang

Hui Wang

Executive Summary

Hui Wang is an inventor who has filed 8 patents. Their primary areas of innovation include {Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells} (3 patents), Process control or regulation (controlling or regulating in general (3 patents), {Cell separation, e.g. membranes, diaphragms} (2 patents), and they have worked with companies such as ACM RESEARCH (SHANGHAI), INC. (8 patents). Their most frequent collaborators include (6 collaborations), (4 collaborations), (4 collaborations).

Patent Filing Activity

File:Hui Wang Monthly Patent Applications.png

Technology Areas

File:Hui Wang Top Technology Areas.png

List of Technology Areas

• C25D17/001 ({Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells}): 3 patents
• C25D21/12 (Process control or regulation (controlling or regulating in general): 3 patents
• C25D17/002 ({Cell separation, e.g. membranes, diaphragms}): 2 patents
• C25D21/10 (Agitating of electrolytes; Moving of racks): 2 patents
• C25D7/12 (Semiconductors): 2 patents
• H01L21/68764 (using mechanical means, e.g. chucks, clamps or pinches {(using elecrostatic chucks): 1 patents
• H01L21/6708 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
• H01L21/6715 ({Apparatus for applying a liquid, a resin, an ink or the like (): 1 patents
• H01L21/68735 (using mechanical means, e.g. chucks, clamps or pinches {(using elecrostatic chucks): 1 patents
• H01L21/68742 (using mechanical means, e.g. chucks, clamps or pinches {(using elecrostatic chucks): 1 patents
• G03F7/7075 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/168 ({Finishing the coated layer, e.g. drying, baking, soaking}): 1 patents
• G03F7/70533 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70825 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70933 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• B01D19/0036 ({Flash degasification (the other groups take precedence)}): 1 patents
• B01D19/00 (Degasification of liquids): 1 patents
• B01D19/0031 (Degasification of liquids): 1 patents
• B08B3/041 ({Cleaning travelling work}): 1 patents
• B08B3/08 (the liquid having chemical or dissolving effect (substances used, see the relevant classes)): 1 patents
• B08B3/10 (with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration): 1 patents
• B08B3/12 (by sonic or ultrasonic vibrations (washing or rinsing machines for crockery or tableware using sonic or ultrasonic waves): 1 patents
• B08B7/04 (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes): 1 patents
• F04B15/04 (POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS (machines for liquids, or pumps, of rotary-piston or oscillating-piston type): 1 patents
• F04B23/00 (Pumping installations or systems (pumps characterised by combination with, or adaptation to, specific driving engines or motors): 1 patents
• H01L21/02052 ({Wet cleaning only (): 1 patents
• H01L21/02057 ({Cleaning during device manufacture}): 1 patents
• H01L21/67017 ({Apparatus for fluid treatment (): 1 patents
• H01L21/67051 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
• H01L21/67092 ({Apparatus for mechanical treatment (or grinding or cutting, see the relevant groups in subclasses): 1 patents
• H01L21/67253 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
• B08B2203/007 (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes): 1 patents
• F04B23/04 (POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS (machines for liquids, or pumps, of rotary-piston or oscillating-piston type): 1 patents
• C25D5/18 (PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR): 1 patents
• C25D7/123 ({Semiconductors first coated with a seed layer or a conductive layer}): 1 patents
• C25D17/06 (PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR): 1 patents
• C25D17/005 ({Contacting devices}): 1 patents
• C25D17/10 (Electrodes {, e.g. composition, counter electrode}): 1 patents
• H01L21/2885 (from a liquid, e.g. electrolytic deposition): 1 patents

Companies

File:Hui Wang Top Companies.png

List of Companies

• ACM RESEARCH (SHANGHAI), INC.: 8 patents

Collaborators

• Jian Wang (6 collaborations)
• Hongchao Yang (4 collaborations)
• Zhaowei Jia (4 collaborations)
• Shena Jia (2 collaborations)
• Fuping Chen (2 collaborations)
• Jun Wang (2 collaborations)
• Yinuo Jin (2 collaborations)
• Feng Liu (1 collaborations)
• Xiaofeng Tao (1 collaborations)
• Haibo Hu (1 collaborations)
• Yang Liu (1 collaborations)
• Mark Lee (1 collaborations)
• Jun Wu (1 collaborations)
• Cheng Cheng (1 collaborations)
• Andrew Jung (1 collaborations)
• Bruce Sohn (1 collaborations)
• Yy Kim (1 collaborations)
• Xi Wang (1 collaborations)
• Danying Wang (1 collaborations)
• Chaowei Jiang (1 collaborations)
• Yingwei Dai (1 collaborations)
• Yulu Hu (1 collaborations)
• Jun Cai (1 collaborations)
• Chenhua Lu (1 collaborations)
• Jiaqi Li (1 collaborations)
• Meng Wu (1 collaborations)