Category:G03F1/24

• Section G: Physics
• Class G03: Photography; Cinematography; Analogous Techniques Using Waves Other Than Optical Waves; Electrography; Holography
• Subclass G03F: Photomechanical Production of Textured or Patterned Surfaces, e.g., for Printing, for Processing of Semiconductor Devices
• Main Group G03F1/00: Photomechanical, e.g., Photographic, Production of Textured or Patterned Surfaces, e.g., Printed Surfaces, Resist Coatings, For Use in Photomechanical, Photoengraving, Photolithographic Processes; Apparatus Therefor
• Subgroup G03F1/24: Photosensitive materials

The classification "G03F1/24" falls within the realm of physics, specifically focusing on the photomechanical production of textured or patterned surfaces, which is a key process in fields like printing and semiconductor device processing. This subgroup is dedicated to photosensitive materials used in these photomechanical processes. It covers the development, composition, and application of materials that react to light, which are crucial in photolithography – a process widely used in semiconductor manufacturing to create intricate patterns for integrated circuits. The advancements in this area are vital for continuing miniaturization and increasing the complexity of electronic devices.