Category:Alok Ranjan of Austin TX (US)

Alok Ranjan of Austin TX (US)

Executive Summary

Alok Ranjan of Austin TX (US) is an inventor who has filed 3 patents. Their primary areas of innovation include Gas-filled discharge tubes (heating by discharge (2 patents), Gas-filled discharge tubes (heating by discharge (2 patents), Plasma etching; Reactive-ion etching (2 patents), and they have worked with companies such as Tokyo Electron Limited (3 patents). Their most frequent collaborators include (2 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

File:Alok Ranjan of Austin TX (US) Monthly Patent Applications.png

Technology Areas

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List of Technology Areas

• H01J37/32449 (Gas-filled discharge tubes (heating by discharge): 2 patents
• H01J37/3244 (Gas-filled discharge tubes (heating by discharge): 2 patents
• H01L21/3065 (Plasma etching; Reactive-ion etching): 2 patents
• H01L21/31116 ({by dry-etching}): 2 patents
• H01J2237/334 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 2 patents
• H01J37/32091 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J37/321 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01L21/31144 ({using masks}): 1 patents
• H01L21/67069 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
• G03F7/70033 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• H01L21/0274 (Making masks on semiconductor bodies for further photolithographic processing not provided for in group): 1 patents
• H01J37/32146 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J37/32357 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J37/32422 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J37/32522 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01L21/32136 ({using plasmas}): 1 patents

Companies

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List of Companies

• Tokyo Electron Limited: 3 patents

Collaborators

• Peter Ventzek of Austin TX (US) (2 collaborations)
• Yun Han of Albany NY (US) (1 collaborations)
• Peter Lowell George Ventzek of Austin TX (US) (1 collaborations)
• Mitsunori Ohata (1 collaborations)