Category:Chul Joo HWANG

Chul Joo HWANG

Executive Summary

Chul Joo HWANG is an inventor who has filed 4 patents. Their primary areas of innovation include Gas-filled discharge tubes (heating by discharge (2 patents), Gas-filled discharge tubes (heating by discharge (2 patents), Gas-filled discharge tubes (heating by discharge (1 patents), and they have worked with companies such as JUSUNG ENGINEERING CO., LTD. (3 patents), JUSUNG Engineering Co., Ltd. (1 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

File:Chul Joo HWANG Monthly Patent Applications.png

Technology Areas

File:Chul Joo HWANG Top Technology Areas.png

List of Technology Areas

• H01J37/3244 (Gas-filled discharge tubes (heating by discharge): 2 patents
• H01J37/32568 (Gas-filled discharge tubes (heating by discharge): 2 patents
• H01J37/32458 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J37/32082 (Gas-filled discharge tubes (heating by discharge): 1 patents
• C23C16/45544 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion): 1 patents
• C23C16/407 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion): 1 patents
• C23C16/4408 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion): 1 patents
• C23C16/45536 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion): 1 patents
• C23C16/45553 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion): 1 patents
• C23C16/52 (Controlling or regulating the coating process {(): 1 patents
• H01L27/0688 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H01L27/1225 (the substrate being other than a semiconductor body, e.g. an insulating body): 1 patents
• H01L29/7869 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H01J37/32449 (Gas-filled discharge tubes (heating by discharge): 1 patents
• C23C16/4584 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion): 1 patents
• C23C16/509 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion): 1 patents
• H01J37/32715 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01L21/67069 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
• H01J2237/332 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
• H01J2237/334 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
• H10K71/166 (ORGANIC ELECTRIC SOLID-STATE DEVICES): 1 patents

Companies

File:Chul Joo HWANG Top Companies.png

List of Companies

• JUSUNG ENGINEERING CO., LTD.: 3 patents
• JUSUNG Engineering Co., Ltd.: 1 patents

Collaborators

• In Seo YOO (1 collaborations)
• Ji Hun LEE (1 collaborations)
• Duck Ho KIM (1 collaborations)
• Min Hyuk KIM (1 collaborations)
• Kyung In MIN (1 collaborations)
• Chang Kyun PARK (1 collaborations)
• Jun Hee HAN (1 collaborations)
• Du Ho KIM (1 collaborations)
• Su Ye KIM (1 collaborations)
• Seung Hyun LEE (1 collaborations)
• WOONG KYO OH (1 collaborations)
• Young Woon KIM (1 collaborations)
• Kwang Su YOO (1 collaborations)
• Won Tae CHO (1 collaborations)
• Jae Ho KIM (1 collaborations)