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Category:Eric Chih-Fang Liu of Albany NY (US)

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Eric Chih-Fang Liu of Albany NY (US)

Executive Summary

Eric Chih-Fang Liu of Albany NY (US) is an inventor who has filed 9 patents. Their primary areas of innovation include {using masks} (5 patents), comprising inorganic layers (4 patents), {characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment} (3 patents), and they have worked with companies such as Tokyo Electron Limited (9 patents). Their most frequent collaborators include (4 collaborations), (3 collaborations), (3 collaborations).

Patent Filing Activity

File:Eric Chih-Fang Liu of Albany NY (US) Monthly Patent Applications.png

Technology Areas

File:Eric Chih-Fang Liu of Albany NY (US) Top Technology Areas.png

List of Technology Areas

  • H01L21/31144 ({using masks}): 5 patents
  • H01L21/0332 (comprising inorganic layers): 4 patents
  • H01L21/0337 ({characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment}): 3 patents
  • H01L21/31111 ({by chemical means}): 2 patents
  • H01L21/0338 ({Process specially adapted to improve the resolution of the mask}): 1 patents
  • G03F7/0042 ({with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists (): 1 patents
  • H01L21/027 (Making masks on semiconductor bodies for further photolithographic processing not provided for in group): 1 patents
  • G03F7/70033 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
  • G03F7/70733 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
  • H01J37/32743 (Gas-filled discharge tubes (heating by discharge): 1 patents
  • H01J37/32899 (Gas-filled discharge tubes (heating by discharge): 1 patents
  • H01J2237/334 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
  • H01L21/76802 (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
  • H01L21/0276 ({using an anti-reflective coating (anti-reflective coating for lithography in general): 1 patents
  • H01L21/32139 ({using masks}): 1 patents
  • H01L21/31055 ({the removal being a chemical etching step, e.g. dry etching (etching per se): 1 patents
  • H01L21/7682 (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
  • H01L21/76819 ({Smoothing of the dielectric (planarisation of insulating materials per se): 1 patents
  • H01L21/76831 ({in via holes or trenches, e.g. non-conductive sidewall liners}): 1 patents
  • H01L21/0271 ({comprising organic layers}): 1 patents
  • H01L21/31116 ({by dry-etching}): 1 patents

Companies

File:Eric Chih-Fang Liu of Albany NY (US) Top Companies.png

List of Companies

  • Tokyo Electron Limited: 9 patents

Collaborators

Subcategories

This category has the following 5 subcategories, out of 5 total.

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