Category:Jiao LIANG of San Jose CA (US)
Jiao LIANG of San Jose CA (US)
Executive Summary
Jiao LIANG of San Jose CA (US) is an inventor who has filed 2 patents. Their primary areas of innovation include Subject of image; Context of image processing (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as ASML NETHERLANDS B.V. (2 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).
Patent Filing Activity
File:Jiao LIANG of San Jose CA (US) Monthly Patent Applications.png
Technology Areas
File:Jiao LIANG of San Jose CA (US) Top Technology Areas.png
List of Technology Areas
- G06T2207/30148 (Subject of image; Context of image processing): 2 patents
- G03F7/706835 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G03F9/7092 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
- G06T7/001 ({using an image reference approach}): 1 patents
- G06T7/337 ({involving reference images or patches}): 1 patents
- H01L22/12 ({for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions (electrical measurement of diffusions): 1 patents
- G06T7/0004 ({Industrial image inspection}): 1 patents
- G01N23/2251 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
- G03F7/705 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G03F7/7065 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G01N2223/401 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
- G01N2223/418 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
- G01N2223/6116 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
- G01N2223/646 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
- G06T2207/10061 (Image acquisition modality): 1 patents
- G06T2207/20081 (Special algorithmic details): 1 patents
- G06T2207/20084 (Special algorithmic details): 1 patents
- G06T2207/20216 (Special algorithmic details): 1 patents
- G06T2207/20224 (Special algorithmic details): 1 patents
- G06T2207/30144 (Subject of image; Context of image processing): 1 patents
- G06T2207/30168 (Subject of image; Context of image processing): 1 patents
Companies
File:Jiao LIANG of San Jose CA (US) Top Companies.png
List of Companies
- ASML NETHERLANDS B.V.: 2 patents
Collaborators
- Jiyou FU of San Jose CA (US) (1 collaborations)
- Jing SU of Fremont CA (US) (1 collaborations)
- Chenxi LIN of Newark CA (US) (1 collaborations)
- Guangqing CHEN of Fremont CA (US) (1 collaborations)
- Yi ZOU of Foster City CA (US) (1 collaborations)
- Chen ZHANG of San Jose CA (US) (1 collaborations)
- Qiang ZHANG of Campbell CA (US) (1 collaborations)
- Jen-Shiang WANG of Sunnyvale CA (US) (1 collaborations)
Subcategories
This category has the following 3 subcategories, out of 3 total.
C
J
Y
- Jiyou FU of San Jose CA (US)
- Jing SU of Fremont CA (US)
- Chenxi LIN of Newark CA (US)
- Pages with broken file links
- Guangqing CHEN of Fremont CA (US)
- Yi ZOU of Foster City CA (US)
- Chen ZHANG of San Jose CA (US)
- Qiang ZHANG of Campbell CA (US)
- Jen-Shiang WANG of Sunnyvale CA (US)
- Jiao LIANG of San Jose CA (US)
- Inventors
- Inventors filing patents with ASML NETHERLANDS B.V.