Category:Lingling PU of San Jose CA (US)

Lingling PU of San Jose CA (US)

Executive Summary

Lingling PU of San Jose CA (US) is an inventor who has filed 6 patents. Their primary areas of innovation include Special algorithmic details (5 patents), Image acquisition modality (4 patents), Subject of image; Context of image processing (4 patents), and they have worked with companies such as ASML Netherlands B.V. (6 patents). Their most frequent collaborators include (2 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

File:Lingling PU of San Jose CA (US) Monthly Patent Applications.png

Technology Areas

File:Lingling PU of San Jose CA (US) Top Technology Areas.png

List of Technology Areas

• G06T2207/20081 (Special algorithmic details): 5 patents
• G06T2207/10061 (Image acquisition modality): 4 patents
• G06T2207/30148 (Subject of image; Context of image processing): 4 patents
• G01N23/2251 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 2 patents
• G06T7/001 ({using an image reference approach}): 2 patents
• G01N2223/401 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 2 patents
• H01J37/222 ({Image processing arrangements associated with the tube (image data processing or generation, in general): 2 patents
• H01J37/28 (with scanning beams {(): 2 patents
• H01J2237/2817 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 2 patents
• G06T2207/20084 (Special algorithmic details): 1 patents
• G06T3/14 (Transformations for image registration, e.g. adjusting or mapping for alignment of images): 1 patents
• G06T5/60 (using machine learning, e.g. neural networks): 1 patents
• H01J2237/221 (Treatment of data (mixing signals): 1 patents
• G06T5/50 (using two or more images, e.g. averaging or subtraction): 1 patents
• G06T5/77 (Retouching; Inpainting; Scratch removal): 1 patents
• G06T5/80 (Geometric correction): 1 patents
• H01J37/244 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
• G01N2223/07 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
• G01N2223/418 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
• G01N2223/507 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
• H01J2237/2448 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
• H01J2237/2806 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
• H01J2237/2809 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
• G06V10/774 (IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING): 1 patents
• G06F18/214 (Generating training patterns; Bootstrap methods, e.g. bagging or boosting): 1 patents
• G06T7/0006 ({using a design-rule based approach}): 1 patents
• G06V10/776 (IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING): 1 patents
• G06V10/993 (IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING): 1 patents
• G03F7/70655 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706837 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706841 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706845 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G06T7/0004 ({Industrial image inspection}): 1 patents
• G06N3/0455 (Auto-encoder networks; Encoder-decoder networks): 1 patents

Companies

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List of Companies

• ASML Netherlands B.V.: 6 patents

Collaborators

• Liangjiang YU of Pleasanton CA (US) (2 collaborations)
• Tim HOUBEN (1 collaborations)
• Maxim PISARENCO (1 collaborations)
• Thomas Jarik HUISMAN (1 collaborations)
• Jian ZHOU of San Jose CA (US) (1 collaborations)
• Yi-Hsin CHANG of Milpitas CA (US) (1 collaborations)
• Yun-Ling YEH of San Jose CA (US) (1 collaborations)
• Shengcheng JIN of San Jose CA (US) (1 collaborations)
• Wei FANG of Milpitas CA (US) (1 collaborations)
• Bo WANG of Cupertino CA (US) (1 collaborations)
• Zhonghua DONG of Sunnyvale CA (US) (1 collaborations)
• Yongxin WANG of San Ramon CA (US) (1 collaborations)
• Wentian ZHOU of San Jose CA (US) (1 collaborations)
• Liangjiang YU of San Jose CA (US) (1 collaborations)
• Teng WANG of San Jose CA (US) (1 collaborations)
• Wei FANG of San Jose CA (US) (1 collaborations)
• Zijian DU of San Jose CA (US) (1 collaborations)
• Hongquan ZUO of San Jose CA (US) (1 collaborations)