Category:Peter De Schepper

Peter De Schepper

Executive Summary

Peter De Schepper is an inventor who has filed 1 patents. Their primary areas of innovation include Macromolecular compounds which are photodegradable, e.g. positive electron resists ( (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as Inpria Corporation (1 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

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Technology Areas

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List of Technology Areas

• G03F7/0392 (Macromolecular compounds which are photodegradable, e.g. positive electron resists (): 1 patents
• G03F1/22 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F1/48 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/0017 ({Phase modulating patterns, e.g. refractive index patterns}): 1 patents
• G03F7/0042 ({with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists (): 1 patents
• G03F7/0382 (Macromolecular compounds which are rendered insoluble or differentially wettable (): 1 patents
• G03F7/11 (having cover layers or intermediate layers, e.g. subbing layers {(): 1 patents
• G03F7/2004 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 1 patents
• G03F7/2037 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 1 patents
• G03F7/42 (Stripping or agents therefor): 1 patents

Companies

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List of Companies

• Inpria Corporation: 1 patents

Collaborators

• Jason K. Stowers of Corvallis OR (US) (1 collaborations)
• Sangyoon Woo (1 collaborations)
• Michael Kocsis of Albany OR (US) (1 collaborations)
• Alan J. Telecky of Albany OR (US) (1 collaborations)