Category:Simon Gijsbert Josephus MATHIJSSEN

Simon Gijsbert Josephus MATHIJSSEN

Executive Summary

Simon Gijsbert Josephus MATHIJSSEN is an inventor who has filed 6 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (4 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (3 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (2 patents), and they have worked with companies such as ASML Netherlands B.V. (5 patents), ASML NETHERLANDS B.V. (1 patents). Their most frequent collaborators include (4 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

File:Simon Gijsbert Josephus MATHIJSSEN Monthly Patent Applications.png

Technology Areas

File:Simon Gijsbert Josephus MATHIJSSEN Top Technology Areas.png

List of Technology Areas

• G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 4 patents
• G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 3 patents
• G03F7/70683 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• G03F9/7046 ({for microlithography (measuring printed patterns for monitoring overlay): 2 patents
• G03F7/706831 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706837 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F9/7088 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F9/7076 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F9/7019 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F9/7092 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F7/70641 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F9/7042 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents

Companies

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List of Companies

• ASML Netherlands B.V.: 5 patents
• ASML NETHERLANDS B.V.: 1 patents

Collaborators

• Kaustuve BHATTACHARYYA (4 collaborations)
• Arie Jeffrey DEN BOEF (2 collaborations)
• Sebastianus Adrianus GOORDEN (2 collaborations)
• Armand Eugene Albert KOOLEN (2 collaborations)
• Leendert Jan KARSSEMEIJER (1 collaborations)
• Manouk RIJPSTRA (1 collaborations)
• Ralph BRINKHOF (1 collaborations)
• Hui Quan LIM (1 collaborations)
• Amanda Elizabeth ANDERSON (1 collaborations)
• Timothy Dugan DAVIS of Portland OR (US) (1 collaborations)
• Sera JEON (1 collaborations)
• Shuo-Chun LIN (1 collaborations)
• Patricius Aloysius Jacobus TINNEMANS (1 collaborations)
• Samee Ur REHMAN of Milpitas CA (US) (1 collaborations)