Category:Takeru WATANABE

Takeru WATANABE

Executive Summary

Takeru WATANABE is an inventor who has filed 4 patents. Their primary areas of innovation include {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors} (2 patents), Macromolecular compounds which are photodegradable, e.g. positive electron resists ( (2 patents), ACYCLIC OR CARBOCYCLIC COMPOUNDS (1 patents), and they have worked with companies such as SHIN-ETSU CHEMICAL CO., LTD. (2 patents), Shin-Etsu Chemical Co., Ltd. (2 patents). Their most frequent collaborators include (2 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

File:Takeru WATANABE Monthly Patent Applications.png

Technology Areas

File:Takeru WATANABE Top Technology Areas.png

List of Technology Areas

• G03F7/0045 ({with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors}): 2 patents
• G03F7/0397 (Macromolecular compounds which are photodegradable, e.g. positive electron resists (): 2 patents
• C07C381/12 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 1 patents
• C08F220/325 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents
• C08F2800/10 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents
• G03F7/0035 (Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g.): 1 patents
• G03F7/0048 (Photosensitive materials (): 1 patents
• G03F7/0752 (used for diffusion transfer {(): 1 patents
• G03F7/11 (having cover layers or intermediate layers, e.g. subbing layers {(): 1 patents
• G03F7/162 (Coating processes; Apparatus therefor (applying coatings to base materials in general): 1 patents
• G03F7/2006 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 1 patents
• G03F7/327 (Liquid compositions therefor, e.g. developers): 1 patents
• C07C45/29 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 1 patents
• C07C17/275 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 1 patents
• C07C17/354 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 1 patents
• C07C45/78 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 1 patents
• C07C67/42 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 1 patents
• C07F9/5442 (ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM (metal-containing porphyrins): 1 patents

Companies

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List of Companies

• SHIN-ETSU CHEMICAL CO., LTD.: 2 patents
• Shin-Etsu Chemical Co., Ltd.: 2 patents

Collaborators

• Seiichiro TACHIBANA (2 collaborations)
• Daisuke KORI (2 collaborations)
• Takashi SAWAMURA (2 collaborations)
• Yuki MIYAKE (1 collaborations)
• Ryo KOMATSU (1 collaborations)
• Miyoshi YAMASHITA (1 collaborations)