Category:Yang PAN of Los Altos CA (US)

Yang PAN of Los Altos CA (US)

Executive Summary

Yang PAN of Los Altos CA (US) is an inventor who has filed 11 patents. Their primary areas of innovation include Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se (5 patents), {mainly by convection} (5 patents), for supporting or gripping (for conveying (5 patents), and they have worked with companies such as Lam Research Corporation (11 patents). Their most frequent collaborators include (9 collaborations), (7 collaborations), (5 collaborations).

Patent Filing Activity

File:Yang PAN of Los Altos CA (US) Monthly Patent Applications.png

Technology Areas

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List of Technology Areas

• H01L21/67069 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 5 patents
• H01L21/67109 ({mainly by convection}): 5 patents
• H01L21/6833 (for supporting or gripping (for conveying): 5 patents
• G03F7/36 (Imagewise removal not covered by groups): 4 patents
• G03F7/167 ({from the gas phase, by plasma deposition (): 3 patents
• G03F7/0042 ({with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists (): 3 patents
• G03F7/0043 ({Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof (): 3 patents
• G03F7/168 ({Finishing the coated layer, e.g. drying, baking, soaking}): 2 patents
• G03F7/40 (Treatment after imagewise removal, e.g. baking): 2 patents
• G03F7/38 (Treatment before imagewise removal, e.g. prebaking {(): 2 patents
• H01L21/02118 ({carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC (polymers per se): 1 patents
• H01L21/02282 ({deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD}): 1 patents
• H01L21/02307 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H01L21/02348 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H01L21/30625 ({With simultaneous mechanical treatment, e.g. mechanico-chemical polishing}): 1 patents
• H01L21/6715 ({Apparatus for applying a liquid, a resin, an ink or the like (): 1 patents
• H01J37/32862 (Gas-filled discharge tubes (heating by discharge): 1 patents
• C11D7/08 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
• C11D7/10 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
• C11D7/3218 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
• C11D7/5013 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
• H01J2237/022 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
• H01L21/67225 ({comprising at least one lithography chamber (lithographic apparatuses): 1 patents
• G03F7/16 (Coating processes; Apparatus therefor (applying coatings to base materials in general): 1 patents
• H01L21/67167 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
• H01L21/67207 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents

Companies

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List of Companies

• Lam Research Corporation: 11 patents

Collaborators

• Samantha SiamHwa TAN of Newark CA (US) (9 collaborations)
• Jeffrey MARKS of Saratoga CA (US) (7 collaborations)
• Keren J. KANARIK of Los Altos CA (US) (5 collaborations)
• Jengyi YU of San Ramon CA (US) (4 collaborations)
• Wenbing YANG of Campbell CA (US) (3 collaborations)
• Da LI of Newark CA (US) (3 collaborations)
• Timothy William WEIDMAN of Sunnyvale CA (US) (3 collaborations)
• Yiwen FAN of Fremont CA (US) (2 collaborations)
• Richard A. GOTTSCHO of Menlo Park CA (US) (2 collaborations)
• Daniel PETER of Sunnyvale CA (US) (2 collaborations)
• Boris VOLOSSKIY of San Jose CA (US) (2 collaborations)
• Stephen M. SIRARD of Austin TX (US) (1 collaborations)
• Ratchana LIMARY of Austin TX (US) (1 collaborations)
• Diane HYMES of San Jose CA (US) (1 collaborations)
• Ran LIN of Fremont CA (US) (1 collaborations)
• Tamal MUKHERJEE of Fremont CA (US) (1 collaborations)
• Chunhong ZHOU of Fremont CA (US) (1 collaborations)
• Xiaoyu KANG of Union City CA (US) (1 collaborations)
• Hong SHIH of Cupertino CA (US) (1 collaborations)
• Samantha S.H. TAN of Newark CA (US) (1 collaborations)
• Mohammed Haroon ALVI of San Jose CA (US) (1 collaborations)
• Richard WISE of Los Gatos CA (US) (1 collaborations)
• Richard Alan GOTTSCHO of Menlo Park CA (US) (1 collaborations)
• Adrien LAVOIE of Newberg OR (US) (1 collaborations)
• Sivananda Krishnan KANAKASABAPATHY of Pleasanton CA (US) (1 collaborations)
• Qinghuang LIN of Yorktown Heights NY (US) (1 collaborations)
• Jerome S. HUBACEK of Fremont CA (US) (1 collaborations)
• Ji Yeon KIM of Fremont CA (US) (1 collaborations)