View source for Category:Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN

== Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ==

=== Executive Summary ===
Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN is an inventor who has filed 3 patents. Their primary areas of innovation include {for microlithography  (measuring printed patterns for monitoring overlay (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), {for microlithography  (measuring printed patterns for monitoring overlay (1 patents), and they have worked with companies such as ASML Netherlands B.V. (3 patents). Their most frequent collaborators include [[Category:Bram Antonius Gerardus LOMANS|Bram Antonius Gerardus LOMANS]] (2 collaborations), [[Category:Jeroen Johan Maarten VAN DE WIJDEVEN|Jeroen Johan Maarten VAN DE WIJDEVEN]] (1 collaborations), [[Category:Michaël Johannes Christiaan RONDE|Michaël Johannes Christiaan RONDE]] (1 collaborations).

=== Patent Filing Activity ===
[[File:Bastiaan_Lambertus_Wilhelmus_Marinus_VAN_DE_VEN_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:Bastiaan_Lambertus_Wilhelmus_Marinus_VAN_DE_VEN_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_G03F9/7046|G03F9/7046]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
* [[:Category:CPC_G03F7/70775|G03F7/70775]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F9/7088|G03F9/7088]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
* [[:Category:CPC_G01N21/8806|G01N21/8806]] ({Specially adapted optical and illumination features}): 1 patents
* [[:Category:CPC_G01N21/9501|G01N21/9501]] ({Semiconductor wafers  (manufacturing processes per se of semiconductor devices implementing a measuring step): 1 patents
* [[:Category:CPC_G01N21/956|G01N21/956]] (Inspecting patterns on the surface of objects {(contactless testing of electronic circuits): 1 patents
* [[:Category:CPC_G02B7/1805|G02B7/1805]] (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 1 patents
* [[:Category:CPC_G02B7/1822|G02B7/1822]] (for mirrors): 1 patents
* [[:Category:CPC_G03F7/70891|G03F7/70891]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/70033|G03F7/70033]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_H05G2/0023|H05G2/0023]] (Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma  (X-ray lasers): 1 patents
* [[:Category:CPC_H05G2/008|H05G2/008]] (Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma  (X-ray lasers): 1 patents

=== Companies ===
[[File:Bastiaan_Lambertus_Wilhelmus_Marinus_VAN_DE_VEN_Top_Companies.png|border|800px]]

==== List of Companies ====
* ASML Netherlands B.V.: 3 patents

=== Collaborators ===
* [[:Category:Bram Antonius Gerardus LOMANS|Bram Antonius Gerardus LOMANS]][[Category:Bram Antonius Gerardus LOMANS]] (2 collaborations)
* [[:Category:Jeroen Johan Maarten VAN DE WIJDEVEN|Jeroen Johan Maarten VAN DE WIJDEVEN]][[Category:Jeroen Johan Maarten VAN DE WIJDEVEN]] (1 collaborations)
* [[:Category:Michaël Johannes Christiaan RONDE|Michaël Johannes Christiaan RONDE]][[Category:Michaël Johannes Christiaan RONDE]] (1 collaborations)
* [[:Category:Douglas C. CAPPELLI of Norwalk CT (US)|Douglas C. CAPPELLI of Norwalk CT (US)]][[Category:Douglas C. CAPPELLI of Norwalk CT (US)]] (1 collaborations)
* [[:Category:Ferry ZIJP|Ferry ZIJP]][[Category:Ferry ZIJP]] (1 collaborations)
* [[:Category:William Peter VAN DRENT|William Peter VAN DRENT]][[Category:William Peter VAN DRENT]] (1 collaborations)
* [[:Category:Jan Steven Christiaan WESTERLAKEN|Jan Steven Christiaan WESTERLAKEN]][[Category:Jan Steven Christiaan WESTERLAKEN]] (1 collaborations)
* [[:Category:Daniel Jozef Maria DIRECKS|Daniel Jozef Maria DIRECKS]][[Category:Daniel Jozef Maria DIRECKS]] (1 collaborations)
* [[:Category:Johannes Henricus Wilhelmus JACOBS|Johannes Henricus Wilhelmus JACOBS]][[Category:Johannes Henricus Wilhelmus JACOBS]] (1 collaborations)
* [[:Category:Maurice Wilhelmus Leonardus Hendricus FEIJTS|Maurice Wilhelmus Leonardus Hendricus FEIJTS]][[Category:Maurice Wilhelmus Leonardus Hendricus FEIJTS]] (1 collaborations)
* [[:Category:Edwin Johan BUIS|Edwin Johan BUIS]][[Category:Edwin Johan BUIS]] (1 collaborations)
* [[:Category:Bart Leonardus KNAPEN|Bart Leonardus KNAPEN]][[Category:Bart Leonardus KNAPEN]] (1 collaborations)
* [[:Category:Nicolaas Johannes Wilhelmus REUVERS|Nicolaas Johannes Wilhelmus REUVERS]][[Category:Nicolaas Johannes Wilhelmus REUVERS]] (1 collaborations)

[[Category:Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN]]
[[Category:Inventors]]
[[Category:Inventors filing patents with ASML Netherlands B.V.]]