Category:Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN

Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN

Executive Summary

Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN is an inventor who has filed 3 patents. Their primary areas of innovation include {for microlithography (measuring printed patterns for monitoring overlay (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), {for microlithography (measuring printed patterns for monitoring overlay (1 patents), and they have worked with companies such as ASML Netherlands B.V. (3 patents). Their most frequent collaborators include (2 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

File:Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN Monthly Patent Applications.png

Technology Areas

File:Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN Top Technology Areas.png

List of Technology Areas

• G03F9/7046 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F7/70775 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F9/7088 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G01N21/8806 ({Specially adapted optical and illumination features}): 1 patents
• G01N21/9501 ({Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step): 1 patents
• G01N21/956 (Inspecting patterns on the surface of objects {(contactless testing of electronic circuits): 1 patents
• G02B7/1805 (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 1 patents
• G02B7/1822 (for mirrors): 1 patents
• G03F7/70891 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70033 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• H05G2/0023 (Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma (X-ray lasers): 1 patents
• H05G2/008 (Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma (X-ray lasers): 1 patents

Companies

File:Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN Top Companies.png

List of Companies

• ASML Netherlands B.V.: 3 patents

Collaborators

• Bram Antonius Gerardus LOMANS (2 collaborations)
• Jeroen Johan Maarten VAN DE WIJDEVEN (1 collaborations)
• Michaël Johannes Christiaan RONDE (1 collaborations)
• Douglas C. CAPPELLI of Norwalk CT (US) (1 collaborations)
• Ferry ZIJP (1 collaborations)
• William Peter VAN DRENT (1 collaborations)
• Jan Steven Christiaan WESTERLAKEN (1 collaborations)
• Daniel Jozef Maria DIRECKS (1 collaborations)
• Johannes Henricus Wilhelmus JACOBS (1 collaborations)
• Maurice Wilhelmus Leonardus Hendricus FEIJTS (1 collaborations)
• Edwin Johan BUIS (1 collaborations)
• Bart Leonardus KNAPEN (1 collaborations)
• Nicolaas Johannes Wilhelmus REUVERS (1 collaborations)