Category:Ferry ZIJP

Ferry ZIJP

Executive Summary

Ferry ZIJP is an inventor who has filed 3 patents. Their primary areas of innovation include {Specially adapted optical and illumination features} (1 patents), {Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step (1 patents), Inspecting patterns on the surface of objects {(contactless testing of electronic circuits (1 patents), and they have worked with companies such as ASML Netherlands B.V. (1 patents), ASML NETHERLANDS B.V. (1 patents), ASML NETHERLANDS B.V. P.O. (1 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

File:Ferry ZIJP Monthly Patent Applications.png

Technology Areas

File:Ferry ZIJP Top Technology Areas.png

List of Technology Areas

• G01N21/8806 ({Specially adapted optical and illumination features}): 1 patents
• G01N21/9501 ({Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step): 1 patents
• G01N21/956 (Inspecting patterns on the surface of objects {(contactless testing of electronic circuits): 1 patents
• G02B7/1805 (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 1 patents
• G02B7/1822 (for mirrors): 1 patents
• G03F9/7065 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F9/7034 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F7/70233 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/2004 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 1 patents
• G03F7/70033 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706847 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706849 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• H01J61/16 (having helium, argon, neon, krypton, or xenon as the principle constituent): 1 patents
• H01J61/302 (Vessels; Containers): 1 patents
• H01J61/33 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
• H05G2/0086 (Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma (X-ray lasers): 1 patents

Companies

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List of Companies

• ASML Netherlands B.V.: 1 patents
• ASML NETHERLANDS B.V.: 1 patents
• ASML NETHERLANDS B.V. P.O.: 1 patents

Collaborators

• Douglas C. CAPPELLI of Norwalk CT (US) (1 collaborations)
• Bram Antonius Gerardus LOMANS (1 collaborations)
• Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN (1 collaborations)
• Ahmet Burak CUNBUL (1 collaborations)
• Teunis Willem TUKKER (1 collaborations)
• Peter Fernand William Jozef DENDAS (1 collaborations)
• Abraham Franciscus Hubertus VAN GESSEL (1 collaborations)