Category:Maxim PISARENCO: Difference between revisions

Maxim PISARENCO

Executive Summary

Maxim PISARENCO is an inventor who has filed 5 patents. Their primary areas of innovation include Image acquisition modality (2 patents), Special algorithmic details (2 patents), Subject of image; Context of image processing (2 patents), and they have worked with companies such as ASML Netherlands B.V. (3 patents), ASML NETHERLANDS B.V. (2 patents). Their most frequent collaborators include (4 collaborations), (3 collaborations), (2 collaborations).

Patent Filing Activity

File:Maxim PISARENCO Monthly Patent Applications.png

Technology Areas

File:Maxim PISARENCO Top Technology Areas.png

List of Technology Areas

• G06T2207/10061 (Image acquisition modality): 2 patents
• G06T2207/20081 (Special algorithmic details): 2 patents
• G06T2207/30148 (Subject of image; Context of image processing): 2 patents
• G06V10/24 (IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING): 1 patents
• G06T11/00 (2D [Two Dimensional] image generation): 1 patents
• G06V10/82 (IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING): 1 patents
• G06V10/993 (IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING): 1 patents
• G06T7/593 (from stereo images): 1 patents
• G06T5/50 (using two or more images, e.g. averaging or subtraction): 1 patents
• G06T7/13 (Edge detection): 1 patents
• G06T2207/20084 (Special algorithmic details): 1 patents
• G06T2207/10012 (Image acquisition modality): 1 patents
• G06T2207/20212 (Special algorithmic details): 1 patents
• G06T7/0004 ({Industrial image inspection}): 1 patents
• G06T2207/20021 (Special algorithmic details): 1 patents
• G03F7/705 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70575 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70675 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents

Companies

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List of Companies

• ASML Netherlands B.V.: 3 patents
• ASML NETHERLANDS B.V.: 2 patents

Collaborators

• Scott Anderson MIDDLEBROOKS (4 collaborations)
• Chrysostomos BATISTAKIS (3 collaborations)
• Markus Gerardus Martinus Maria VAN KRAAIJ (2 collaborations)
• Coen Adrianus VERSCHUREN (1 collaborations)
• Tim HOUBEN (1 collaborations)
• Thomas Jarik HUISMAN (1 collaborations)
• Yu CAO of Saratoga CA (US) (1 collaborations)
• Huina XU of Los Altos CA (US) (1 collaborations)
• Yana MATSUSHITA of Redwood City CA (US) (1 collaborations)
• Tanbir HASAN of San Jose CA (US) (1 collaborations)
• Ren-Jay KOU of Cupertino CA (US) (1 collaborations)
• Namita Adrianus GOEL of San Jose CA (US) (1 collaborations)
• Hongmei LI of San Jose CA (US) (1 collaborations)
• Marleen KOOIMAN (1 collaborations)
• Johannes ONVLEE (1 collaborations)
• Patrick Philipp HELFENSTEIN (1 collaborations)
• Alexander Prasetya KONIJNENBERG (1 collaborations)