Category:Hans BUTLER: Difference between revisions

Hans BUTLER

Executive Summary

Hans BUTLER is an inventor who has filed 4 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), Inspecting patterns on the surface of objects {(contactless testing of electronic circuits (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as ASML Netherlands B.V. (3 patents), ASML NETHERLANDS B.V. (1 patents). Their most frequent collaborators include (2 collaborations), (2 collaborations), (1 collaborations).

Patent Filing Activity

File:Hans BUTLER Monthly Patent Applications.png

Technology Areas

File:Hans BUTLER Top Technology Areas.png

List of Technology Areas

• G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G01N21/956 (Inspecting patterns on the surface of objects {(contactless testing of electronic circuits): 1 patents
• G03F7/7015 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• F16F15/08 (SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION): 1 patents
• G03F7/70825 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/709 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706843 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/7085 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• H01J37/20 (Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support {(introducing the objects): 1 patents
• H01J37/28 (with scanning beams {(): 1 patents
• H01J2237/20235 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents

Companies

File:Hans BUTLER Top Companies.png

List of Companies

• ASML Netherlands B.V.: 3 patents
• ASML NETHERLANDS B.V.: 1 patents

Collaborators

• Arie Jeffrey DEN BOEF (2 collaborations)
• Jeroen Arnoldus Leonardus Johannes RAAYMAKERS (2 collaborations)
• Nitesh PANDEY (1 collaborations)
• Duygu AKBULUT (1 collaborations)
• Marinus Johannes Maria VAN DAM (1 collaborations)
• Hugo Augustinus Joseph CRAMER (1 collaborations)
• Engelbertus Antonius Fransiscus VAN DER PASCH (1 collaborations)
• Ferry ZIJP (1 collaborations)
• Marinus Petrus REIJNDERS (1 collaborations)
• Maarten Hartger KIMMAN (1 collaborations)
• Johannes,Petrus,Martinus,Bernardus VERMEULEN (1 collaborations)
• Stefan TROGER (1 collaborations)
• Michael ERATH (1 collaborations)
• Philipp GAIDA (1 collaborations)
• Bram Antonius Gerardus LOMANS (1 collaborations)
• Niels Johannes Maria BOSCH (1 collaborations)
• Xu WANG of San Jose CA (US) (1 collaborations)
• Peter Paul HEMPENIUS (1 collaborations)
• Yongqiang WANG of Fremont CA (US) (1 collaborations)
• Youjin WANG of Milpitas CA (US) (1 collaborations)
• Jasper Hendrik GRASMAN (1 collaborations)
• Jianzi SUI of Fremont CA (US) (1 collaborations)
• Tianming CHEN of San Jose CA (US) (1 collaborations)
• Aimin WU of Milpitas CA (US) (1 collaborations)