Category:Scott Anderson MIDDLEBROOKS: Difference between revisions
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=== Executive Summary === | === Executive Summary === | ||
Scott Anderson MIDDLEBROOKS is an inventor who has filed | Scott Anderson MIDDLEBROOKS is an inventor who has filed 2 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as ASML NETHERLANDS B.V. (1 patents), ASML Netherlands B.V. (1 patents). Their most frequent collaborators include [[Category:Marc Johannes NOOT|Marc Johannes NOOT]] (1 collaborations), [[Category:Simon Gijsbert Josephus MATHIJSSEN|Simon Gijsbert Josephus MATHIJSSEN]] (1 collaborations), [[Category:Kaustuve BHATTACHARYYA|Kaustuve BHATTACHARYYA]] (1 collaborations). | ||
=== Patent Filing Activity === | === Patent Filing Activity === | ||
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==== List of Technology Areas ==== | ==== List of Technology Areas ==== | ||
* [[:Category: | * [[:Category:CPC_G03F7/706837|G03F7/706837]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents | ||
* [[:Category:CPC_G03F7/705|G03F7/705]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents | * [[:Category:CPC_G03F7/705|G03F7/705]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents | ||
* [[:Category:CPC_G03F7/ | * [[:Category:CPC_G03F7/70508|G03F7/70508]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents | ||
* [[:Category:CPC_G03F7/ | * [[:Category:CPC_G03F7/70633|G03F7/70633]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents | ||
* [[:Category:CPC_H01L22/20|H01L22/20]] ({Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps}): 1 patents | |||
* [[:Category:CPC_G03F7/706841|G03F7/706841]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents | |||
* [[:Category:CPC_G03F7/70625|G03F7/70625]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents | |||
=== Companies === | === Companies === | ||
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==== List of Companies ==== | ==== List of Companies ==== | ||
* ASML | * ASML NETHERLANDS B.V.: 1 patents | ||
* ASML | * ASML Netherlands B.V.: 1 patents | ||
=== Collaborators === | === Collaborators === | ||
* [[:Category: | * [[:Category:Marc Johannes NOOT|Marc Johannes NOOT]][[Category:Marc Johannes NOOT]] (1 collaborations) | ||
* [[:Category:Simon Gijsbert Josephus MATHIJSSEN|Simon Gijsbert Josephus MATHIJSSEN]][[Category:Simon Gijsbert Josephus MATHIJSSEN]] (1 collaborations) | |||
* [[:Category:Kaustuve BHATTACHARYYA|Kaustuve BHATTACHARYYA]][[Category:Kaustuve BHATTACHARYYA]] (1 collaborations) | |||
* [[:Category: | |||
* [[:Category: | |||
* [[:Category:Patrick Philipp HELFENSTEIN|Patrick Philipp HELFENSTEIN]][[Category:Patrick Philipp HELFENSTEIN]] (1 collaborations) | * [[:Category:Patrick Philipp HELFENSTEIN|Patrick Philipp HELFENSTEIN]][[Category:Patrick Philipp HELFENSTEIN]] (1 collaborations) | ||
* [[:Category: | * [[:Category:Sandy Claudia SCHOLZ|Sandy Claudia SCHOLZ]][[Category:Sandy Claudia SCHOLZ]] (1 collaborations) | ||
* [[:Category:Loes Frederique VAN RIJSWIJK|Loes Frederique VAN RIJSWIJK]][[Category:Loes Frederique VAN RIJSWIJK]] (1 collaborations) | |||
[[Category:Scott Anderson MIDDLEBROOKS]] | [[Category:Scott Anderson MIDDLEBROOKS]] | ||
[[Category:Inventors]] | [[Category:Inventors]] | ||
[[Category:Inventors filing patents with ASML NETHERLANDS B.V.]] | |||
[[Category:Inventors filing patents with ASML Netherlands B.V.]] | [[Category:Inventors filing patents with ASML Netherlands B.V.]] | ||
Latest revision as of 05:01, 30 March 2025
Scott Anderson MIDDLEBROOKS
Executive Summary
Scott Anderson MIDDLEBROOKS is an inventor who has filed 2 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as ASML NETHERLANDS B.V. (1 patents), ASML Netherlands B.V. (1 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).
Patent Filing Activity
File:Scott Anderson MIDDLEBROOKS Monthly Patent Applications.png
Technology Areas
File:Scott Anderson MIDDLEBROOKS Top Technology Areas.png
List of Technology Areas
- G03F7/706837 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G03F7/705 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G03F7/70508 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- H01L22/20 ({Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps}): 1 patents
- G03F7/706841 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
Companies
File:Scott Anderson MIDDLEBROOKS Top Companies.png
List of Companies
- ASML NETHERLANDS B.V.: 1 patents
- ASML Netherlands B.V.: 1 patents
Collaborators
- Marc Johannes NOOT (1 collaborations)
- Simon Gijsbert Josephus MATHIJSSEN (1 collaborations)
- Kaustuve BHATTACHARYYA (1 collaborations)
- Patrick Philipp HELFENSTEIN (1 collaborations)
- Sandy Claudia SCHOLZ (1 collaborations)
- Loes Frederique VAN RIJSWIJK (1 collaborations)
Subcategories
This category has the following 2 subcategories, out of 2 total.
K
S
Categories:
- Marc Johannes NOOT
- Simon Gijsbert Josephus MATHIJSSEN
- Kaustuve BHATTACHARYYA
- Pages with broken file links
- Patrick Philipp HELFENSTEIN
- Sandy Claudia SCHOLZ
- Loes Frederique VAN RIJSWIJK
- Scott Anderson MIDDLEBROOKS
- Inventors
- Inventors filing patents with ASML NETHERLANDS B.V.
- Inventors filing patents with ASML Netherlands B.V.