Category:Sebastianus Adrianus GOORDEN: Difference between revisions

Latest revision as of 05:00, 30 March 2025

Sebastianus Adrianus GOORDEN

Executive Summary

Sebastianus Adrianus GOORDEN is an inventor who has filed 2 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as ASML Netherlands B.V. (2 patents). Their most frequent collaborators include (2 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

File:Sebastianus Adrianus GOORDEN Monthly Patent Applications.png

Technology Areas

File:Sebastianus Adrianus GOORDEN Top Technology Areas.png

List of Technology Areas

G03F7/706849 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G01B11/27 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/706837 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/706851 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F9/7069 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
G03F9/7088 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
G03F9/7092 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents

Companies

File:Sebastianus Adrianus GOORDEN Top Companies.png

List of Companies

ASML Netherlands B.V.: 2 patents

Collaborators

Simon Reinald HUISMAN (2 collaborations)
Aniruddha Ramakrishna SONDE of Stamford CT (US) (1 collaborations)
Mahesh Upendra AJGAONKAR of Guilford CT (US) (1 collaborations)
Krishanu SHOME of Cheshire CT (US) (1 collaborations)
Franciscus Godefridus Casper BIJNEN (1 collaborations)
Patrick WARNAAR (1 collaborations)
Sergei SOKOLOV (1 collaborations)
Stephen ROUX of New Fairfield CT (US) (1 collaborations)

Subcategories

This category has the following 6 subcategories, out of 6 total.

@@ Line 2: / Line 2: @@
 === Executive Summary ===
-Sebastianus Adrianus GOORDEN is an inventor who has filed 8 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (5 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (4 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), and they have worked with companies such as ASML Netherlands B.V. (5 patents), ASML NETHERLANDS B.V. (3 patents). Their most frequent collaborators include [[Category:Luc Roger Simonne HASPESLAGH|Luc Roger Simonne HASPESLAGH]] (2 collaborations), [[Category:Ties Wouter VAN DER WOORD|Ties Wouter VAN DER WOORD]] (2 collaborations), [[Category:Halil Gökay YEGEN|Halil Gökay YEGEN]] (2 collaborations).
+Sebastianus Adrianus GOORDEN is an inventor who has filed 2 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), and they have worked with companies such as ASML Netherlands B.V. (2 patents). Their most frequent collaborators include [[Category:Simon Reinald HUISMAN|Simon Reinald HUISMAN]] (2 collaborations), [[Category:Aniruddha Ramakrishna SONDE of Stamford CT (US)|Aniruddha Ramakrishna SONDE of Stamford CT (US)]] (1 collaborations), [[Category:Mahesh Upendra AJGAONKAR of Guilford CT (US)|Mahesh Upendra AJGAONKAR of Guilford CT (US)]] (1 collaborations).
 === Patent Filing Activity ===
@@ Line 11: / Line 11: @@
 ==== List of Technology Areas ====
-* [[:Category:CPC_G03F7/70633|G03F7/70633]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 5 patents
+* [[:Category:CPC_G03F7/706849|G03F7/706849]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F7/70625|G03F7/70625]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 4 patents
+* [[:Category:CPC_G01B11/27|G01B11/27]] (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
-* [[:Category:CPC_G03F7/706849|G03F7/706849]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
+* [[:Category:CPC_G03F7/70625|G03F7/70625]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F7/70116|G03F7/70116]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
+* [[:Category:CPC_G03F7/70633|G03F7/70633]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G02B26/0858|G02B26/0858]] (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 2 patents
+* [[:Category:CPC_G03F7/706837|G03F7/706837]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F9/7019|G03F9/7019]] ({for microlithography  (measuring printed patterns for monitoring overlay): 2 patents
-* [[:Category:CPC_G03F7/70641|G03F7/70641]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
-* [[:Category:CPC_G02B21/0016|G02B21/0016]] (Microscopes): 1 patents
-* [[:Category:CPC_G01N21/9501|G01N21/9501]] ({Semiconductor wafers  (manufacturing processes per se of semiconductor devices implementing a measuring step): 1 patents
-* [[:Category:CPC_G02B21/002|G02B21/002]] (Microscopes): 1 patents
-* [[:Category:CPC_G02B21/0036|G02B21/0036]] (Microscopes): 1 patents
-* [[:Category:CPC_G02B21/02|G02B21/02]] (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 1 patents
-* [[:Category:CPC_G02B21/10|G02B21/10]] (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 1 patents
 * [[:Category:CPC_G03F7/706851|G03F7/706851]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G01N21/95623|G01N21/95623]] (Inspecting patterns on the surface of objects {(contactless testing of electronic circuits): 1 patents
+* [[:Category:CPC_G03F9/7069|G03F9/7069]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
-* [[:Category:CPC_H02N2/108|H02N2/108]] (ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR): 1 patents
-* [[:Category:CPC_H02N2/009|H02N2/009]] (Electric machines in general using piezoelectric effect, electrostriction or magnetostriction  (generating mechanical vibrations in general): 1 patents
-* [[:Category:CPC_H10N30/50|H10N30/50]] (No explanation available): 1 patents
-* [[:Category:CPC_H10N30/05|H10N30/05]] (No explanation available): 1 patents
-* [[:Category:CPC_G03F7/7015|G03F7/7015]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F9/7046|G03F9/7046]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
-* [[:Category:CPC_G03F7/706831|G03F7/706831]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F7/706837|G03F7/706837]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F7/70516|G03F7/70516]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F7/70025|G03F7/70025]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F7/70291|G03F7/70291]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_B81B7/02|B81B7/02]] (containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]  (): 1 patents
-* [[:Category:CPC_B81B2207/11|B81B2207/11]] (MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES  (piezoelectric, electrostrictive or magnetostrictive elements per se): 1 patents
-* [[:Category:CPC_B81B2207/015|B81B2207/015]] (MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES  (piezoelectric, electrostrictive or magnetostrictive elements per se): 1 patents
-* [[:Category:CPC_G03F7/706839|G03F7/706839]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F7/70725|G03F7/70725]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F9/7049|G03F9/7049]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
 * [[:Category:CPC_G03F9/7088|G03F9/7088]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
 * [[:Category:CPC_G03F9/7092|G03F9/7092]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
-* [[:Category:CPC_G03F7/70091|G03F7/70091]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
 === Companies ===
@@ Line 51: / Line 25: @@
 ==== List of Companies ====
-* ASML Netherlands B.V.: 5 patents
+* ASML Netherlands B.V.: 2 patents
-* ASML NETHERLANDS B.V.: 3 patents
 === Collaborators ===
-* [[:Category:Luc Roger Simonne HASPESLAGH|Luc Roger Simonne HASPESLAGH]][[Category:Luc Roger Simonne HASPESLAGH]] (2 collaborations)
-* [[:Category:Ties Wouter VAN DER WOORD|Ties Wouter VAN DER WOORD]][[Category:Ties Wouter VAN DER WOORD]] (2 collaborations)
-* [[:Category:Halil Gökay YEGEN|Halil Gökay YEGEN]][[Category:Halil Gökay YEGEN]] (2 collaborations)
-* [[:Category:Guilherme BRONDANI TORRI|Guilherme BRONDANI TORRI]][[Category:Guilherme BRONDANI TORRI]] (2 collaborations)
-* [[:Category:Alexander Ludwig KLEIN|Alexander Ludwig KLEIN]][[Category:Alexander Ludwig KLEIN]] (2 collaborations)
-* [[:Category:Jim Vincent OVERKAMP|Jim Vincent OVERKAMP]][[Category:Jim Vincent OVERKAMP]] (2 collaborations)
-* [[:Category:Edgar Alberto OSORIO OLIVEROS|Edgar Alberto OSORIO OLIVEROS]][[Category:Edgar Alberto OSORIO OLIVEROS]] (2 collaborations)
-* [[:Category:Simon Gijsbert Josephus MATHIJSSEN|Simon Gijsbert Josephus MATHIJSSEN]][[Category:Simon Gijsbert Josephus MATHIJSSEN]] (2 collaborations)
-* [[:Category:Kaustuve BHATTACHARYYA|Kaustuve BHATTACHARYYA]][[Category:Kaustuve BHATTACHARYYA]] (2 collaborations)
-* [[:Category:Jin LIAN|Jin LIAN]][[Category:Jin LIAN]] (2 collaborations)
-* [[:Category:Armand Eugene Albert KOOLEN|Armand Eugene Albert KOOLEN]][[Category:Armand Eugene Albert KOOLEN]] (2 collaborations)
 * [[:Category:Simon Reinald HUISMAN|Simon Reinald HUISMAN]][[Category:Simon Reinald HUISMAN]] (2 collaborations)
-* [[:Category:Henricus Petrus Maria PELLEMANS|Henricus Petrus Maria PELLEMANS]][[Category:Henricus Petrus Maria PELLEMANS]] (2 collaborations)
+* [[:Category:Aniruddha Ramakrishna SONDE of Stamford CT (US)|Aniruddha Ramakrishna SONDE of Stamford CT (US)]][[Category:Aniruddha Ramakrishna SONDE of Stamford CT (US)]] (1 collaborations)
-* [[:Category:Nitesh PANDEY of Silicon Valley CA (US)|Nitesh PANDEY of Silicon Valley CA (US)]][[Category:Nitesh PANDEY of Silicon Valley CA (US)]] (1 collaborations)
+* [[:Category:Mahesh Upendra AJGAONKAR of Guilford CT (US)|Mahesh Upendra AJGAONKAR of Guilford CT (US)]][[Category:Mahesh Upendra AJGAONKAR of Guilford CT (US)]] (1 collaborations)
-* [[:Category:Leendert Jan KARSSEMEIJER|Leendert Jan KARSSEMEIJER]][[Category:Leendert Jan KARSSEMEIJER]] (1 collaborations)
+* [[:Category:Krishanu SHOME of Cheshire CT (US)|Krishanu SHOME of Cheshire CT (US)]][[Category:Krishanu SHOME of Cheshire CT (US)]] (1 collaborations)
-* [[:Category:Manouk RIJPSTRA|Manouk RIJPSTRA]][[Category:Manouk RIJPSTRA]] (1 collaborations)
+* [[:Category:Franciscus Godefridus Casper BIJNEN|Franciscus Godefridus Casper BIJNEN]][[Category:Franciscus Godefridus Casper BIJNEN]] (1 collaborations)
-* [[:Category:Ralph BRINKHOF|Ralph BRINKHOF]][[Category:Ralph BRINKHOF]] (1 collaborations)
+* [[:Category:Patrick WARNAAR|Patrick WARNAAR]][[Category:Patrick WARNAAR]] (1 collaborations)
-* [[:Category:Hui Quan LIM|Hui Quan LIM]][[Category:Hui Quan LIM]] (1 collaborations)
-* [[:Category:Nitesh PANDEY of Sillcon Valley CA (US)|Nitesh PANDEY of Sillcon Valley CA (US)]][[Category:Nitesh PANDEY of Sillcon Valley CA (US)]] (1 collaborations)
-* [[:Category:Alexis HUMBLET|Alexis HUMBLET]][[Category:Alexis HUMBLET]] (1 collaborations)
-* [[:Category:Harm Jan Willem BELT|Harm Jan Willem BELT]][[Category:Harm Jan Willem BELT]] (1 collaborations)
-* [[:Category:Filippo ALPEGGIANI|Filippo ALPEGGIANI]][[Category:Filippo ALPEGGIANI]] (1 collaborations)
-* [[:Category:Irwan Dani SETIJA|Irwan Dani SETIJA]][[Category:Irwan Dani SETIJA]] (1 collaborations)
-* [[:Category:Timothy Dugan DAVIS of Portland OR (US)|Timothy Dugan DAVIS of Portland OR (US)]][[Category:Timothy Dugan DAVIS of Portland OR (US)]] (1 collaborations)
-* [[:Category:Sera JEON|Sera JEON]][[Category:Sera JEON]] (1 collaborations)
-* [[:Category:Shuo-Chun LIN|Shuo-Chun LIN]][[Category:Shuo-Chun LIN]] (1 collaborations)
 * [[:Category:Sergei SOKOLOV|Sergei SOKOLOV]][[Category:Sergei SOKOLOV]] (1 collaborations)
-* [[:Category:Muhsin ERALP of Bethel CT (US)|Muhsin ERALP of Bethel CT (US)]][[Category:Muhsin ERALP of Bethel CT (US)]] (1 collaborations)
+* [[:Category:Stephen ROUX of New Fairfield CT (US)|Stephen ROUX of New Fairfield CT (US)]][[Category:Stephen ROUX of New Fairfield CT (US)]] (1 collaborations)
-* [[:Category:Justin Lloyd KREUZER of Trumbull CT (US)|Justin Lloyd KREUZER of Trumbull CT (US)]][[Category:Justin Lloyd KREUZER of Trumbull CT (US)]] (1 collaborations)
 [[Category:Sebastianus Adrianus GOORDEN]]
 [[Category:Inventors]]
-[[Category:Inventors filing patents with ASML NETHERLANDS B.V.]]
 [[Category:Inventors filing patents with ASML Netherlands B.V.]]