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Category:Peter De Schepper: Difference between revisions - WikiTrademarks Jump to content

Category:Peter De Schepper: Difference between revisions

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=== Executive Summary ===
=== Executive Summary ===
Peter De Schepper is an inventor who has filed 1 patents. Their primary areas of innovation include No explanation available (1 patents), No explanation available (1 patents), No explanation available (1 patents), and they have worked with companies such as Inpria Corporation (1 patents). Their most frequent collaborators include [[Category:Jason K. Stowers of Corvallis OR (US)|Jason K. Stowers of Corvallis OR (US)]] (1 collaborations), [[Category:Sangyoon Woo|Sangyoon Woo]] (1 collaborations), [[Category:Michael Kocsis of Albany OR (US)|Michael Kocsis of Albany OR (US)]] (1 collaborations).
Peter De Schepper is an inventor who has filed 1 patents. Their primary areas of innovation include Macromolecular compounds which are photodegradable, e.g. positive electron resists  ( (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), and they have worked with companies such as Inpria Corporation (1 patents). Their most frequent collaborators include [[Category:Jason K. Stowers of Corvallis OR (US)|Jason K. Stowers of Corvallis OR (US)]] (1 collaborations), [[Category:Sangyoon Woo|Sangyoon Woo]] (1 collaborations), [[Category:Michael Kocsis of Albany OR (US)|Michael Kocsis of Albany OR (US)]] (1 collaborations).


=== Patent Filing Activity ===
=== Patent Filing Activity ===
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==== List of Technology Areas ====
==== List of Technology Areas ====
* [[:Category:CPC_G03F7/0392|G03F7/0392]] (No explanation available): 1 patents
* [[:Category:CPC_G03F7/0392|G03F7/0392]] (Macromolecular compounds which are photodegradable, e.g. positive electron resists  (): 1 patents
* [[:Category:CPC_G03F1/22|G03F1/22]] (No explanation available): 1 patents
* [[:Category:CPC_G03F1/22|G03F1/22]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F1/48|G03F1/48]] (No explanation available): 1 patents
* [[:Category:CPC_G03F1/48|G03F1/48]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/0017|G03F7/0017]] (No explanation available): 1 patents
* [[:Category:CPC_G03F7/0017|G03F7/0017]] ({Phase modulating patterns, e.g. refractive index patterns}): 1 patents
* [[:Category:CPC_G03F7/0042|G03F7/0042]] (No explanation available): 1 patents
* [[:Category:CPC_G03F7/0042|G03F7/0042]] ({with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists  (): 1 patents
* [[:Category:CPC_G03F7/0382|G03F7/0382]] (No explanation available): 1 patents
* [[:Category:CPC_G03F7/0382|G03F7/0382]] (Macromolecular compounds which are rendered insoluble or differentially wettable  (): 1 patents
* [[:Category:CPC_G03F7/11|G03F7/11]] (No explanation available): 1 patents
* [[:Category:CPC_G03F7/11|G03F7/11]] (having cover layers or intermediate layers, e.g. subbing layers {(): 1 patents
* [[:Category:CPC_G03F7/2004|G03F7/2004]] (No explanation available): 1 patents
* [[:Category:CPC_G03F7/2004|G03F7/2004]] (Exposure; Apparatus therefor  (photographic printing apparatus for making copies): 1 patents
* [[:Category:CPC_G03F7/2037|G03F7/2037]] (No explanation available): 1 patents
* [[:Category:CPC_G03F7/2037|G03F7/2037]] (Exposure; Apparatus therefor  (photographic printing apparatus for making copies): 1 patents
* [[:Category:CPC_G03F7/42|G03F7/42]] (No explanation available): 1 patents
* [[:Category:CPC_G03F7/42|G03F7/42]] (Stripping or agents therefor): 1 patents


=== Companies ===
=== Companies ===

Latest revision as of 07:13, 19 July 2024

Peter De Schepper

Executive Summary

Peter De Schepper is an inventor who has filed 1 patents. Their primary areas of innovation include Macromolecular compounds which are photodegradable, e.g. positive electron resists ( (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as Inpria Corporation (1 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

File:Peter De Schepper Monthly Patent Applications.png

Technology Areas

File:Peter De Schepper Top Technology Areas.png

List of Technology Areas

  • G03F7/0392 (Macromolecular compounds which are photodegradable, e.g. positive electron resists (): 1 patents
  • G03F1/22 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
  • G03F1/48 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
  • G03F7/0017 ({Phase modulating patterns, e.g. refractive index patterns}): 1 patents
  • G03F7/0042 ({with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists (): 1 patents
  • G03F7/0382 (Macromolecular compounds which are rendered insoluble or differentially wettable (): 1 patents
  • G03F7/11 (having cover layers or intermediate layers, e.g. subbing layers {(): 1 patents
  • G03F7/2004 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 1 patents
  • G03F7/2037 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 1 patents
  • G03F7/42 (Stripping or agents therefor): 1 patents

Companies

File:Peter De Schepper Top Companies.png

List of Companies

  • Inpria Corporation: 1 patents

Collaborators

Subcategories

This category has the following 5 subcategories, out of 5 total.

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