Category:Kaustuve BHATTACHARYYA: Difference between revisions

Latest revision as of 05:00, 30 March 2025

Kaustuve BHATTACHARYYA

Executive Summary

Kaustuve BHATTACHARYYA is an inventor who has filed 2 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (2 patents), {for microlithography (measuring printed patterns for monitoring overlay (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as ASML NETHERLANDS B.V. (2 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

File:Kaustuve BHATTACHARYYA Monthly Patent Applications.png

Technology Areas

File:Kaustuve BHATTACHARYYA Top Technology Areas.png

List of Technology Areas

G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
G03F9/7026 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
G03F7/70641 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/706837 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/705 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/70508 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
H01L22/20 ({Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps}): 1 patents

Companies

File:Kaustuve BHATTACHARYYA Top Companies.png

List of Companies

ASML NETHERLANDS B.V.: 2 patents

Collaborators

Emil Peter SCHMITT-WEAVER of Boise ID (US) (1 collaborations)
Dong Young CHEON (1 collaborations)
Adriaan Johan VAN LEEST (1 collaborations)
Marc Johannes NOOT (1 collaborations)
Simon Gijsbert Josephus MATHIJSSEN (1 collaborations)
Scott Anderson MIDDLEBROOKS (1 collaborations)

Subcategories

This category has the following 5 subcategories, out of 5 total.

@@ Line 2: / Line 2: @@
 === Executive Summary ===
-Kaustuve BHATTACHARYYA is an inventor who has filed 4 patents. Their primary areas of innovation include {for microlithography  (measuring printed patterns for monitoring overlay (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), and they have worked with companies such as ASML Netherlands B.V. (3 patents), ASML NETHERLANDS B.V. (1 patents). Their most frequent collaborators include [[Category:Simon Gijsbert Josephus MATHIJSSEN|Simon Gijsbert Josephus MATHIJSSEN]] (4 collaborations), [[Category:Sebastianus Adrianus GOORDEN|Sebastianus Adrianus GOORDEN]] (2 collaborations), [[Category:Leendert Jan KARSSEMEIJER|Leendert Jan KARSSEMEIJER]] (1 collaborations).
+Kaustuve BHATTACHARYYA is an inventor who has filed 2 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), {for microlithography  (measuring printed patterns for monitoring overlay (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (1 patents), and they have worked with companies such as ASML NETHERLANDS B.V. (2 patents). Their most frequent collaborators include [[Category:Emil Peter SCHMITT-WEAVER of Boise ID (US)|Emil Peter SCHMITT-WEAVER of Boise ID (US)]] (1 collaborations), [[Category:Dong Young CHEON|Dong Young CHEON]] (1 collaborations), [[Category:Adriaan Johan VAN LEEST|Adriaan Johan VAN LEEST]] (1 collaborations).
 === Patent Filing Activity ===
@@ Line 11: / Line 11: @@
 ==== List of Technology Areas ====
-* [[:Category:CPC_G03F9/7046|G03F9/7046]] ({for microlithography  (measuring printed patterns for monitoring overlay): 2 patents
-* [[:Category:CPC_G03F7/70625|G03F7/70625]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
 * [[:Category:CPC_G03F7/70633|G03F7/70633]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
-* [[:Category:CPC_G03F7/706831|G03F7/706831]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
+* [[:Category:CPC_G03F9/7026|G03F9/7026]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
+* [[:Category:CPC_G03F7/70641|G03F7/70641]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
 * [[:Category:CPC_G03F7/706837|G03F7/706837]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F9/7019|G03F9/7019]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
+* [[:Category:CPC_G03F7/705|G03F7/705]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F9/7092|G03F9/7092]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
+* [[:Category:CPC_G03F7/70508|G03F7/70508]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F7/70641|G03F7/70641]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
+* [[:Category:CPC_H01L22/20|H01L22/20]] ({Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps}): 1 patents
-* [[:Category:CPC_G03F9/7042|G03F9/7042]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
 === Companies ===
@@ Line 25: / Line 23: @@
 ==== List of Companies ====
-* ASML Netherlands B.V.: 3 patents
+* ASML NETHERLANDS B.V.: 2 patents
-* ASML NETHERLANDS B.V.: 1 patents
 === Collaborators ===
-* [[:Category:Simon Gijsbert Josephus MATHIJSSEN|Simon Gijsbert Josephus MATHIJSSEN]][[Category:Simon Gijsbert Josephus MATHIJSSEN]] (4 collaborations)
+* [[:Category:Emil Peter SCHMITT-WEAVER of Boise ID (US)|Emil Peter SCHMITT-WEAVER of Boise ID (US)]][[Category:Emil Peter SCHMITT-WEAVER of Boise ID (US)]] (1 collaborations)
-* [[:Category:Sebastianus Adrianus GOORDEN|Sebastianus Adrianus GOORDEN]][[Category:Sebastianus Adrianus GOORDEN]] (2 collaborations)
+* [[:Category:Dong Young CHEON|Dong Young CHEON]][[Category:Dong Young CHEON]] (1 collaborations)
-* [[:Category:Leendert Jan KARSSEMEIJER|Leendert Jan KARSSEMEIJER]][[Category:Leendert Jan KARSSEMEIJER]] (1 collaborations)
+* [[:Category:Adriaan Johan VAN LEEST|Adriaan Johan VAN LEEST]][[Category:Adriaan Johan VAN LEEST]] (1 collaborations)
-* [[:Category:Manouk RIJPSTRA|Manouk RIJPSTRA]][[Category:Manouk RIJPSTRA]] (1 collaborations)
+* [[:Category:Marc Johannes NOOT|Marc Johannes NOOT]][[Category:Marc Johannes NOOT]] (1 collaborations)
-* [[:Category:Ralph BRINKHOF|Ralph BRINKHOF]][[Category:Ralph BRINKHOF]] (1 collaborations)
+* [[:Category:Simon Gijsbert Josephus MATHIJSSEN|Simon Gijsbert Josephus MATHIJSSEN]][[Category:Simon Gijsbert Josephus MATHIJSSEN]] (1 collaborations)
-* [[:Category:Timothy Dugan DAVIS of Portland OR (US)|Timothy Dugan DAVIS of Portland OR (US)]][[Category:Timothy Dugan DAVIS of Portland OR (US)]] (1 collaborations)
+* [[:Category:Scott Anderson MIDDLEBROOKS|Scott Anderson MIDDLEBROOKS]][[Category:Scott Anderson MIDDLEBROOKS]] (1 collaborations)
-* [[:Category:Armand Eugene Albert KOOLEN|Armand Eugene Albert KOOLEN]][[Category:Armand Eugene Albert KOOLEN]] (1 collaborations)
-* [[:Category:Sera JEON|Sera JEON]][[Category:Sera JEON]] (1 collaborations)
-* [[:Category:Shuo-Chun LIN|Shuo-Chun LIN]][[Category:Shuo-Chun LIN]] (1 collaborations)
-* [[:Category:Patricius Aloysius Jacobus TINNEMANS|Patricius Aloysius Jacobus TINNEMANS]][[Category:Patricius Aloysius Jacobus TINNEMANS]] (1 collaborations)
-* [[:Category:Arie Jeffrey DEN BOEF|Arie Jeffrey DEN BOEF]][[Category:Arie Jeffrey DEN BOEF]] (1 collaborations)
-* [[:Category:Samee Ur REHMAN of Milpitas CA (US)|Samee Ur REHMAN of Milpitas CA (US)]][[Category:Samee Ur REHMAN of Milpitas CA (US)]] (1 collaborations)
 [[Category:Kaustuve BHATTACHARYYA]]
 [[Category:Inventors]]
 [[Category:Inventors filing patents with ASML NETHERLANDS B.V.]]
-[[Category:Inventors filing patents with ASML Netherlands B.V.]]