Category:Sebastianus Adrianus GOORDEN

Sebastianus Adrianus GOORDEN

Executive Summary

Sebastianus Adrianus GOORDEN is an inventor who has filed 8 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (5 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (4 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (2 patents), and they have worked with companies such as ASML Netherlands B.V. (5 patents), ASML NETHERLANDS B.V. (3 patents). Their most frequent collaborators include (2 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

File:Sebastianus Adrianus GOORDEN Monthly Patent Applications.png

Technology Areas

File:Sebastianus Adrianus GOORDEN Top Technology Areas.png

List of Technology Areas

G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 5 patents
G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 4 patents
G03F7/706849 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
G03F7/70116 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
G02B26/0858 (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 2 patents
G03F9/7019 ({for microlithography (measuring printed patterns for monitoring overlay): 2 patents
G03F7/70641 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
G02B21/0016 (Microscopes): 1 patents
G01N21/9501 ({Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step): 1 patents
G02B21/002 (Microscopes): 1 patents
G02B21/0036 (Microscopes): 1 patents
G02B21/02 (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 1 patents
G02B21/10 (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 1 patents
G03F7/706851 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G01N21/95623 (Inspecting patterns on the surface of objects {(contactless testing of electronic circuits): 1 patents
H02N2/108 (ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR): 1 patents
H02N2/009 (Electric machines in general using piezoelectric effect, electrostriction or magnetostriction (generating mechanical vibrations in general): 1 patents
H10N30/50 (No explanation available): 1 patents
H10N30/05 (No explanation available): 1 patents
G03F7/7015 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F9/7046 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
G03F7/706831 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/706837 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/70516 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/70025 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/70291 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
B81B7/02 (containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS] (): 1 patents
B81B2207/11 (MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES (piezoelectric, electrostrictive or magnetostrictive elements per se): 1 patents
B81B2207/015 (MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES (piezoelectric, electrostrictive or magnetostrictive elements per se): 1 patents
G03F7/706839 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/70725 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F9/7049 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
G03F9/7088 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
G03F9/7092 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
G03F7/70091 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents

Companies

File:Sebastianus Adrianus GOORDEN Top Companies.png

List of Companies

ASML Netherlands B.V.: 5 patents
ASML NETHERLANDS B.V.: 3 patents

Collaborators

Luc Roger Simonne HASPESLAGH (2 collaborations)
Ties Wouter VAN DER WOORD (2 collaborations)
Halil Gökay YEGEN (2 collaborations)
Guilherme BRONDANI TORRI (2 collaborations)
Alexander Ludwig KLEIN (2 collaborations)
Jim Vincent OVERKAMP (2 collaborations)
Edgar Alberto OSORIO OLIVEROS (2 collaborations)
Simon Gijsbert Josephus MATHIJSSEN (2 collaborations)
Kaustuve BHATTACHARYYA (2 collaborations)
Jin LIAN (2 collaborations)
Armand Eugene Albert KOOLEN (2 collaborations)
Simon Reinald HUISMAN (2 collaborations)
Henricus Petrus Maria PELLEMANS (2 collaborations)
Nitesh PANDEY of Silicon Valley CA (US) (1 collaborations)
Leendert Jan KARSSEMEIJER (1 collaborations)
Manouk RIJPSTRA (1 collaborations)
Ralph BRINKHOF (1 collaborations)
Hui Quan LIM (1 collaborations)
Nitesh PANDEY of Sillcon Valley CA (US) (1 collaborations)
Alexis HUMBLET (1 collaborations)
Harm Jan Willem BELT (1 collaborations)
Filippo ALPEGGIANI (1 collaborations)
Irwan Dani SETIJA (1 collaborations)
Timothy Dugan DAVIS of Portland OR (US) (1 collaborations)
Sera JEON (1 collaborations)
Shuo-Chun LIN (1 collaborations)
Sergei SOKOLOV (1 collaborations)
Muhsin ERALP of Bethel CT (US) (1 collaborations)
Justin Lloyd KREUZER of Trumbull CT (US) (1 collaborations)

Subcategories

This category has the following 6 subcategories, out of 6 total.