Category:Kaustuve BHATTACHARYYA

Kaustuve BHATTACHARYYA

Executive Summary

Kaustuve BHATTACHARYYA is an inventor who has filed 4 patents. Their primary areas of innovation include {for microlithography (measuring printed patterns for monitoring overlay (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (2 patents), and they have worked with companies such as ASML Netherlands B.V. (3 patents), ASML NETHERLANDS B.V. (1 patents). Their most frequent collaborators include (4 collaborations), (2 collaborations), (1 collaborations).

Patent Filing Activity

File:Kaustuve BHATTACHARYYA Monthly Patent Applications.png

Technology Areas

File:Kaustuve BHATTACHARYYA Top Technology Areas.png

List of Technology Areas

• G03F9/7046 ({for microlithography (measuring printed patterns for monitoring overlay): 2 patents
• G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• G03F7/706831 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706837 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F9/7019 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F9/7092 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F7/70641 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F9/7042 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents

Companies

File:Kaustuve BHATTACHARYYA Top Companies.png

List of Companies

• ASML Netherlands B.V.: 3 patents
• ASML NETHERLANDS B.V.: 1 patents

Collaborators

• Simon Gijsbert Josephus MATHIJSSEN (4 collaborations)
• Sebastianus Adrianus GOORDEN (2 collaborations)
• Leendert Jan KARSSEMEIJER (1 collaborations)
• Manouk RIJPSTRA (1 collaborations)
• Ralph BRINKHOF (1 collaborations)
• Timothy Dugan DAVIS of Portland OR (US) (1 collaborations)
• Armand Eugene Albert KOOLEN (1 collaborations)
• Sera JEON (1 collaborations)
• Shuo-Chun LIN (1 collaborations)
• Patricius Aloysius Jacobus TINNEMANS (1 collaborations)
• Arie Jeffrey DEN BOEF (1 collaborations)
• Samee Ur REHMAN of Milpitas CA (US) (1 collaborations)