Category:Jengyi Yu of San Ramon CA (US)

Jengyi Yu of San Ramon CA (US)

Executive Summary

Jengyi Yu of San Ramon CA (US) is an inventor who has filed 6 patents. Their primary areas of innovation include {deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD} (2 patents), {the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides (adhesion layers or buffer layers (2 patents), {from the gas phase, by plasma deposition ( (2 patents), and they have worked with companies such as Lam Research Corporation (6 patents). Their most frequent collaborators include (4 collaborations), (4 collaborations), (3 collaborations).

Patent Filing Activity

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Technology Areas

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List of Technology Areas

• H01L21/0228 ({deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD}): 2 patents
• H01L21/02274 ({the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides (adhesion layers or buffer layers): 2 patents
• G03F7/167 ({from the gas phase, by plasma deposition (): 2 patents
• G03F7/2004 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 2 patents
• H01L21/0274 (Making masks on semiconductor bodies for further photolithographic processing not provided for in group): 2 patents
• H01L21/02164 ({the material being a silicon oxide, e.g. SiO): 1 patents
• H01L21/02211 ({the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides (adhesion layers or buffer layers): 1 patents
• G03F7/094 (characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general): 1 patents
• C23C16/047 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion): 1 patents
• G03F1/22 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/091 ({characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement}): 1 patents
• G03F7/70033 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• H01L21/0332 (comprising inorganic layers): 1 patents
• G03F7/40 (Treatment after imagewise removal, e.g. baking): 1 patents
• G03F7/0002 ({Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}): 1 patents
• G03F7/36 (Imagewise removal not covered by groups): 1 patents
• G03F7/0042 ({with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists (): 1 patents
• H01J37/32862 (Gas-filled discharge tubes (heating by discharge): 1 patents
• C23C16/4405 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion): 1 patents
• H01L21/30655 (Plasma etching; Reactive-ion etching): 1 patents
• H01L21/0337 ({characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment}): 1 patents
• H01L21/67069 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents

Companies

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List of Companies

• Lam Research Corporation: 6 patents

Collaborators

• Samantha S.H. Tan of Newark CA (US) (4 collaborations)
• Da Li of Newark CA (US) (4 collaborations)
• Alan J. Jensen of Mountain House CA (US) (3 collaborations)
• Chen-Wei Liang of El Cerrito CA (US) (2 collaborations)
• Younghee Lee of Pleasanton CA (US) (2 collaborations)
• Seongjun Heo of Dublin CA (US) (2 collaborations)
• Liu Yang of Seattle WA (US) (1 collaborations)
• Boris Volosskiy of San Jose CA (US) (1 collaborations)
• Richard Wise of Los Gatos CA (US) (1 collaborations)
• Yang Pan of Los Altos CA (US) (1 collaborations)
• Ge Yuan of San Jose CA (US) (1 collaborations)
• Andrew Liang of San Jose CA (US) (1 collaborations)
• Jun Xue of Fremont CA (US) (1 collaborations)
• Mary Anne Manumpil of Fremont CA (US) (1 collaborations)
• Daniel PETER of Sunnyvale CA (US) (1 collaborations)
• Samantha SiamHwa TAN of Newark CA (US) (1 collaborations)
• Meng Xue of San Jose CA (US) (1 collaborations)
• Wook Choi of San Jose CA (US) (1 collaborations)
• Ji Yeon Kim of Fremont CA (US) (1 collaborations)
• Shahd Hassan Labib of San Jose CA (US) (1 collaborations)
• Hongxiang Zhao of San Jose CA (US) (1 collaborations)
• Sivananda Krishnan Kanakasabapathy of Pleasanton CA (US) (1 collaborations)
• Samantha SiamHwa Tan of Newark CA (US) (1 collaborations)
• Ge Yuan of Fremont CA (US) (1 collaborations)
• Siva Krishnan Kanakasabapathy of Pleasanton CA (US) (1 collaborations)