Category:Yang Pan of Los Altos CA (US)

Yang Pan of Los Altos CA (US)

Executive Summary

Yang Pan of Los Altos CA (US) is an inventor who has filed 4 patents. Their primary areas of innovation include {using plasmas} (2 patents), {deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD} (1 patents), {the material being a silicon oxide, e.g. SiO (1 patents), and they have worked with companies such as Lam Research Corporation (4 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

File:Yang Pan of Los Altos CA (US) Monthly Patent Applications.png

Technology Areas

File:Yang Pan of Los Altos CA (US) Top Technology Areas.png

List of Technology Areas

• H01L21/32136 ({using plasmas}): 2 patents
• H01L21/0228 ({deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD}): 1 patents
• H01L21/02164 ({the material being a silicon oxide, e.g. SiO): 1 patents
• H01L21/02211 ({the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides (adhesion layers or buffer layers): 1 patents
• H01L21/02274 ({the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides (adhesion layers or buffer layers): 1 patents
• H01L21/32139 ({using masks}): 1 patents
• H01J37/32449 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J37/321 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J37/32137 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J37/32146 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J37/32155 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J37/32174 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01L21/3065 (Plasma etching; Reactive-ion etching): 1 patents
• H01L21/32137 ({of silicon-containing layers}): 1 patents
• H01L29/66795 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H01J2237/334 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
• H01L21/02118 ({carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC (polymers per se): 1 patents
• H01L21/30625 ({With simultaneous mechanical treatment, e.g. mechanico-chemical polishing}): 1 patents
• H01L21/02282 ({deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD}): 1 patents
• H01L21/02348 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H01L21/02307 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H01L21/6715 ({Apparatus for applying a liquid, a resin, an ink or the like (): 1 patents

Companies

File:Yang Pan of Los Altos CA (US) Top Companies.png

List of Companies

• Lam Research Corporation: 4 patents

Collaborators

• Jengyi Yu of San Ramon CA (US) (1 collaborations)
• Samantha S.H. Tan of Newark CA (US) (1 collaborations)
• Liu Yang of Seattle WA (US) (1 collaborations)
• Chen-Wei Liang of El Cerrito CA (US) (1 collaborations)
• Boris Volosskiy of San Jose CA (US) (1 collaborations)
• Richard Wise of Los Gatos CA (US) (1 collaborations)
• Da Li of Newark CA (US) (1 collaborations)
• Ge Yuan of San Jose CA (US) (1 collaborations)
• Andrew Liang of San Jose CA (US) (1 collaborations)
• Wenbing YANG of Campbell CA (US) (1 collaborations)
• Mohand BROURI (1 collaborations)
• Samantha SiamHwa TAN of Newark CA (US) (1 collaborations)
• Shih-Ked LEE of Fremont CA (US) (1 collaborations)
• Yiwen FAN of Fremont CA (US) (1 collaborations)
• Wook CHOI of San Jose CA (US) (1 collaborations)
• Tamal MUKHERJEE of Beaverton OR (US) (1 collaborations)
• Ran LIN of Fremont CA (US) (1 collaborations)
• Wenbing Yang of Campbell CA (US) (1 collaborations)
• Samantha Tan of Newark CA (US) (1 collaborations)
• Tamal Mukherjee of Beaverton OR (US) (1 collaborations)
• Keren Jacobs Kanarik of Los Altos CA (US) (1 collaborations)
• Stephen M. Sirard of Austin TX (US) (1 collaborations)
• Ratchana Limary of Austin TX (US) (1 collaborations)
• Diane Hymes of San Jose CA (US) (1 collaborations)